Pressure sensor, pressure sensing array and preparation method thereof
A pressure sensor, resistive pressure technology, applied in the field of sensing, can solve the problems of low sensing sensitivity and unsuitability for pressure sensing arrays, etc., and achieve the effects of enhanced sensitivity, reduced area, and reduced operating voltage
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[0070] Not only that, this specific embodiment also provides a method for preparing the pressure sensing array as described above, image 3 It is a flow chart of the preparation method of the pressure sensing array in the specific embodiment of the present invention, Figure 4-Figure 11 It is a schematic diagram of the main process structure in the process of preparing the pressure sensing array according to the specific embodiment of the present invention. The structure of the pressure sensor in the pressure sensor array prepared in this specific embodiment can be found in figure 1 , the equivalent circuit diagram of the prepared pressure sensing array can be found in figure 2 . Such as Figure 1-Figure 11 Shown, the preparation method of described pressure sensor array, comprises the steps:
[0071] Step S31 , providing a substrate 100 .
[0072] Specifically, the substrate 100 can be ultrasonically cleaned with ethanol solution, acetone solution and deionized water, d...
Embodiment 1
[0098] The pressure sensing array is prepared through the following specific steps:
[0099] (1) Utilize ethanol solution, acetone solution and deionized water ethylene terephthalate (PET) substrate (namely described substrate 100) to carry out ultrasonic cleaning, dry after cleaning, adopt oxygen plasma or ultraviolet light / treating the surface of the substrate 100 with ozone;
[0100] (2) Prepare the row drive line 211 and the bottom gate electrode 101 of the thin film transistor on the substrate 100 by vacuum evaporation;
[0101] (3) Preparing a PVC insulating layer film on the bottom gate electrode 101 and the substrate 100 by using a spin coating process, and then performing ultraviolet crosslinking heating and drying to form the insulating layer 102;
[0102] (4) Prepare the column data line 221, the source electrode 103 and the drain electrode 104 of the thin film transistor on the insulating layer 102 by means of vacuum evaporation;
[0103] (5) modifying a layer o...
Embodiment 2
[0111] The pressure sensing array is prepared through the following specific steps:
[0112] (1) Utilize ethanol solution, acetone solution and deionized water to ultrasonically clean the polyethylene naphthalate (PEN) substrate, dry after cleaning, and use oxygen plasma or ultraviolet light / ozone to treat the substrate surface;
[0113] (2) Prepare row drive lines and bottom gate electrodes of thin film transistors on the substrate by means of inkjet printing;
[0114] (3) Forming a silicon dioxide insulating layer on the surface of the gate electrode by a plasma-enhanced chemical vapor deposition process;
[0115] (4) Prepare column data lines, source electrodes and drain electrodes of thin film transistors on the silicon dioxide insulating layer by means of inkjet printing;
[0116] (5) Forming an indium gallium zinc oxide (IGZO) semiconductor layer on the surface of the insulating layer by plasma enhanced chemical vapor deposition and photolithography;
[0117] (6) Prepa...
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