Pyramid silicon-based photocathode with uniform pn homojunction layer and preparation method thereof

A homojunction and pyramid technology, applied in chemical instruments and methods, electrodes, coatings, etc., can solve the problems of complex operation, high toxicity, uneven pn homojunction layer, etc., to achieve safe preparation process and enhance stability. , Improve the efficiency of photoelectric water splitting

Inactive Publication Date: 2020-03-27
TIANJIN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0015] The present invention focuses on solving the uneven pn homojunction layer on the surface of the pyramidal silicon-based photocathode, and the technical problems of complex operation and high toxicity faced in the process of preparing the pyramidal silicon-based photocathode, and provides a uniform pn homogeneous The pyramidal silicon-based photocathode of the junction layer and the preparation method thereof effectively realize the preparation of a uniform pn homojunction layer on the pyramid-shaped silicon substrate, which improves the photogenerated voltage and stability; the preparation method is safe and simple in operation, and the raw materials are cheap and easy The photocatalytic performance is stable and repeatable

Method used

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  • Pyramid silicon-based photocathode with uniform pn homojunction layer and preparation method thereof
  • Pyramid silicon-based photocathode with uniform pn homojunction layer and preparation method thereof
  • Pyramid silicon-based photocathode with uniform pn homojunction layer and preparation method thereof

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Experimental program
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Effect test

Embodiment 1

[0047] (1) Silicon wafer etching: Cut the p-Si finished product into several small squares of 3cm×3cm, heat the etching solution (KOH solution with a mass fraction of 6%, isopropanol with a volume fraction of 3%) in a water bath to 80°C, and The cut silicon wafers were put neatly into the Teflon flower basket and then transferred to the prepared solution. Cover the beaker with plastic wrap and react in a water bath at 80°C for 25 minutes, then take out the silicon wafer with tweezers, rinse it with ultrapure water, and dry it with a nitrogen gun.

[0048] (2) Cleaning of the silicon wafer, adopting standard RCA cleaning technology to clean the pyramidal silicon substrate obtained in (1), is divided into three steps:

[0049] In the first step, follow V 浓硫酸 :V 过氧化氢 =3:1 Prepare the piranha solution, heat it in a water bath at 85°C, put the above-treated silicon chip into it after the temperature is constant, react for 10 minutes, then take it out, rinse it with ultrapure wate...

Embodiment 2

[0059] With embodiment (1) difference only lies in: (3) pn + Preparation of Si: In the second step, the rotational speed of the spin coater is set to 1500 rpm.

Embodiment 3

[0061] With embodiment (1) difference only lies in: (3) pn + Preparation of Si: In the second step, the rotational speed of the spin coater is set to 5500 rpm.

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Abstract

The invention belongs to the technical field of photoelectrochemical cell semiconductor electrodes, and discloses a pyramid silicon-based photocathode with a uniform pn homojunction layer and a preparation method thereof. The uniform pn homojunction layer is diffused on a pyramid morphology p-type silicon substrate, a titanium dioxide protective layer is deposited on an atomic layer on the pn homojunction layer, and platinum nanoparticles are photoelectrically deposited on the titanium dioxide protective layer to serve as a catalyst. The preparation method mainly comprises five steps of silicon wafer substrate pyramid morphology etching, surface cleaning, spin coating and high-temperature diffusion, titanium dioxide layer deposition and platinum catalyst loading. the uniform pn homojunction layer is effectively prepared on the pyramid-shaped silicon substrate, and the photo-generated voltage and the stability are improved; AND the preparation method has the advantages of safe and simple operation process, cheap and easily available raw materials, stable photoelectrocatalysis performance and good repeatability.

Description

technical field [0001] The invention belongs to the technical field of photoelectrochemical cell semiconductor electrodes, and in particular relates to a pyramidal silicon-based photocathode (pn) with a uniform pn homojunction layer. + Si / TiO 2 / Pt) and its preparation method, which can realize the construction of a uniform pn homojunction layer and improve the activity and stability of the catalyst. Background technique [0002] With the excessive consumption of non-renewable energy and the deteriorating environmental problems, the human demand for renewable and clean energy is increasing, and photocatalytic water splitting to produce hydrogen is a potential solution to this problem [1,2] . Among the many p-type semiconductors, single crystal silicon is widely used in microelectronics and photovoltaic industries due to its suitable energy band position, near-perfect bulk phase structure and abundant reserves on the earth, but its application in aqueous solution faces chal...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10C30B31/04C30B29/06C23C16/40C23C16/455C25D3/50C25D7/12C25B1/04C25B11/08
CPCC23C16/405C23C16/45525C25B1/04C25D3/50C25D7/12C30B29/06C30B31/04C30B33/10C25B1/55C25B11/051C25B11/069Y02E60/36Y02P20/133
Inventor 巩金龙王拓李鹤刘斌冯时佳李慧敏
Owner TIANJIN UNIV
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