To provide a high-pH
skin-
cleaning agent composition containing
nonionic surfactant and a
nitrogen-containing compound which has excellent releasing of
aroma, and suppressed base
odor caused from a
nitrogen-containing compound.SOLUTION: A
skin-
cleaning agent composition contains the followings (A), (B), (C) and (D): (A)
nonionic surfactant by 0.1
mass% or more and 30
mass% or less; (B) diallyl dialkyl
quaternary ammonium salt /
acrylamide copolymer by 0.08
mass% or more and 10 mass% or less; (C) a perfume component containing the followings (c1) and (c2), which are (c1) a
perfume compound which has one hydroxyl group, has neither carbonyl C=O bond nor
ester bond, and has ClogP exceeding 1.5 by 0.002 mass% or more and 1.5 mass% or less, and (c2) a
perfume compound which has one
carboxylic acid ester bond, does not have a non-phenolic hydroxyl group, and has ClogP of 2 or more by 0.0001 mass% or more and 1 mass% or less, and (D) water, where a
mass ratio (c1) / (c2) between the content of a component (c1) and the content of a component (c2) is 1.1 or more and 21 or less, and pH at 25°C is 9 or more and 12.5 or less, (not that a specific moist feeling
enhancer is excluded).SELECTED DRAWING: None