Implant activation method and activated implant
An activation method and implant technology, applied in dental implants, medical science, dentistry, etc., can solve the problems of cumbersome and time-consuming, inability to secondary sterilization, low activation power, etc., and achieve high hydrophilicity and biological activity. Clinical use requirements and effects of multiple surgical preparation times
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Embodiment 1
[0122] Pre-treatment: Prepare a small implant disc with a diameter of 10 mm and a thickness of 1 mm by machining, and use rutile sand to perform sandblasting on the surface of the above implant, with a sandblasting distance of 8 mm and an angle of 45°. for 15s to form a first-level hole. The surface of the implant was etched with sulfuric acid at 60°C for 60 minutes to form secondary holes.
[0123] Activation: Before the experiment, take out the pre-treated implant, and activate the small disc under the excimer lamp activator. The excimer lamp activator provides 172nm and 7.2eV photons to the implant to be activated Energy of vacuum ultraviolet light. The activation time is 1min, and the distance between the activation instrument and the small wafer is 30mm. Test immediately after activation.
[0124] Among them, the structure of the excimer lamp is as image 3 As shown, it includes an inner quartz tube A and an outer quartz tube B coaxially arranged, and an airtight annu...
Embodiment 2
[0130] Pre-treatment: First prepare a small disc with a diameter of 10 mm and a thickness of 1 mm by machining, and use rutile sand to blast the surface of the implant with a blasting distance of 8 mm, an angle of 45°, and a time of 15 seconds. A first-order hole is formed. The surface of the implant was etched with sulfuric acid at 60°C for 60 minutes to form secondary holes.
[0131] Activation: Before the experiment, take out the pre-treated implant, and activate the small disc under the excimer lamp activator. The excimer lamp activator provides 172nm and 7.2eV photons to the implant to be activated Energy of vacuum ultraviolet light. The activation time is 1min, and the distance between the activation instrument and the small wafer is 30mm. After activation, place it in the air for 15 minutes before testing.
[0132] The used excimer lamp of this embodiment is with embodiment 1.
[0133] Test data: contact angle and surface element content, test equipment and test con...
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