Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Glass etching solution, high alumina-silica glass etching method and high alumina-silica glass with textures on surface

A high-alumina-silicate glass and etching solution technology, which is applied in the direction of surface etching composition, chemical instrument and method, telephone structure, etc., can solve the problem of poor etching effect of high-alumina-silicate glass and insufficient decoration of high-alumina-silicate glass surface pattern Satisfying aesthetic needs and other issues, achieving the effect of exquisite pattern, easy operation, simple and practical process

Active Publication Date: 2020-06-05
ZHENGZHOU HIHO OPTICAL TECH CO LTD
View PDF3 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention provides a glass etchant, which can be used to etch high aluminosilicate glass, so as to solve the problem of poor etching effect of the etchant in the prior art on high aluminosilicate glass and insufficient decoration of the surface pattern of the high aluminosilicate glass. Technical Issues in Satisfying Aesthetic Needs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Glass etching solution, high alumina-silica glass etching method and high alumina-silica glass with textures on surface
  • Glass etching solution, high alumina-silica glass etching method and high alumina-silica glass with textures on surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] ⑴. Prepare high-alumina-silicate glass snowflake effect special etching solution according to the following ratio (wt%): NH 4 F10.8%, NH 4 HF 2 21.5%, KHF 2 11.6%, HCL 5.8%, HNO 3 23.5%, KCL 3.8%, CuSO 4 1.7%, NaNO 3 3.5%, NaH 2 PO 4 3.8%, FeCL 3 2.2%, H 2 O 11.8%, fully stirred until the liquid is completely dissolved and transparent, that is, the glass etching solution is obtained.

[0028] ⑵. Cover and protect the side (tin side) of the original high-alumina silica glass that does not need to be etched with a sticky protective film.

[0029] (3) Clean the side of the original high-alumina-silicate glass that needs to be etched with deionized water, and put it into the etching solution in a wet state for immersion etching.

[0030] ⑷. Control the temperature of the etching solution at 20-25°C. Control etching time is 10-15 minutes.

[0031] (5) After reaching the etching time requirement, take out the etched glass from the etching solution in time, t...

Embodiment 2

[0033] (1) Carry out the preparation (wt%) of glass etchant according to the following ratio: NH 4 F 13.6%, NH 4 HF 2 16.5%, KHF 2 15.8%, HCL 7.6%, HNO 3 20.5%, KCL 4.6%, CuSO 4 2.8%, NaNO 3 8%, NaH 2 PO 4 3.0%, FeCL 3 2.7%, H 2 O 10.4%, fully stirred until the liquid is completely dissolved and transparent, that is, the special etching solution for high-alumina-silicate glass snowflake effect is prepared.

[0034] ⑵. Cover and protect the side (tin side) of the original high-alumina silica glass that does not need to be etched with a sticky protective film.

[0035] (3) Clean the side of the original high-alumina-silicate glass that needs to be etched with deionized water, and put it into the etching solution in a wet state for immersion etching.

[0036] ⑷. Control the temperature of the etching solution at 20-25°C. Control etching time is 10-15 minutes.

[0037] (5) After reaching the etching time requirement, take out the etched glass from the etching sol...

Embodiment 3

[0039] ⑴. Prepare high-alumina-silicate glass snowflake effect special etching solution according to the following ratio (wt%): NH 4 F15%, NH 4 HF 2 10%, KHF 2 8%, HCL 15%, HNO 3 15%, KCL 5%, CuSO 4 6%, NaNO 3 8%, NaH 2 PO 4 3%, FeCL 3 5%, H2 O 10%, fully stirred until the liquid is completely dissolved and transparent, that is, the special etching solution for snowflake effect of high-alumina silica glass is prepared.

[0040] (2) Cover and protect the side (tin side) of the high-alumina-silicate glass that does not need to be etched with a sticky protective film.

[0041] (3) Clean the side of the original high-alumina-silicate glass that needs to be etched with deionized water, and put it into the etching solution in a wet state for immersion etching.

[0042] ⑷. Control the temperature of the etching solution at 20-25°C. Control etching time is 10-15 minutes.

[0043] (5) After reaching the etching time requirement, take out the etched glass from the etchin...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of glass chemical etching, and particularly relates to a glass etching solution, a high alumina-silica glass etching method and high alumina-silica glass with textures on the surface. The glass etching liquid comprises the following raw materials in percentage by mass: 5-15 wt% of ammonium fluoride; 10-22 wt% of ammonium bifluoride; 8-18 wt% of potassium bifluoride, 5-15 wt% of hydrochloric acid, 15-30 wt% of nitric acid, 3-8 wt% of potassium chloride, 1.5-6 wt% of copper sulfate, 3-8 wt% of NaNO3, 3-8 wt% of NaH2PO4, 2-5 wt% of FeCl3 and 10-30 wt%of H2O. The glass etching solution can be used for etching high alumina-silica glass to form snowflake-like concave-convex textures on the surface of the high alumina-silica glass.

Description

technical field [0001] The invention belongs to the technical field of glass chemical etching, and in particular relates to a glass etching solution, a high-alumina-silicate glass etching method and a high-alumina-silicate glass with texture on the surface. Background technique [0002] With the advent of the 5G information age, in order to prevent the blocking and shielding of smartphone signals, the material selection of the back cover of the mobile phone is mainly concentrated in glass and ceramics. The field of glass back cover has been promoted and applied. If the 3D glass casing of mobile phones and other electronic devices can have snowflakes or other patterns that are popular with consumers, it will greatly enrich the decoration grade and connotation of the back cover of mobile phones and other electronic devices, and it will be easier Be favored by consumers. [0003] At present, the snowflake effect is only realized by acid etching technology on the surface of ord...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C15/00C09K13/08H04M1/02
CPCC03C15/00C09K13/08H04M1/026
Inventor 熊国祥
Owner ZHENGZHOU HIHO OPTICAL TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com