Method for manufacturing selective texturing heterojunction solar cell
A technology of solar cells and manufacturing methods, applied in the direction of final product manufacturing, chemical instruments and methods, sustainable manufacturing/processing, etc., can solve problems such as high defect state density, open circuit voltage drop, and increase the recombination probability of photogenerated carriers. Achieve the effects of cost reduction, enhanced anti-reflection effect, and reduced production process
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[0024] The present invention will be further explained below in conjunction with the accompanying drawings and specific embodiments.
[0025] A method for selectively making textured heterojunction solar cells, combining the attached Figure 8 shown, including the following steps:
[0026] Step 1: Clean the monocrystalline silicon wafer with a cleaning solution at 60-85° C. for 60-300 seconds. The cleaning solution is a mixture of potassium hydroxide, hydrogen peroxide and water at a volume ratio of 1:1:6.
[0027] Step 2: Alkali etching the monocrystalline silicon wafer treated in Step 1 with 60-85° C., 5-25 wt % potassium hydroxide solution for 60-300 seconds, and the etching depth is greater than 5 μm to remove cutting damage.
[0028] Step 3: The single crystal silicon wafer treated in Step 2 is used to make a retardation layer on the required selective texturing area on the surface of the retardation material.
[0029] The selection principle of delaying material: it is...
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