Nickel-rhenium alloy rotary tubular target containing trace rare earth elements and preparation method thereof

A rare earth element and rhenium alloy technology, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of low alloy target density, many defects in as-cast structure, low utilization rate, and low quality. Achieve the effects of high gas content, good sputtering effect and improved utilization

Active Publication Date: 2019-11-22
南京达迈科技实业股份有限公司 +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Because of the above-mentioned special requirements on the performance of the target, its preparation process is relatively complicated.
[0005] In the patent TW105102091, the Re element is also used to refine the grains, but this patent is a flat target, and it is directly processed by wire cutting in the as-cast state. The

Method used

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  • Nickel-rhenium alloy rotary tubular target containing trace rare earth elements and preparation method thereof
  • Nickel-rhenium alloy rotary tubular target containing trace rare earth elements and preparation method thereof
  • Nickel-rhenium alloy rotary tubular target containing trace rare earth elements and preparation method thereof

Examples

Experimental program
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Example Embodiment

[0034] Example 1:

[0035] The components and contents of the nickel-rhenium alloy rotating tubular target in this embodiment are as follows in mass percentage: Re 2%, Zr 0.05%, B 0.06%, Mg 0.03%, the balance Ni and inevitable impurities.

[0036] The preparation process route of the nickel-rhenium alloy rotating tubular target is as follows figure 1 As shown, it specifically includes the following steps:

[0037] (1) Preparation of raw materials: Prepare raw materials for electrolytic nickel, rhenium particles, metallic chromium, metallic zirconium, and metallic magnesium according to the above-mentioned component content, wherein the purity of the raw materials is 99.95% electrolytic nickel, 99.99% rhenium particles, and 99.11% metallic chromium. 99.36% metallic zirconium, 99.9% metallic magnesium;

[0038] (2) Vacuum smelting of nickel ingots: use industrial alcohol to remove dirt on the surface of electrolytic nickel, and use dilute nitric acid to remove oxides. After drying, put...

Example Embodiment

[0046] Example 2:

[0047] The components and contents of the nickel-rhenium alloy rotating tubular target in this embodiment are as follows in terms of mass percentage: Re 4%, Zr 0.02%, B 0.05%, Mg 0.01%, the balance Ni and inevitable impurities.

[0048] The preparation method of the nickel-rhenium alloy rotating tubular target of this embodiment is basically the same as that of embodiment 1, except that:

[0049] In step (2), the melting temperature is 1700°C, and the melting time is 70 min;

[0050] In step (3), the vacuum degree of atomization is 10 -3 Pa, atomization temperature is 1700℃, atomization pressure is 8MPa;

[0051] In step (4), the hot isostatic pressing process parameters are 900°C, 135MPa, 3.5h; the sintering temperature is 1300°C, and the sintering pressure is 400 bar;

[0052] In step (5), hot forging is performed on the initial ingot, the forging temperature is 1300°C, and the terminal temperature is 1000°C;

[0053] In step (6), the perforation temperature is set t...

Example Embodiment

[0056] Example 3:

[0057] The components and contents of the nickel-rhenium alloy rotating tubular target in this embodiment are as follows in terms of mass percentage: Re 5%, Zr 0.03%, B 0.1%, Mg 0.04%, the balance Ni and inevitable impurities.

[0058] The preparation method of the nickel-rhenium alloy rotating tubular target of this embodiment is basically the same as that of embodiment 1, except that:

[0059] In step (2), the melting temperature is 1600°C, and the melting time is 90 minutes;

[0060] In step (3), the vacuum degree of atomization is 1Pa, the atomization temperature is 1500°C, and the atomization pressure is 7MPa;

[0061] In step (4), the hot isostatic pressing process parameters are 950°C, 130MPa, 2h; the sintering temperature is 1100°C, and the sintering pressure is 450 bar;

[0062] In step (5), hot forging and hot rolling are performed on the initial ingot, the open forging temperature is 1230°C, the terminal temperature is 980°C; the open rolling temperature is...

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Abstract

The present invention discloses a nickel-rhenium alloy rotary tubular target containing trace rare earth elements and a preparation method thereof. The target comprises the following components in percentages by mass: Re 2-5%, Zr 0.02-0.1%, B 0.05-0.1%, Mg 0.01-0.05% and balance of Ni and inevitable impurities. The preparation method includes the processes such as vacuum melting, atomization ingotting, sintering, hot isostatic pressing, hot forging, hot rolling, cross roll piercing, annealing and machining. The invention is the rotary tubular target; the utilization rate of the material is improves; furthermore the target microstructure is fine and uniform; and the quality is higher. The invention is the integral target with low gas content and high purity; the target can return to a furnace as the returned material even after use; and the cost is saved.

Description

technical field [0001] The invention relates to a target material of magnetron sputtering equipment and a preparation method thereof, in particular to a nickel-rhenium alloy rotary tubular target material containing trace rare earth elements used for magnetron sputtering and a preparation method thereof. Background technique [0002] With the rapid development of the electronic information industry, the application of thin film science is becoming more and more extensive. The sputtering method is one of the main technologies for preparing thin film materials, and the source material for sputtering deposited thin films is the target material. The film deposited by sputtering with the target has high density and good adhesion. Since the 1990s, new devices and new materials in the microelectronics industry have developed rapidly. Electronics, magnetism, optics, optoelectronics and superconducting thin films have been widely used in high-tech and industrial fields, prompting th...

Claims

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Application Information

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IPC IPC(8): C23C14/35C22C1/04C22C19/03C22F1/10
CPCC22C1/0433C22C19/03C22F1/10C23C14/3414C23C14/35
Inventor 吴宇宁袁志钟卿海标
Owner 南京达迈科技实业股份有限公司
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