Method for making metallization treatment of fabric surface

A surface metal and fabric technology, which is applied in the field of metallization treatment of the fabric surface by plasma technology, can solve the problems of affecting the treatment effect and product quality stability, the plasma atmosphere cannot be controlled, and the vacuum degree of the system is not easy to increase. Combination of fastness, low processing temperature, and improved production efficiency

Inactive Publication Date: 2003-03-05
SUZHOU UNIV
View PDF1 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] 1. In the process of low-temperature plasma treatment, only the etching effect of air low-temperature plasma is used, that is, through etching, the smooth surface of the substrate becomes rough and uneven, and the bonding between the metal layer and the substrate is improved through physical effects. The degree of improvement is limited
[0008] 2. The vacuum drying process of the fabric is set after the low-temperature plasma treatment, so that it is possible that the plasma atmosphere will be caused

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for making metallization treatment of fabric surface
  • Method for making metallization treatment of fabric surface

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0020] Substrate: Modified polyester filament and its fabric.

[0021] Plasma generator: capacitive coupling.

[0022] Process flow: calendering of base fabric - vacuum drying - low temperature plasma etching and activation - inorganic metal salt-polymer complex coating - drying into film - hydrogen Plasma reduction.

[0023] Process parameters:

[0024] 1) Calendering: temperature 160°C, pressure 400KN, fabric movement speed 15-20m / min;

[0025] 2) Vacuum drying: vacuum degree 50Pa, drying temperature 90°C, drying time 2 hours;

[0026] 3) Low-temperature plasma treatment: the vacuum degree of the background is 0.1Pa, the working gas is argon, the discharge power is 80W, and the treatment time is 30 seconds;

[0027] 4) Coating of inorganic metal salt-polymer complex:

[0028] Composition of coating solution: CuCl 2 (10%w) + polyvinyl alcohol 1788 (30%w) + water (60%w); dissolve polyvinyl alcohol in distilled water, add CuCl 2 After being fully stirred, it becomes a bl...

Embodiment 2

[0032] Substrate: Polypropylene fabric.

[0033] Plasma generator: inductive coupling.

[0034] Process flow: fabric calendering - vacuum drying - low temperature plasma etching and activation - coating of inorganic metal salt-polymer complex - drying film - hydrogen Plasma reduction.

[0035] Process parameters:

[0036] 1) Calendering: temperature 180°C, pressure 300KN, fabric movement speed 25m / min;

[0037] 2) Vacuum drying: vacuum degree 100Pa, drying temperature 80°C, drying time 2 hours;

[0038] 3) Low-temperature plasma treatment: the vacuum degree of the background is 0.1Pa, the working gas is a mixture of argon and nitrogen, the discharge power is 40W, and the treatment time is 1 minute;

[0039] 4) Coating of inorganic metal salt-polymer complex:

[0040] The composition of the coating solution is: AgNO 3 (20%w) + polyacrylonitrile (30%w) + chloroform (50%w); dissolve polyacrylonitrile in distilled water, add AgNO 3 After being fully stirred, it becomes a bl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention utilizes low-temp. plasma body to treat and implement surface cleaning, etching and activaling processes of the fabric, and adopts inorganic metal salt-polymer complex coating layer, and uses hydrogen gas plasma body to make reduction so as to obtain the chemically-bonded surface metallized fabric between coating layer and base body. Said invented method is simple in process, effective, can prevent treatment of chemical waste liquor, its product can be used in microwave and electromagnetic shielding effect, reflective, heat-insulating, decorative and fire-resisting materials.

Description

technical field [0001] The technical field of the invention is the functional finishing of textile materials, in particular to a method for metallizing the surface of fabrics by using plasma technology. Background technique [0002] Metallized fabric is a kind of composite material. After metallized fabric, it has permanent antistatic properties; absorbs electromagnetic wave radiation; high reflectivity to radar waves; Reflection and absorption, flame retardant and other properties. In addition, metallized fabrics can enhance the aesthetics of garments with the attractive luster of the metal and improve garment insulation due to the reflective effect of the metal. Therefore, it has great potential application prospects. [0003] At present, the methods for metallizing the surface of fabrics mainly include vacuum deposition (also known as vacuum plating) and chemical plating. [0004] Vacuum deposition is to place the treated fabric under vacuum c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): D06M10/00D06M11/83
Inventor 王红卫
Owner SUZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products