Semiconductor composite photo-anode, production method and application
A compound light and semiconductor technology, applied in the field of photoelectrochemistry, can solve the problems of high carrier recombination rate and limited photoresponse range of semiconductor materials, so as to improve utilization efficiency, improve photogenerated cathodic protection effect, and improve electron hole transport capacity Effect
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2022-02-08
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Abstract
Description
technical field
[0001] The invention belongs to the field of photoelectrochemistry, and specifically relates to a binary semiconductor composite photoanode, a self-assembled ternary semiconductor composite photoanode, a preparation method, and an application in photogenerated cathodic protection. Background technique
[0002] As we all know, corrosion has caused a lot of losses all over the world, and the existing anti-corrosion methods consume both energy and materials. Therefore, an energy-saving and environment-friendly anti-corrosion technology is urgently needed. Photogenerated cathodic protection technology is a new type of cathodic protection technology, which is a research hotspot in the field of corrosion protection in recent years. When using photogenerated electrons for cathodic protection of protected metals, one is to select semiconductor materials that can be excited by light to generate photoelectrons; The requirement to transfer and cathodically polarize the...
Examples
Embodiment 1
[0033] Example 1 Preparation of semiconductor composite photoanode and its performance testing
[0034] 1. Preparation method
[0035] (1) FTO (conductive glass) pretreatment
[0036] Cut the FTO into small pieces with a size of about 1.5×1cm, then put the FTO into a beaker, and ultrasonically clean it with acetone, ethanol, and distilled water for about 15 minutes for later use.
[0037] (2) WO 3 Preparation of the seed layer
[0038] 0.625 g of tungstic acid and 0.25 g of polyethylene glycol-8000 were dissolved in 10 mL of 30 wt % hydrogen peroxide to obtain a yellow solution. Use a pipette gun to drop-coat the solution onto the pretreated FTO, and put it on a homogenizer for spin-coating at a speed of 3000 rpm for 30 s. After the spin coating, the glass sheet was quickly heated in an oven at 100 °C for 10 min, and finally annealed at 500 °C for 2 h in a tube furnace with a heating rate of 3 °C / min, finally forming WO 3 seed layer.
[0039] (3) Preparation of WO-coated...