Perovskite photoelectric detector based on DNT-PH composite hole transport layer and preparation method of perovskite photoelectric detector
A technology of DNT-PH and hole transport layer, which is applied in the field of perovskite photodetectors and its preparation, can solve the problems of low mobility, short life, poor device stability, etc., and achieve simple synthesis, stability and improved life , low-cost effect
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Embodiment 1
[0042] as attached Figure 1-2, clean the substrate composed of transparent substrate and conductive cathode ITO, and dry it with nitrogen after cleaning; spin-coat SnO on the surface of transparent conductive cathode ITO 2 (water dispersion, spin-coating speed is 3000rpm, spin-coating time 30s, thickness 20nm) prepare electron transport layer, and carry out thermal annealing (annealing temperature 150 ℃, annealing time 15min) of the thin film formed; Spin on the electron transport layer Coated with MAPbI 3 The precursor solution (using DMF as a solvent to form a mixed solution with a solute concentration of 500mg / mL, spin-coating speed of 4000rpm, spin-coating time of 35s, and thickness of 500nm) was used to prepare the perovskite photoactive layer. The titanite activated carbon layer was quickly dripped with chlorobenzene solution to inhibit the disordered crystallization of perovskite, and then annealed at a temperature of 110°C for 20 minutes; the surface of the perovskit...
Embodiment 2
[0044] as attached Figure 1-2 , based on Example 1, the substrate composed of transparent substrate and conductive cathode ITO is cleaned, and dried with nitrogen after cleaning; spin-coating SnO on the surface of transparent conductive cathode ITO 2 (water dispersion, spin coating speed is 3000rpm, spin coating time 30s, thickness 25nm) to prepare the electron transport layer, and carry out thermal annealing (annealing temperature 150 ℃, annealing time 15min) of the thin film formed; Spin on the electron transport layer Coated with MAPbI 3 The precursor solution (using DMF as a solvent to form a mixed solution with a solute concentration of 500mg / mL, spin-coating speed of 4500rpm, spin-coating time of 30s, and a thickness of 300nm) was used to prepare the perovskite photoactive layer. The titanite activated carbon layer was quickly dripped with chlorobenzene solution to inhibit the disordered crystallization of perovskite, and then annealed at a temperature of 115°C for 18 ...
Embodiment 3
[0046] as attached Figure 1-2 , based on Example 1, the substrate composed of the substrate and the transparent conductive cathode ITO is cleaned, and dried with nitrogen after cleaning; the surface of the transparent conductive cathode ITO is spin-coated with SnO 2 (water dispersion, spin-coating speed is 3000rpm, spin-coating time 30s, thickness 30nm) prepare electron transport layer, and carry out thermal annealing (annealing temperature 150 ℃, annealing time 15min) to the thin film formed; Spin on the electron transport layer Coated with MAPbI 3 The precursor solution (using DMF as a solvent to form a mixed solution with a solute concentration of 500mg / mL, spin-coating speed of 5000rpm, spin-coating time of 25s, and thickness of 700nm) was used to prepare the perovskite photoactive layer. The titanite activated carbon layer was quickly dripped with chlorobenzene solution to inhibit the disordered crystallization of perovskite, and then annealed at 120°C for 15 minutes; t...
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