Preparation method of BVO/CN/Co photo-anode sensor
A sensor and photoanode technology, applied in the field of sensors, can solve the problems of complex operation, unfavorable practical application, increase of sensor cost, etc., and achieve the effect of reducing manufacturing cost, increasing reactive active sites, and improving photoelectric performance
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[0031] 1. This embodiment relates to a method for preparing a BVO / CN / Co photoanode sensor. figure 1 Shown: including the following steps:
[0032] Step 1, preparation of bismuth vanadate substrate:
[0033] Dissolve 3mmol of bismuth vanadate pentahydrate and 40mmol of sodium iodide in 100ml of ultrapure water, adjust the pH of the solution to 1.2 with nitric acid, add 0.0135mol of ethanol solution of p-benzoquinone, stir evenly, and obtain an electrodeposition solution;
[0034] A three-electrode system is adopted, the working electrode is a cleaned FTO, the counter electrode is a platinum sheet, and the reference electrode is a silver silver chloride reference electrode; the deposition potential is -0.5V, and the deposition time is 600 seconds to obtain a bismuth oxyiodide film;
[0035]Coat 40ul of vanadyl acetylacetonate solution on the bismuth oxyiodide film, dry at 50°C, and anneal in a muffle furnace at 450°C for 60 minutes to obtain a bright yellow film;
[0036] Remo...
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