A kind of sic particle with visible light response and preparation method thereof
A technology of visible light and particles, applied in the field of materials, can solve the problems of lattice destruction bulk phase or surface, etc., and achieve the effect of short reaction time, good visible light response performance, and clean preparation process
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Embodiment 1
[0034] A preparation method of SiC particles with visible light response, comprising the following steps:
[0035] (1) Preheating the hexagonal 6H-SiC particles (particle size is 5 μm) in a muffle furnace at 700°C for 2h;
[0036] (2) the SiC particle after preheating treatment in step (1) is soaked and etched with hydrofluoric acid HF to clean its surface, remove the oxide layer on its surface and other organic impurities attached to its surface, etc.;
[0037] (3) compressing the SiC particles obtained in step (2) on a quartz glass substrate, and ensuring that the surface flatness of the sample after the tableting is ±0.1 mm;
[0038] (4) irradiating the SiC particles subjected to the tableting treatment in step (3) for 8 seconds with a laser (there is a tableting glass between the SiC particles and the laser irradiation source) to obtain brown SiC particles, and the parameters of the laser are selected is: wavelength 1064nm; power 1W; frequency 1000Hz; pulse width 8ns;
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Embodiment 2
[0044] A preparation method of SiC particles with visible light response, comprising the following steps:
[0045] (1) Preheating the hexagonal 6H-SiC particles (particle size is 5 μm) in a muffle furnace at 700°C for 2h;
[0046] (2) the SiC particle after preheating treatment in step (1) is soaked and etched with hydrofluoric acid HF to clean its surface, remove the oxide layer on its surface and other organic impurities attached to its surface, etc.;
[0047] (3) compressing the SiC particles obtained in step (2) on a quartz glass substrate, and ensuring that the surface flatness of the sample after the tableting is ±0.1 mm;
[0048] (4) irradiating the SiC particles subjected to the tableting treatment in step (3) for 8 seconds with a laser (there is a tableting glass between the SiC particles and the laser irradiation source) to obtain brown SiC particles, and the parameters of the laser are selected is: wavelength 532nm; power 1W; frequency 1000Hz; pulse width 8ns;
[...
Embodiment 3
[0051] A preparation method of SiC particles with visible light response, comprising the following steps:
[0052] (1) Preheating the hexagonal 6H-SiC particles (particle size is 5 μm) in a muffle furnace at 700°C for 2h;
[0053] (2) the SiC particle after preheating treatment in step (1) is soaked and etched with hydrofluoric acid HF to clean its surface, remove the oxide layer on its surface and other organic impurities attached to its surface, etc.;
[0054] (3) compressing the SiC particles obtained in step (2) on a quartz glass substrate, and ensuring that the surface flatness of the sample after the tableting is ±0.1 mm;
[0055] (4) irradiating the SiC particles subjected to the tableting treatment in step (3) for 8 seconds with a laser (there is a tableting glass between the SiC particles and the laser irradiation source) to obtain brown SiC particles, and the parameters of the laser are selected is: wavelength 1064nm; power 3W; frequency 1000Hz; pulse width 8ns;
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