Smearing type natural cleaning soilless mask and preparation method thereof

Abstract

The invention relates to the field of cosmetics, in particular to a smearing type natural cleaning soilless mask and a preparation method thereof, and the mask comprises water, polydextrose substances, a surfactant, a thickening agent and a humectant. The smearing type natural clean soilless mask is a novel two-in-one natural soilless smearing type mask, most of the raw materials are plant source components, and the smearing type natural clean soilless mask is safe, degradable, environmentally friendly and free of irritation. A mild surfactant is compounded with a proper amount of adsorptive starch to synergistically act on skin cuticle, a specific polydextrose substance is used as a natural adsorbent, the deep cleaning advantage of a traditional clay type mud film is reserved, strong adhesive force brought by the traditional clay type mud film is also avoided, and the special surfactant is matched, so that the clay type mud film has the characteristic of being easy to clean; and meanwhile, the defect that cleaning products are easy to tighten is avoided. The smearing type mask with the two-in-one function has the dual functions of skin care and cleaning, and the skin care steps can be reduced.

Description

technical field [0001] The present invention relates to the field of cosmetics, and more particularly, the present invention relates to a smear-type natural cleansing and soilless face mask and a preparation method thereof. Background technique [0002] People's dependence on masks has increased exponentially, and the long-term wearing of masks makes the skin environment in a precariously humid and sultry environment, and the shroud of parked skin care products not only breaks the micro-ecological balance of the skin, but also aggravates the skin. The bacteria grow on the surface, and the pollution of the external environment and the superposition of make-up further irritate the skin. Therefore, in the post-pandemic era, the principle of proper skin subtraction, that is, the cleaning of "mask-type skin", has become an increasingly urgent need. [0003] Daily facial cleanser and regular cleansing mask are two ways to reduce the burden on the skin. Although they can clean up ...

AI Technical Summary

Problems solved by technology

[0003] Daily facial cleanser and regular cleansing mask are two ways to reduce the burden on the skin. Although they can clean up the metabolites secreted by the skin in time and prevent the accumulation of cutin and wrinkles, on the one hand, most facial cleansers contain soap base or sulfuric acid. Salt surfactants are easy to over-clean, taking away the lipids of the stratum corneum itself while leaving sodium fatty acid, resulting in dry and tight skin, and the alkaline environment inactivates the skin's sphingomyelin, thus destroying the skin's own Metabolism and barrier function; on the other hand, most cleansing masks contain a large amount of non-natural clay solid particles with strong adsorption and a large number of mineral sources, which penetrate deep into the pores to absorb dirt and old dead skin cells, but at the same time open the pores, and leave behind the skin. Degradation, easy to block pores, resulting in irreversible increase of pores, and the traditional mud mask needs to be combined with cleansing, not only brings more care steps to consumers, but also because of the secondary cleansing of facial cleanser, excessive cleaning of skin oil will bring to feel tense

[0004] Compared with the one-way skin care of facial cleanser, which can only remove excess oil on the skin surface, the cleansing mask has more advantages. In addition to removing excess oil on the skin surface, it can also replenish water and moisturize. However, the current cleansing mask has Poor foaming ability. During the cleaning process, pollutants may re-adsorb the skin, which cannot achieve the synergistic effect of deep mildness, cleansing and deep moisturizing, and non-natural sources are not environmentally friendly

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