Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for growing multilayer tungsten diselenide single crystal by molten salt assisted chemical vapor deposition

A technology of chemical vapor deposition and tungsten diselenide, which is applied in the field of two-dimensional materials, can solve the problems of inability to realize double-layer and multi-layer controllable growth, poor performance, small single-layer size, etc., and achieve good dissolution and transportation capacity, The effect of less defect vacancies and enhanced size

Active Publication Date: 2021-06-11
HUAZHONG UNIV OF SCI & TECH
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For the growth and preparation of two-dimensional transition metal sulfides, the traditional chemical vapor deposition method still has a series of problems that need to be solved, such as insufficient quality, insufficient size, and insufficient performance: most of the grown tungsten diselenide films are It is a single layer and the size of the single layer is small; the controllable growth of double layers and multilayers cannot be realized; the development of miniaturization, light weight and simplification is limited for multi-temperature zones that require chemical vapor deposition equipment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for growing multilayer tungsten diselenide single crystal by molten salt assisted chemical vapor deposition
  • Method for growing multilayer tungsten diselenide single crystal by molten salt assisted chemical vapor deposition
  • Method for growing multilayer tungsten diselenide single crystal by molten salt assisted chemical vapor deposition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] Taking the growth of double-layer tungsten diselenide as an example, this example provides a method for growing double-layer tungsten diselenide by halide molten salt assisted chemical vapor deposition. The equipment diagram is as follows figure 1 As shown, the specific operation steps are as follows:

[0052] 1. Cleaning the substrate: Clean the pre-prepared sapphire substrate in the order of acetone, isopropanol, and deionized water, each ultrasonic cleaning for 10 minutes, and blow dry with a nitrogen gun after each step. Put it into a plasma cleaning machine for the final cleaning process. The parameter flow rate of argon gas is set to 40 standard milliliters per minute, the oxygen is 10 standard milliliters per minute, the power is a medium power of 10.15 watts, and the processing time is 3 minutes for a long time. After the cleaning process is completed, the entire sapphire substrate is cut into pieces of appropriate size on the processing table to match the corun...

Embodiment 2

[0068] In this embodiment, the mass and distance settings of the source are mainly changed, corundum boats with different boat depths are used, and the halide is selected as sodium chloride. This embodiment specifically includes the following steps:

[0069] 1. Cleaning the substrate: Clean the pre-prepared sapphire substrate in the order of acetone, isopropanol, and deionized water, each ultrasonic cleaning for 10 minutes, and blow dry with a nitrogen gun after each step. Put it into a plasma cleaning machine for the final cleaning process. The parameter flow rate of argon gas is set to 40 standard milliliters per minute, the oxygen is 10 standard milliliters per minute, the power is a medium power of 10.15 watts, and the processing time is 3 minutes for a long time. After the cleaning process is completed, the entire sapphire substrate is cut into pieces of appropriate size on the processing table to match the corundum boat.

[0070] 2. Weigh the sample: Use an electronic s...

Embodiment 3

[0076] In this embodiment, the type of halide is mainly changed, potassium iodide is selected as the halide, corundum boats with different boat depths are used, and the distance setting is changed. This embodiment specifically includes the following steps:

[0077] 1. Cleaning the substrate: Clean the pre-prepared sapphire substrate in the order of acetone, isopropanol, and deionized water, each ultrasonic cleaning for 10 minutes, and blow dry with a nitrogen gun after each step. Put it into a plasma cleaning machine for the final cleaning process. The parameter flow rate of argon gas is set to 40 standard milliliters per minute, the oxygen is 10 standard milliliters per minute, the power is a medium power of 10.15 watts, and the processing time is 3 minutes for a long time. After the cleaning process is completed, the entire sapphire substrate is cut into pieces of appropriate size on the processing table to match the corundum boat.

[0078]2. Weigh the sample: Use an electr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
thicknessaaaaaaaaaa
sizeaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the field of two-dimensional materials, and discloses a method for growing a multilayer tungsten diselenide single crystal by molten salt-assisted chemical vapor deposition. The method uses a preset temperature condition in a small reaction chamber at a preset temperature Under high temperature conditions, the halide can melt and react with the tungsten source material to form an intermediate product with a melting point lower than that of the tungsten source material, and the carrier gas flow can carry the gaseous selenium element produced by the selenium source material and the gaseous tungsten element produced by the intermediate product on the substrate. The multilayer tungsten diselenide single crystal is grown based on the principle of chemical vapor deposition. The present invention improves the key reaction participants and reaction chamber of the preparation method, uses halides and tungsten source materials to participate in the reaction, and uses halide molten salts to react with tungsten source materials to generate intermediate products with a melting point lower than the tungsten source materials. The method can effectively control chemical vapor deposition to grow a multilayer tungsten diselenide single crystal, has good controllability and can produce a large-sized multilayer tungsten diselenide single crystal.

Description

technical field [0001] The invention belongs to the field of two-dimensional materials, more specifically, relates to a method for molten salt-assisted chemical vapor deposition growth (CVD) multilayer tungsten diselenide single crystal, especially a molten salt-assisted single-temperature zone chemical vapor deposition growth method Method for multilayer tungsten diselenide single crystal. Background technique [0002] Transition metal dichalcogenides (TMDC) are compounds with a two-dimensional structure, and transition metal dichalcogenides also have a two-dimensional structure. Taking molybdenum sulfide or tungsten sulfide as an example, molybdenum and tungsten atoms are arranged in a single layer, sandwiched by sulfur elements in the same layered structure. The interaction force between layers is van der Waals force, while the interior of molecules is a covalent bond formed by electrostatic interaction force. For most 2D materials, their preparation methods mainly fall...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C30B25/00C30B29/46C30B33/00C23C16/30C23C16/448C23C16/455C23C16/56
CPCC23C16/305C23C16/448C23C16/455C23C16/56C30B25/00C30B29/46C30B33/00
Inventor 吴燕庆宋健李学飞
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products