Schottky diode hydrogen sensor core
A Schottky diode and sensor core technology, applied in the field of hydrogen sensors, can solve the problems of unfavorable hydrogen sensitive performance, increase energy consumption, reduce the hydrogen sensitive performance of Schottky diode hydrogen sensitive core body, etc., and achieve excellent anti-humidity interference performance. , to solve the effect of decreased sensitivity
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Embodiment 1
[0032] ① Cut out a metal titanium sheet, after degreasing treatment, put it in a tube furnace and oxidize it at 680°C for 2 hours in the air atmosphere, and prepare titanium dioxide (TiO2) on the surface of the titanium sheet. 2 ) semiconductor layer.
[0033] ② Ultrasonic disperse 75mg of graphite oxide (GO) powder in 150mL of absolute ethanol to obtain a graphene oxide-ethanol dispersion with a concentration of 0.5mg / mL. 2 The titanium sheet of the semiconductor layer is used as the electrophoretic positive electrode, and the inert metal sheet or graphite sheet is used as the electrophoretic negative electrode. Graphene oxide is deposited on the TiO under the conditions of a deposition voltage of 50V and a deposition time of 60min. 2 surface of the semiconductor layer.
[0034] ③A platinum (Pt) target with a purity of 99.99% (mass fraction) is installed on the cathode target of the magnetron sputtering system, and the sample obtained in the above two steps is placed in the ...
Embodiment 2
[0038] ①Cut a piece of aluminum foil to serve as the current collector layer, use metal tungsten (W) as the target by magnetron sputtering, and use a mixed gas of argon and oxygen to deposit tungsten trioxide (WO) on one side of the aluminum foil. 3 ) film, get WO 3 semiconductor layer.
[0039] ② Ultrasonic disperse 30mg of boron nitride nanosheets in 300mL of isopropanol to obtain a boron nitride dispersion, add 1mL of the ethanol dispersion of boron nitride nanosheets to WO 3 On the surface of the semiconductor layer, a boron nitride layer capable of blocking the diffusion of hydroxyl groups is obtained.
[0040] ③A palladium (Pd) target with a purity of 99.99% (mass fraction) is installed on the cathode target of the magnetron sputtering system, and the samples obtained in the above two steps are placed in the cavity, and the surface of the boron nitride layer is sputtered with Pd , to obtain the hydrogen cracked metal Pd layer.
[0041] ④Finally, the fine copper wire (...
Embodiment 3
[0044] ① Intercept a piece of Cu foil to serve as the current collector layer, use the magnetron sputtering method to use metal tin (Sn) as the target, and use a mixed gas of argon and oxygen to deposit tin dioxide (SnO2) on one side of the aluminum foil. 2 ) film, get SnO 2 semiconductor layer.
[0045] ②In SnO 2 Silicon nitride is deposited on the surface of the semiconductor layer by magnetron sputtering to obtain a silicon nitride layer that can block the diffusion of hydroxyl groups.
[0046] ③A platinum-iridium alloy (Pt-Ir) target with a purity of 99.99% (mass fraction) was installed on the cathode target of the magnetron sputtering system, and the samples obtained in the above two steps were placed in the cavity, and the SnO 2 The surface of the layer is sputtered with a platinum-iridium alloy to obtain a hydrogen-cracked platinum-iridium alloy layer.
[0047] ④Finally, the fine copper wire (conductive lead) is glued to the undeposited SnO on the Cu current collecto...
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