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Surface acoustic wave device based on hafnium ferroelectric film and film bulk acoustic wave device

A surface acoustic wave device and thin-film bulk acoustic wave technology, which is applied in the electronic field, can solve the problems of CMOS process compatibility, chip system integration, space occupation, etc., and achieve the effects of reducing signal transmission distance, reducing equipment volume, and improving portability

Active Publication Date: 2019-12-20
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In terms of signal processing, resonators and filters based on surface acoustic waves and thin film bulk acoustic waves have been widely used in communication equipment such as smartphones and mobile base stations. At present, the piezoelectric material used for surface acoustic waves is mainly lithium niobate , lithium tantalate and other bulk materials and thin film materials such as aluminum nitride and zinc oxide. The piezoelectric materials used for thin film bulk acoustic wave devices are mainly aluminum nitride and zinc oxide thin films, of which lithium niobate, lithium tantalate and zinc oxide cannot It is compatible with the mainstream CMOS process, so it cannot be integrated with the corresponding chip system; although the aluminum nitride material is compatible with the CMOS process, it cannot be used in the storage field, so it cannot achieve system integration
[0005] In terms of environmental sensing, sensors based on surface acoustic wave devices and thin-film bulk acoustic wave devices have been widely used in detecting temperature, humidity, force, light, and chemical gases due to their advantages of fast response and high sensitivity. These sensors based on surface acoustic wave devices and thin film bulk acoustic wave devices are discrete devices that need to occupy a certain amount of space in the entire system and require specific interconnections, so the integration of the system cannot be further improved

Method used

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  • Surface acoustic wave device based on hafnium ferroelectric film and film bulk acoustic wave device
  • Surface acoustic wave device based on hafnium ferroelectric film and film bulk acoustic wave device
  • Surface acoustic wave device based on hafnium ferroelectric film and film bulk acoustic wave device

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Embodiment 1

[0030] In this embodiment, a single-port resonant surface acoustic wave device based on hafnium-based ferroelectric thin films is proposed, which has signal processing functions, and its cross-sectional structure is as follows figure 1 As shown, it includes a bottom electrode layer 102, a piezoelectric layer 103 and a top electrode layer 104 sequentially stacked on a substrate 101; the piezoelectric layer 103 of this embodiment adopts a hafnium-based ferroelectric thin film doped with zirconium, and the top electrode layer 104 is a plurality of interdigital electrodes arranged in sequence, and the corresponding interdigital electrodes respectively form an interdigital transducer and a reflective grid array.

[0031] The preparation process of the surface acoustic wave device in this embodiment is as follows: figure 2 As mentioned, the specific process is as follows:

[0032] Firstly, a layer of titanium nitride bottom electrode layer 102 is sputtered on the substrate 101 by ...

Embodiment 2

[0034] In this embodiment, a surface acoustic wave device based on a hafnium-based ferroelectric thin film is proposed, which is a delay line type and is mainly used to realize the sensing function. Its cross-sectional structure is as follows image 3As shown, it includes a bottom electrode layer 102, a piezoelectric layer 103 and a top electrode layer 104 stacked sequentially on a substrate 101, and the surface of the piezoelectric layer 103 between the top electrode layers 104 is also coated by drop coating, spin coating, electrostatic Spraying, chemical solution growth, or inkjet printing are provided with a sensitive film 105 for sensing the environment. The sensitive film detects environmental parameters corresponding to the substance by adsorbing related substances in the environment. The piezoelectric layer 103 of this embodiment adopts a hafnium-based ferroelectric film doped with silicon, and the doping concentration of silicon is 4%; the top electrode layer 104 is inp...

Embodiment 3

[0039] In this embodiment, an example of integrating a surface acoustic wave resonator, a sensor, and a ferroelectric storage unit to obtain device integration is proposed, such as Figure 4 As shown, it includes a surface acoustic wave resonator 201, a surface acoustic wave sensor 202, a ferroelectric storage unit (which may be a ferroelectric capacitor) 203 and six MOS field effect transistors (204-206, 208-210). The surface acoustic wave resonator 201 and the surface acoustic wave sensor 202 of the present embodiment can be obtained by the method in embodiment 1 and 2, an interdigital transducer in the surface acoustic wave resonator 201 has two lead-out ends, and the surface acoustic wave Each interdigital transducer in the wave sensor 202 jointly forms two lead-out ends. The ferroelectric capacitor 203 is used for storage function, and its structure is as follows Figure 5 As shown, it includes a bottom electrode layer 302, a ferroelectric thin film 303 and a top electro...

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Abstract

The invention discloses a surface acoustic wave device based on a hafnium ferroelectric film and a film bulk acoustic wave device, the surface acoustic wave device comprises any one or two of a resonance / filtering assembly and a sensing assembly which are integrated on a substrate, and each assembly comprises a bottom electrode layer, a piezoelectric layer and a top electrode layer which are stacked in sequence; the film bulk acoustic wave device comprises any one or two of a resonance / filtering assembly and a sensing assembly which are integrated on a substrate, and each assembly comprises abottom electrode layer, a piezoelectric layer and a top electrode layer which are stacked in sequence; the piezoelectric layers in the two types of acoustic wave devices are respectively prepared fromhafnium ferroelectric films doped with zirconium, aluminum or silicon by using an atomic layer deposition process. Two types of sound wave devices and storage devices can be prepared on the hafnium ferroelectric film, environmental perception, signal processing and storage can be integrated, and the integration degree and the working speed of electronic equipment can be improved.

Description

technical field [0001] The invention belongs to the field of electronic technology, and in particular relates to a surface acoustic wave device and a thin film bulk acoustic wave device based on a hafnium series ferroelectric thin film. Background technique [0002] With the vigorous development of the Internet of Things technology, intelligent electronic devices connected to the Internet of Things perceive various information in the environment through various sensors, and then send the perceived information to the processing unit for data analysis, processing and storage. Especially for intelligent driving, the relevant sensors perceive complex road conditions, and while collecting massive amounts of road condition information, signal processing and storage must also be completed. However, for conventional electronic equipment, environmental sensing, signal processing and data storage are separate and different parts, and a data transmission channel is required to transmit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H03H3/02H03H9/02H03H9/17H03H9/64
CPCH03H3/02H03H9/02543H03H9/02614H03H9/02637H03H9/174H03H9/64H03H2003/023
Inventor 任天令王方伟杨轶赵瑞婷简锦明
Owner TSINGHUA UNIV
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