Method for preparing antifriction wear-resistant TiAlN/TiAlCN multilayer composite film
A multi-layer composite and thin film technology, which is applied in coating, metal material coating process, vacuum evaporation plating, etc., can solve the problems of coating controllable performance limitation, low internal stress, low carbon content, etc., to improve the application Performance and promotion, the effect of improving the bonding strength of the film base and reducing the interfacial stress
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Embodiment 1
[0051] (1) Substrate pretreatment: First, the single crystal silicon substrate and the single-sided polished 304 stainless steel substrate were washed with soapy water and rinsed with deionized water, and then placed in acetone solution and anhydrous ethanol solution for ultrasonic cleaning for 15 min respectively. Surface contaminants were then placed in a 5000-mesh diamond micropowder suspension for ultrasonic cleaning for 0.5 min to improve the bonding strength of the film substrate, and then the substrate was rinsed and dried for use.
[0052] (2) The pretreated substrate was fixed on the rotating sample stage of the multi-excitation source vacuum coating device, the high-purity silicon target and the aluminum target were respectively installed on the targets of RF and DC pulsed magnetron sputtering, and the high-purity titanium and The graphite target was installed on the evaporation cathode of DC magnetic filtration and pulsed cathode arc, and the distances between the su...
Embodiment 2
[0059] (1) Substrate pretreatment: First, the single crystal silicon and single-sided polished 304 stainless steel substrates were washed with soapy water and rinsed with deionized water, and then placed in acetone solution and absolute ethanol solution for ultrasonic cleaning for 15 min respectively to remove the surface. Contaminants, then placed in 8000-mesh diamond powder suspension for ultrasonic cleaning for 2 min to improve the bonding strength of the film substrate, and then the substrate was rinsed and dried for use.
[0060] (2) The pretreated substrate was fixed on the rotating sample stage of the multi-excitation source vacuum coating device, the high-purity silicon target and the aluminum target were respectively installed on the targets of RF and DC pulsed magnetron sputtering, and the high-purity titanium and The graphite target was installed on the evaporation cathode of DC magnetic filtration and pulsed cathodic arc, and the distances between the substrate and ...
Embodiment 3
[0067] (1) Substrate pretreatment: First, the single crystal silicon and single-sided polished 304 stainless steel substrates were washed with soapy water and rinsed with deionized water, and then placed in acetone solution and absolute ethanol solution for ultrasonic cleaning for 15 min respectively to remove the surface. Contaminants, then placed in a 10000 mesh diamond powder suspension for ultrasonic cleaning for 5 min to improve the bonding strength of the film substrate, and then the substrate was rinsed and dried for use.
[0068] (2) The pretreated substrate was fixed on the rotating sample stage of the multi-excitation source vacuum coating device, and the high-purity silicon target and the aluminum target were respectively installed on the targets of RF and DC pulsed magnetron sputtering. The graphite target was installed on the evaporation cathode of DC magnetic filtration and pulsed cathodic arc, and the distances between the substrate and the sputtering target and ...
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