Ion-controlled spin-wave transistor and method of making the same
A technology of spin wave and transistor, which is applied in the field of ion-regulated spin wave transistor and its preparation, can solve problems such as low loss of spin wave, long-distance transmission, hindering application, etc., achieve low power consumption, realize The effect of electric field regulation and avoidance of Joule heating
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Embodiment 1
[0033] In this embodiment, an ion-regulated spin wave transistor includes a gadolinium gallium garnet (GGG) single crystal substrate, and a bottom electrode layer platinum (Pt) and a magnetic thin film yttrium iron garnet sequentially formed on the substrate Ionite (YIG), an ion layer-top electrode layer heterojunction formed on a magnetic thin film, and a microwave antenna located on both sides of the ion layer-top electrode layer heterojunction. Among them, the ion layer is made of nano-oxide hydrogen storage material tungsten trioxide (WO 3 ); the top electrode and microwave antenna are chromium / gold (Cr / Au).
[0034] The preparation method of the ion-controlled spin wave transistor of the present embodiment is as follows:
[0035] Step 1. Soak the gadolinium gallium garnet (GGG) single crystal substrate in a mixed solution of hydrogen peroxide and concentrated sulfuric acid with a volume ratio of 1:1 for 15 minutes, and then use acetone, alcohol and deionized water for ul...
Embodiment 2
[0046] In this embodiment, an ion-regulated spin wave transistor includes a gadolinium gallium garnet (GGG) single crystal substrate, and a bottom electrode layer platinum (Pt) and a magnetic thin film doped with bismuth sequentially formed on the substrate of thulium iron garnet (TmBiIG), an ion layer-top electrode layer heterojunction formed on a magnetic thin film, and a microwave antenna located on both sides of the ion layer-top electrode layer heterojunction. Among them, the ion layer is lithium ion oxide LiCoO 2 ; The top electrode and microwave antenna are chromium / gold (Cr / Au).
[0047] Step 1. Soak the gadolinium gallium garnet (GGG) single crystal substrate in a mixed solution of hydrogen peroxide and concentrated sulfuric acid with a volume ratio of 1:1 for 15 minutes, and then use acetone, alcohol and deionized water for ultrasonic cleaning in sequence Substrate, ultrasonic time is 10 minutes;
[0048] Step 2, using a DC magnetron sputtering method to grow a 20n...
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