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Acrylic resin and preparation method and application thereof

A technology of acrylic resin and acrylic monomer, which is applied in the field of photoresist, can solve the problems that cannot meet the requirements of 65nm photolithography process, and achieve the effect of reducing the concentration

Active Publication Date: 2021-01-05
NINGBO NATA OPTO ELECTRONICS MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the above-mentioned deficiencies of the prior art, to provide a kind of acrylic resin and its preparation method and application, to solve the problem that the number average molecular weight distribution of the existing acrylic resin can only be below 1.5 and cannot meet the requirements of 65nm photolithography process technical problem

Method used

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  • Acrylic resin and preparation method and application thereof
  • Acrylic resin and preparation method and application thereof
  • Acrylic resin and preparation method and application thereof

Examples

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preparation example Construction

[0016] The embodiment of the present invention provides a method for preparing an acrylic resin. Described acrylic resin preparation method comprises the steps:

[0017] The acrylic acid monomer, cuprous bromide, ligand, initiator and reducing agent are mixed in a reaction solvent, and then polymerized; wherein, the reducing agent is simple silver, and the reducing agent is sufficient.

[0018] In this way, in the preparation method of the acrylic resin, on the basis of the traditional ATRP polymerization process, a mild reducing agent of zero-valent silver is added, so that the monovalent copper ion in the polymerization reaction process is kept at a constant low concentration, so that the active polymerization reaction process can be control, so that the number average molecular weight distribution of the polymerization reaction process is kept in a very low range, that is, the acrylic resin produced by the polymerization method of the acrylic resin has a lower number averag...

Embodiment 1

[0040] The present embodiment provides a kind of preparation method of acrylic resin, comprises the following steps:

[0041] (1) Clean the inside of the 5L reactor with pure water, dry it with nitrogen gas for later use, fill the reactor with nitrogen gas for later use, mix butyl acrylate, adamantyl acrylate, butyrolactone acrylate, ethyl acetate, bromine Cuprous chloride, methyl-triamine, and silver elemental substances are respectively in proportions of 50g: 50g: 50g: 200g: 1.2g: 2g: 0.05g, weighed, put into the reaction kettle, stir and mix uniformly and set aside for use;

[0042] (2) Heat up the reactor to 69°C, put 0.1g of ethyl 2-bromoisobutyrate into the reactor, and the reaction starts; control the temperature of the reactor, and continue the reaction for 7 hours;

[0043] (3) Cool the reactor temperature to room temperature, drop into diethyl ether 1000g in the kettle, produce a large amount of precipitation, export liquid, retain the solid in the reactor; inject so...

Embodiment 2

[0046] The present embodiment provides a kind of preparation method of acrylic resin, comprises the following steps:

[0047] (1) Clean the inside of the 5L reactor with pure water, dry it with nitrogen for use; fill the reactor with nitrogen for use, and mix methyl acrylate, methyl adamantyl acrylate, propyl butyrolactone, methanol , cuprous bromide, butyl-triamine, and silver are 120g: 30g: 50g: 200g: 1.4g:

[0048] 4.8g: 0.07g, put into the reaction kettle after weighing, stir and mix evenly and set aside;

[0049] (2) Reactor is heated up to 80 DEG C, in the reactor, drop into the initiator shown in 1g above general formula III, reaction begins; Control reactor temperature, continue reaction 7 hours;

[0050] (3) Cool the temperature of the reactor to room temperature, drop into the diethyl ether 3000g in the kettle, produce a large amount of precipitation, export the liquid, keep the solid in the reactor; inject the solvent, continue to drop into the diethyl ether in the...

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Abstract

The invention provides acrylic resin as well as a preparation method and application thereof. The preparation method of the acrylic resin comprises the steps of mixing an acrylic monomer, cuprous bromide, a ligand, an initiator and a reducing agent in a reaction solvent, and then carrying out polymerization reaction, wherein the reducing agent is elemental silver, and the quantity of the reducingagent is sufficient. According to the preparation method of the acrylic resin, zero-valent elemental silver is used as a mild reducing agent, monovalent copper ions in the polymerization process can be kept constant, the active polymerization reaction process is controllable, and the acrylic resin generated through polymerization has lower number-average molecular weight distribution, for example,the number-average molecular weight distribution of the acrylic resin is less than 1.2.

Description

technical field [0001] The invention belongs to the technical field of photoresists, and in particular relates to an acrylic resin and its preparation method and application. Background technique [0002] As a photosensitive material, photoresist is a key processing material for integrated circuit fine processing technology. Among them, acrylic resin, as a part of the photoresist composition, determines the performance of the photoresist, and is currently a hot spot in the research of photoresist materials. [0003] With the continuous development of manufacturing technology, the technical requirements for photoresist are getting higher and higher. In order to meet the increasingly stringent process conditions, it is necessary to develop photoresist products with higher performance. Compared with traditional I-line, G-line, and KrF photoresists, ArF photoresist products have excellent resolution, which can reach below 90nm. ArF photoresist is composed of resin, photosensit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/18C08F220/14C08F4/50G03F7/004
CPCC08F220/1804C08F220/1811C08F220/14C08F4/50G03F7/004C08F2438/01C08F220/1807Y02P20/55
Inventor 马潇周浩杰杨鑫楷夏正建杨平原毛智彪许从应
Owner NINGBO NATA OPTO ELECTRONICS MATERIAL CO LTD
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