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31results about How to "Achieving bi-directional switching characteristics" patented technology

Dual-conductive type discrete dual-rectangular grid-controlled source-drain variable resistance transistor and manufacturing method thereof

ActiveCN107799606AFunction can be switched at willChange the direction of the tunneling currentTransistorSemiconductor/solid-state device manufacturingMOSFETSub threshold
The invention relates to a dual-conductive type discrete dual-rectangular grid-controlled source-drain variable resistance transistor and a manufacturing method thereof. The transistor has a functionthat a P conductive type and an N conductive type can be freely switched and a bidirectional switch function, has the advantages of low static power consumption, low reverse leakage current, relatively high grid control capability and low sub-threshold amplitude and has the characteristics of a dual-rectangular grid discrete control structure. Compared with a conventional MOSFETs device, the transistor has the advantages that more excellent sub-threshold characteristic and switch characteristic are achieved by a Schottky barrier tunneling effect, and the static power consumption of the transistor is reduced; and compared with a conventional tunneling field-effect transistor, the transistor has the bidirectional switch characteristic which a source and a drain are symmetric and can be changed with each other and which are not possessed by the conventional tunneling field-effect transistor, the function that the P conductive type and the N conductive type can be freely switched and whichcannot be achieved by various existing transistor technologies are achieved, thus, a wider and versatile logic function is provided for an integrated circuit design unit, and the transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

Source-drain resistance-variable type H-shaped grid-controlled bidirectional switching transistor and manufacturing method thereof

The invention relates to a source-drain resistance-variable type H-shaped grid-controlled bidirectional switching transistor and a manufacturing method thereof. According to the invention, the transistor comprises an H-shaped grid electrode and structural features which are symmetric on the left side and the right side. The transistor is strong in grid control capability, and a metal source / draininterchangeable region can be controlled as a source region or a drain region through adjusting the electrode voltage of the source / drain interchangeable region. In this way, the direction of the tunneling current is changed. The invention has the advantages of low static power consumption, reverse leakage current, strong grid control capability, low sub-threshold swing and bidirectional switchingfunction. Compared with a common MOSFETs-type device, more excellent switching characteristics are achieved through the tunneling effect. Compared with a common tunneling field effect transistor, better switching characteristics are realized compared with a Schottky barrier transistor. Meanwhile, the doping is not needed in the source and drain regions, and the Schottky barrier is easy to form. The H-shaped grid electrode can better control the source and drain regions. Therefore, the transistor is suitable for popularization and application.
Owner:宿松新驱光电科技有限公司

Source drain variable-resistance rectangular grid controlled U-shaped channel bidirectional transistor and production method thereof

The invention relates to a source drain variable-resistance rectangular grid controlled U-shaped channel bidirectional transistor and a production method thereof. The element is provided with a rectangular grid electrode, has a transversely symmetrical structural feature, has high grid control capacity and can control a metal source drain interchangeable region as a source region or a drain regionthrough adjustment of source drain interchangeable electrode voltage, and the direction of a tunneling current is changed. The element has the advantages of low static power consumption, small reverse leakage current, high grid control capacity, low subthreshold swing and realization of a bidirectional switch function. Compared with a common MOSFETs-type element, a better switch characteristic isachieved by means of a tunneling effect; compared with a common tunneling field effect transistor, the bidirectional transistor has a source drain interchangeable bidirectional symmetrical switch characteristic; compared with a Schottky barrier transistor, the bidirectional transistor has a better switch characteristic; it is unnecessary to conduct blending in the source and drain regions, a Schottky barrier is easy to form, the rectangular grid electrode can better control the source and drain regions, and thus the bidirectional transistor is suitable for application and popularization.
Owner:山东光岳九州半导体科技有限公司

Rectangular grid-control U-shaped channel bilateral switch tunneling transistor and manufacturing method thereof

The invention relates to a rectangular grid-control U-shaped channel bilateral switch tunneling transistor and a manufacturing method thereof. The device is provided with a rectangular grid and a symmetrical structural feature and has relatively high grid control capacity, and a heavily-doped source drain interchangeable region of second type of impurities can be controlled as a source region or adrain region by adjusting source drain interchangeable electrode voltage, so that the tunneling current direction is changed. The transistor has the advantages of low static power consumption, reverse leakage current, relatively high grid control capacity, low subthreshold amplitude and achievement of bilateral switch function. Compared with an ordinary MOSFETs type device, a preferable switchingcharacteristic is realized by using a tunneling effect; and compared with an ordinary tunneling filed effect transistor, the transistor has a source drain interchangeable bidirectionally symmetricalswitching characteristic that the ordinary tunneling filed effect transistor does not own, so that the transistor is applicable for popularization and application.
Owner:宿松新驱光电科技有限公司

Bracket-shaped grid-control source drain resistive two-way switch transistor and manufacturing method thereof

The invention relates to a bracket-shaped grid-control source drain resistive two-way switch transistor and a manufacturing method thereof. According to the bracket-shaped grid-control source drain resistive two-way switch transistor, a device is structurally characterized by comprising bracket grids symmetrical left and right and has strong grid control capability and can control a metal source and drain interchangeable area as a source area or a drain area by adjusting a source and drain interchangeable electrode voltage to change the tunneling current direction. The bracket-shaped grid-control source drain resistive two-way switch transistor has the advantages of being low in static power and reverse leakage current, high in grid control capacity, low in subthreshold value swing and capable of achieving the two-way switching function. Compared with an ordinary MOSFETs type device, the tunneling effect is used for achieving a more excellent switching characteristic. Compared with anordinary tunneling field effect transistor, the bracket-shaped grid-control source drain resistive two-way switch transistor has the interchangeable source and drain two-way symmetrical switching characteristic with which the ordinary tunneling field effect transistor lacks, and therefore the bracket-shaped grid-control source drain resistive two-way switch transistor is suitable for application and popularization.
Owner:深圳市麦思浦半导体有限公司

Source-drain resistive random bidirectional switching field effect transistor and manufacturing method thereof

The invention relates to a source-drain resistive random bidirectional switching field effect transistor and a manufacturing method thereof. The device has the structural characteristic of bilateral symmetry, and a metal source-drain interchangeable region is controlled to act as a source region or a drain region by adjusting the source-drain interchangeable electrode voltage so as to change the direction of schottky barrier tunneling current. The device has the advantages of low static power consumption reverse leakage current and low sub-threshold swing and can realize the bidirectional switching function. Compared with the common MOSFETs type device, the intensity of the schottky barrier tunneling effect is controlled by using the gate electrode to change the resistance value of the source region and the drain region so as to realize the better switching characteristic; compared with the tunneling field effect transistor, the bidirectional switching field effect transistor has the source-drain interchangeable bidirectional symmetrical switching characteristic which is not possessed by the common tunneling field effect transistor and higher forward conduction characteristic; andcompared with the common schottky barrier transistor, the bidirectional switching field effect transistor has the advantages of high technology implementation and better reverse switching characteristic so as to be suitable for popularization and application.
Owner:山东光岳九州半导体科技有限公司

Double-selection conductive type dual-bracket grid-controlled source-drain variable resistance transistor and manufacturing method thereof

The invention relates to a double-selection conductive type dual-bracket grid-controlled source-drain variable resistance transistor and a manufacturing method thereof. The device has structural characteristics of folded auxiliary grid, dual-bracket grid and a left side and a right side which are symmetric to each other, the function that a P conductive type and an N conductive type can be freelyswitched can be achieved, and the transistor has the advantages of low static power consumption, low reverse leakage current, relatively high grid control capability and low sub-threshold amplitude. Compared with a conventional MOSFETs device, the transistor has the advantages that more excellent switch characteristic is achieved by a tunneling effect; and compared with a conventional tunneling field-effect transistor, the transistor has the bidirectional switch characteristic which a source and a drain can be symmetric to each other and can be exchanged and which is not possessed by the conventional tunneling field-effect transistor, the function that the P conductive type and the N conductive type can be freely switched and that cannot be achieved by the prior art is achieved, thus, wider and more versatile logic functions are provided for an integrated circuit design unit, and the transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

Double-bracket-shaped gate-controlled bidirectional switching tunneling transistor and manufacturing method thereof

The invention relates to a double-bracket-shaped gate-controlled bidirectional switching tunneling transistor and a manufacturing method thereof. The transistor has a bracket gate and a left-right symmetric structural feature; the gate control capability is high; and a second type of impurity-heavily-doped source-drain exchangeable region is controlled to be as a source region or a drain region byadjusting a source-drain exchangeable electrode voltage and the tunneling current direction is changed. The transistor has advantages of low static power consumption, reverse leakage current, high gate control capability, low sub-threshold swing, and bi-directional switching. Compared with the ordinary MOSFETs type device, the transistor has the improved switching characteristic by using the tunneling effect; and compared with the common tunneling field-effect transistor, the transistor has the good bidirectional symmetric switching characteristic with the source / drain exchanging, wherein thecommon tunneling field-effect transistor does not have the characteristic. Therefore, the bidirectional switching tunneling transistor is suitable for promotion widely.
Owner:宿松新驱光电科技有限公司

Discrete double rectangular gate controlled u-shaped channel source-drain double tunneling transistor and manufacturing method thereof

The invention relates to a discrete double-rectangle gate-controlled U-shaped channel source-drain double tunnelling transistor and a manufacturing method thereof. The transistor has the rectangular gate electrode structure characteristic capable of making two sides of a source and a drain of the transistor generate the tunnelling effect at the same time and the bilaterally symmetric structure characteristic capable of achieving source-drain interchangeable two-way conduction, and a rectangular gate electrode forms three-side wrapping on vertical parts at two sides of a monocrystalline siliconfilm, so that the transistor provided by the invention has relatively high gate-controlled ability, can achieve the low subthreshold swing characteristic, and has the barrier control gate structure characteristic capable of preventing a majority carrier of a source-drain doped region from flowing through the transistor. Compared with ordinary MOSFETs, the discrete double-rectangle gate-controlledU-shaped channel source-drain double tunnelling transistor has the advantage that more excellent switching characteristic is achieved by using the tunnelling effect; and compared with an ordinary tunnelling field effect transistor, the discrete double-rectangle gate-controlled U-shaped channel source-drain double tunnelling transistor has the source-drain symmetric interchangeable two-way switching characteristic that the ordinary tunnelling field effect transistor does not have, therefore, the discrete double-rectangle gate-controlled U-shaped channel source-drain double tunnelling transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

Double-sided folded gate-controlled source-drain double-tunneling bidirectional conduction transistor and manufacturing method thereof

The invention relates to a double-sided-folded gate-controlled source / drain double tunneling type bidirectional conductive transistor and a manufacturing method thereof. The bidirectional conductive transistor has a double-sided folded gate enabling tunneling effects to occur at the source and drain sides of the transistor simultaneously and a left-right symmetric structural feature capable of realizing source / drain exchanging and bidirectional conduction. The double-sided folded gate forms three-side coating on the vertical parts of the two sides of the monocrystalline silicon film, so that the high gate control capability and the low-sub-threshold oscillation range characteristic is realized. A barrier adjustment gate structural feature capable of preventing most of carriers in a source-drain doped region from flowing through the transistor is formed. Compared with the common MOSFETs type device, the bidirectional conductive transistor has the improved switching characteristic by using the tunneling effect; and compared with the common tunneling field-effect transistor, the bidirectional conductive transistor has the good bidirectional switching characteristic with the source / drain symmetric exchanging, wherein the common tunneling field-effect transistor does not have the characteristic. Therefore, the bidirectional conductive transistor is suitable for promotion widely.
Owner:深圳市永利杰科技有限公司

A source-drain resistance variable bidirectional switch field effect transistor and its manufacturing method

The invention relates to a source-drain resistive random bidirectional switching field effect transistor and a manufacturing method thereof. The device has the structural characteristic of bilateral symmetry, and a metal source-drain interchangeable region is controlled to act as a source region or a drain region by adjusting the source-drain interchangeable electrode voltage so as to change the direction of schottky barrier tunneling current. The device has the advantages of low static power consumption reverse leakage current and low sub-threshold swing and can realize the bidirectional switching function. Compared with the common MOSFETs type device, the intensity of the schottky barrier tunneling effect is controlled by using the gate electrode to change the resistance value of the source region and the drain region so as to realize the better switching characteristic; compared with the tunneling field effect transistor, the bidirectional switching field effect transistor has the source-drain interchangeable bidirectional symmetrical switching characteristic which is not possessed by the common tunneling field effect transistor and higher forward conduction characteristic; andcompared with the common schottky barrier transistor, the bidirectional switching field effect transistor has the advantages of high technology implementation and better reverse switching characteristic so as to be suitable for popularization and application.
Owner:山东光岳九州半导体科技有限公司

A rectangular gate-controlled u-shaped channel bidirectional switch tunneling transistor and its manufacturing method

The invention relates to a rectangular grid-control U-shaped channel bilateral switch tunneling transistor and a manufacturing method thereof. The device is provided with a rectangular grid and a symmetrical structural feature and has relatively high grid control capacity, and a heavily-doped source drain interchangeable region of second type of impurities can be controlled as a source region or adrain region by adjusting source drain interchangeable electrode voltage, so that the tunneling current direction is changed. The transistor has the advantages of low static power consumption, reverse leakage current, relatively high grid control capacity, low subthreshold amplitude and achievement of bilateral switch function. Compared with an ordinary MOSFETs type device, a preferable switchingcharacteristic is realized by using a tunneling effect; and compared with an ordinary tunneling filed effect transistor, the transistor has a source drain interchangeable bidirectionally symmetricalswitching characteristic that the ordinary tunneling filed effect transistor does not own, so that the transistor is applicable for popularization and application.
Owner:宿松新驱光电科技有限公司

Discrete double rectangular gate-controlled source-drain resistive switching transistor of double conductivity type and manufacturing method thereof

ActiveCN107799606BFunction can be switched at willChange the direction of the tunneling currentTransistorSemiconductor/solid-state device manufacturingMOSFETSub threshold
The invention relates to a dual-conductive type discrete dual-rectangular grid-controlled source-drain variable resistance transistor and a manufacturing method thereof. The transistor has a functionthat a P conductive type and an N conductive type can be freely switched and a bidirectional switch function, has the advantages of low static power consumption, low reverse leakage current, relatively high grid control capability and low sub-threshold amplitude and has the characteristics of a dual-rectangular grid discrete control structure. Compared with a conventional MOSFETs device, the transistor has the advantages that more excellent sub-threshold characteristic and switch characteristic are achieved by a Schottky barrier tunneling effect, and the static power consumption of the transistor is reduced; and compared with a conventional tunneling field-effect transistor, the transistor has the bidirectional switch characteristic which a source and a drain are symmetric and can be changed with each other and which are not possessed by the conventional tunneling field-effect transistor, the function that the P conductive type and the N conductive type can be freely switched and whichcannot be achieved by various existing transistor technologies are achieved, thus, a wider and versatile logic function is provided for an integrated circuit design unit, and the transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

Double-bracket-shaped gate-controlled bidirectional switch tunneling transistor and manufacturing method thereof

The invention relates to a double-bracket-shaped gate-controlled bidirectional switching tunneling transistor and a manufacturing method thereof. The transistor has a bracket gate and a left-right symmetric structural feature; the gate control capability is high; and a second type of impurity-heavily-doped source-drain exchangeable region is controlled to be as a source region or a drain region byadjusting a source-drain exchangeable electrode voltage and the tunneling current direction is changed. The transistor has advantages of low static power consumption, reverse leakage current, high gate control capability, low sub-threshold swing, and bi-directional switching. Compared with the ordinary MOSFETs type device, the transistor has the improved switching characteristic by using the tunneling effect; and compared with the common tunneling field-effect transistor, the transistor has the good bidirectional symmetric switching characteristic with the source / drain exchanging, wherein thecommon tunneling field-effect transistor does not have the characteristic. Therefore, the bidirectional switching tunneling transistor is suitable for promotion widely.
Owner:宿松新驱光电科技有限公司

H-shaped grid-control source-drain symmetrically-changeable tunneling transistor and manufacturing method thereof

The invention relates to an H-shaped grid-control source-drain symmetrically-changeable tunneling transistor and a manufacturing method thereof. The device has characteristics of a rectangular grid and a horizontally-symmetric structure and has relatively high grid control capability, a second type of impurity heavily-doping source-drain changeable region can be controlled to be used as a source region or a drain region by adjusting a source-drain changeable electrode voltage, and the direction of a tunneling current is changed. The device has the advantages of low static power consumption, low reverse leakage current and low sub-threshold amplitude, and the bidirectional switch function can be achieved. Compared with a conventional MOSFETs device, the device has the advantages that more switch characteristic is achieved by a tunneling effect; and compared with a conventional tunneling field-effect transistor, the transistor has the bidirectional switch characteristic which a source and a drain are symmetric and can be changed with each other and which are not possessed by the conventional tunneling field-effect transistor, and thus, the transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

A bracket-shaped gate-controlled source-drain resistance bidirectional switch transistor and its manufacturing method

The invention relates to a bracket-shaped grid-control source drain resistive two-way switch transistor and a manufacturing method thereof. According to the bracket-shaped grid-control source drain resistive two-way switch transistor, a device is structurally characterized by comprising bracket grids symmetrical left and right and has strong grid control capability and can control a metal source and drain interchangeable area as a source area or a drain area by adjusting a source and drain interchangeable electrode voltage to change the tunneling current direction. The bracket-shaped grid-control source drain resistive two-way switch transistor has the advantages of being low in static power and reverse leakage current, high in grid control capacity, low in subthreshold value swing and capable of achieving the two-way switching function. Compared with an ordinary MOSFETs type device, the tunneling effect is used for achieving a more excellent switching characteristic. Compared with anordinary tunneling field effect transistor, the bracket-shaped grid-control source drain resistive two-way switch transistor has the interchangeable source and drain two-way symmetrical switching characteristic with which the ordinary tunneling field effect transistor lacks, and therefore the bracket-shaped grid-control source drain resistive two-way switch transistor is suitable for application and popularization.
Owner:深圳市麦思浦半导体有限公司

Source-drain symmetrical interchangeable double-bracket gated tunneling transistor and method of making the same

The invention relates to a source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor and a manufacturing method thereof. The source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor is provided with a folding auxiliary grid, a double-bracket grid and structural features which are symmetric on the left side andthe right side. The source-drain symmetric and interchangeable double-bracket-shaped gate-controlled tunneling transistor is strong in grid control capability, and a voltage-controlled heavily-dopedsource-drain interchangeable region of a source-drain interchangeable electrode can be adjusted to be a source region or a drain region. In this way, the direction of the tunneling current is changed.According to the invention, the advantages of bidirectional switch function, low static power consumption, low reverse leakage current, relatively strong grid control capability, low sub-threshold amplitude swing and the like are realized. Compared with a common MOSFET type device, more excellent switching characteristics are achieved through the tunneling effect. Compared with a common tunnelingfield effect transistor, source-drain symmetric and interchangeable two-way switch characteristics, which cannot be realized by the common tunneling field effect transistor, can be realized by the source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor. Therefore, the source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor is suitable for popularization and application.
Owner:通普信息技术股份有限公司

Bidirectional tunneling transistor controlled by inverted u-gate assisted by double-sided gate and its manufacturing method

The invention relates to an inverted U gate auxiliary control double-side gate main control bidirectional tunneling transistor and a manufacturing method thereof. The device is provided with an inverted U gate, a double-side gate and a structure characteristic of bilateral symmetry, a heavily-doped source drain interchangeable region can controlled as a source region or a drain region by adjustingthe voltage of a source drain interchangeable electrode, and the tunneling current direction is changed. The device has the advantages of bilateral switch function, low static power consumption, reverse quiescent dissipation and low subthreshold amplitude. Compared with an ordinary MOSFETs type device, a preferable switching characteristic is realized by using a tunneling effect; and compared with an ordinary tunneling filed effect transistor, the transistor has a source drain symmetrical interchangeable bidirectionally switching characteristic that the ordinary tunneling filed effect transistor does not own, so that the transistor is applicable for popularization and application.
Owner:山东光岳九州半导体科技有限公司

Source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor and manufacturing method thereof

The invention relates to a source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor and a manufacturing method thereof. The source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor is provided with a folding auxiliary grid, a double-bracket grid and structural features which are symmetric on the left side andthe right side. The source-drain symmetric and interchangeable double-bracket-shaped gate-controlled tunneling transistor is strong in grid control capability, and a voltage-controlled heavily-dopedsource-drain interchangeable region of a source-drain interchangeable electrode can be adjusted to be a source region or a drain region. In this way, the direction of the tunneling current is changed.According to the invention, the advantages of bidirectional switch function, low static power consumption, low reverse leakage current, relatively strong grid control capability, low sub-threshold amplitude swing and the like are realized. Compared with a common MOSFET type device, more excellent switching characteristics are achieved through the tunneling effect. Compared with a common tunnelingfield effect transistor, source-drain symmetric and interchangeable two-way switch characteristics, which cannot be realized by the common tunneling field effect transistor, can be realized by the source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor. Therefore, the source-drain symmetric and interchangeable double-bracket-shaped grid-controlled tunneling transistor is suitable for popularization and application.
Owner:通普信息技术股份有限公司

Barrier regulated H-shaped gate-controlled bidirectional tunneling transistor and manufacturing method thereof

The invention relates to a barrier control type H-shaped grid-controlled two-way tunneling transistor and a manufacturing method thereof. The barrier control type H-shaped grid-controlled two-way tunneling transistor provided by the invention comprises an H-shaped grid electrode, a barrier adjusting grid and a bilaterally symmetric structure. The tunneling transistor is strong in grid control capability and a metal source / drain interchangeable region can be controlled as a source region or a drain region through adjusting the electrode voltage of the source / drain interchangeable region. In this way, the direction of the tunneling current is changed. The invention has the advantages of low static power consumption, reverse leakage current, strong grid control capability, low sub-threshold swing and bidirectional switching function. Compared with a common MOSFET type device, more excellent switching characteristics are achieved through the tunneling effect. Compared with a common tunneling field effect transistor, source / drain interchangeable bidirectional symmetrical switching characteristics, which cannot be realized by the common tunneling field effect transistor, can be realizedby the above tunneling transistor. Therefore, the tunneling transistor is suitable for popularization and application.
Owner:宿松新驱光电科技有限公司

Bidirectional tunneling field-effect transistor with symmetric and replaceable source and drain and manufacturing method of bidirectional tunneling field-effect transistor

The invention relates to a bidirectional tunneling field-effect transistor with symmetric and replaceable source and drain and a manufacturing method of the bidirectional tunneling field-effect transistor. The device has horizontal symmetric structure characteristic, a second-type impurity heavy-doping source-drain replaceable region is controlled as a source region or a drain region by adjustingreplaceable electrode voltages of the source and the drain, and a tunneling current direction is changed. The bidirectional tunneling field-effect transistor has the advantages of low static power consumption, high forward-reverse current ratio, low reverse leakage current characteristic and low sub-threshold amplitude, and the bidirectional switching function can be achieved; compared with a conventional MOSFETs device, the bidirectional tunneling field-effect transistor has the advantages that more excellent switch characteristic is achieved by a tunneling effect; and compared with a conventional tunneling field-effect transistor, the bidirectional tunneling field-effect transistor has bidirectional and symmetric switch characteristic that the source and the drain can be replaced with each other and is not possessed by the conventional tunneling field-effect transistor, and thus, the bidirectional tunneling field-effect transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

H-shaped gate-controlled source-drain resistance variable conduction type adjustable transistor and manufacturing method thereof

ActiveCN107819028BFunction can be switched at willCan change the direction of tunneling currentSemiconductor/solid-state device manufacturingSemiconductor devicesSubthreshold swingEngineering
The invention relates to an H-shaped gate-controlled drain-source resistance-variable conductivity type adjustable transistor and a manufacturing method thereof. The transistor comprises an H-shaped gate electrode, a conductivity type regulation and control gate and a left-right symmetric structure characteristic. According to the invention, the free switching function between a P type conductivity type and an N type conductivity type, and the bidirectional switching function are realized. The advantages of low static power consumption, low reverse leakage current, strong gate control capability and low subthreshold swing are realized. Compared with a common MOSFET type device, the schottky barrier tunneling effect is utilized to achieve better subthreshold characteristics and switching characteristics. The static power consumption of the transistor is reduced. Compared with a common tunneling field effect transistor, the bidirectional switching characteristics, wherein a drain electrode and a source electrode are symmetrical and interchangeable, can be realized, wherein the bidirectional switching characteristics cannot be realized by the common tunneling field effect transistor.The free regulation and control function of the P type conductivity type and the N type conductivity type, which cannot be realized by various existing transistor technologies, can be realized. Therefore, the H-shaped gate-controlled drain-source resistance-variable conductivity type adjustable transistor is suitable for popularization and application.
Owner:深圳市麦思浦半导体有限公司

Barrier control type H-shaped grid-controlled two-way tunneling transistor and manufacturing method thereof

The invention relates to a barrier control type H-shaped grid-controlled two-way tunneling transistor and a manufacturing method thereof. The barrier control type H-shaped grid-controlled two-way tunneling transistor provided by the invention comprises an H-shaped grid electrode, a barrier adjusting grid and a bilaterally symmetric structure. The tunneling transistor is strong in grid control capability and a metal source / drain interchangeable region can be controlled as a source region or a drain region through adjusting the electrode voltage of the source / drain interchangeable region. In this way, the direction of the tunneling current is changed. The invention has the advantages of low static power consumption, reverse leakage current, strong grid control capability, low sub-threshold swing and bidirectional switching function. Compared with a common MOSFET type device, more excellent switching characteristics are achieved through the tunneling effect. Compared with a common tunneling field effect transistor, source / drain interchangeable bidirectional symmetrical switching characteristics, which cannot be realized by the common tunneling field effect transistor, can be realizedby the above tunneling transistor. Therefore, the tunneling transistor is suitable for popularization and application.
Owner:宿松新驱光电科技有限公司

A source-drain resistance variable H-shaped gate-controlled bidirectional switch transistor and its manufacturing method

The invention relates to a source-drain resistance-variable type H-shaped grid-controlled bidirectional switching transistor and a manufacturing method thereof. According to the invention, the transistor comprises an H-shaped grid electrode and structural features which are symmetric on the left side and the right side. The transistor is strong in grid control capability, and a metal source / draininterchangeable region can be controlled as a source region or a drain region through adjusting the electrode voltage of the source / drain interchangeable region. In this way, the direction of the tunneling current is changed. The invention has the advantages of low static power consumption, reverse leakage current, strong grid control capability, low sub-threshold swing and bidirectional switchingfunction. Compared with a common MOSFETs-type device, more excellent switching characteristics are achieved through the tunneling effect. Compared with a common tunneling field effect transistor, better switching characteristics are realized compared with a Schottky barrier transistor. Meanwhile, the doping is not needed in the source and drain regions, and the Schottky barrier is easy to form. The H-shaped grid electrode can better control the source and drain regions. Therefore, the transistor is suitable for popularization and application.
Owner:宿松新驱光电科技有限公司

Discrete double-rectangle gate-controlled U-shaped channel source-drain double tunnelling transistor and manufacturing method thereof

The invention relates to a discrete double-rectangle gate-controlled U-shaped channel source-drain double tunnelling transistor and a manufacturing method thereof. The transistor has the rectangular gate electrode structure characteristic capable of making two sides of a source and a drain of the transistor generate the tunnelling effect at the same time and the bilaterally symmetric structure characteristic capable of achieving source-drain interchangeable two-way conduction, and a rectangular gate electrode forms three-side wrapping on vertical parts at two sides of a monocrystalline siliconfilm, so that the transistor provided by the invention has relatively high gate-controlled ability, can achieve the low subthreshold swing characteristic, and has the barrier control gate structure characteristic capable of preventing a majority carrier of a source-drain doped region from flowing through the transistor. Compared with ordinary MOSFETs, the discrete double-rectangle gate-controlledU-shaped channel source-drain double tunnelling transistor has the advantage that more excellent switching characteristic is achieved by using the tunnelling effect; and compared with an ordinary tunnelling field effect transistor, the discrete double-rectangle gate-controlled U-shaped channel source-drain double tunnelling transistor has the source-drain symmetric interchangeable two-way switching characteristic that the ordinary tunnelling field effect transistor does not have, therefore, the discrete double-rectangle gate-controlled U-shaped channel source-drain double tunnelling transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

Source-drain resistance variable rectangular gate-controlled u-shaped channel bidirectional transistor and manufacturing method thereof

The invention relates to a source drain variable-resistance rectangular grid controlled U-shaped channel bidirectional transistor and a production method thereof. The element is provided with a rectangular grid electrode, has a transversely symmetrical structural feature, has high grid control capacity and can control a metal source drain interchangeable region as a source region or a drain regionthrough adjustment of source drain interchangeable electrode voltage, and the direction of a tunneling current is changed. The element has the advantages of low static power consumption, small reverse leakage current, high grid control capacity, low subthreshold swing and realization of a bidirectional switch function. Compared with a common MOSFETs-type element, a better switch characteristic isachieved by means of a tunneling effect; compared with a common tunneling field effect transistor, the bidirectional transistor has a source drain interchangeable bidirectional symmetrical switch characteristic; compared with a Schottky barrier transistor, the bidirectional transistor has a better switch characteristic; it is unnecessary to conduct blending in the source and drain regions, a Schottky barrier is easy to form, the rectangular grid electrode can better control the source and drain regions, and thus the bidirectional transistor is suitable for application and popularization.
Owner:山东光岳九州半导体科技有限公司

Source-drain symmetrical interchangeable bidirectional tunneling field effect transistor and manufacturing method thereof

The invention relates to a bidirectional tunneling field-effect transistor with symmetric and replaceable source and drain and a manufacturing method of the bidirectional tunneling field-effect transistor. The device has horizontal symmetric structure characteristic, a second-type impurity heavy-doping source-drain replaceable region is controlled as a source region or a drain region by adjustingreplaceable electrode voltages of the source and the drain, and a tunneling current direction is changed. The bidirectional tunneling field-effect transistor has the advantages of low static power consumption, high forward-reverse current ratio, low reverse leakage current characteristic and low sub-threshold amplitude, and the bidirectional switching function can be achieved; compared with a conventional MOSFETs device, the bidirectional tunneling field-effect transistor has the advantages that more excellent switch characteristic is achieved by a tunneling effect; and compared with a conventional tunneling field-effect transistor, the bidirectional tunneling field-effect transistor has bidirectional and symmetric switch characteristic that the source and the drain can be replaced with each other and is not possessed by the conventional tunneling field-effect transistor, and thus, the bidirectional tunneling field-effect transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

Double-selectable conduction type double-bracket gate-controlled source-drain resistance variable transistor and manufacturing method thereof

The invention relates to a double-selection conductive type dual-bracket grid-controlled source-drain variable resistance transistor and a manufacturing method thereof. The device has structural characteristics of folded auxiliary grid, dual-bracket grid and a left side and a right side which are symmetric to each other, the function that a P conductive type and an N conductive type can be freelyswitched can be achieved, and the transistor has the advantages of low static power consumption, low reverse leakage current, relatively high grid control capability and low sub-threshold amplitude. Compared with a conventional MOSFETs device, the transistor has the advantages that more excellent switch characteristic is achieved by a tunneling effect; and compared with a conventional tunneling field-effect transistor, the transistor has the bidirectional switch characteristic which a source and a drain can be symmetric to each other and can be exchanged and which is not possessed by the conventional tunneling field-effect transistor, the function that the P conductive type and the N conductive type can be freely switched and that cannot be achieved by the prior art is achieved, thus, wider and more versatile logic functions are provided for an integrated circuit design unit, and the transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

Conduction type adjustable source-drain resistance variable double-sided folded gate transistor and manufacturing method thereof

ActiveCN107799607BFunction can be switched at willCan change the direction of tunneling currentTransistorSemiconductor/solid-state device manufacturingMOSFETSub threshold
The invention relates to a conductive-type adjustable source-drain variable resistance dual-side folded transistor and a manufacturing method thereof. The transistor has a function that a P conductivetype and an N conductive type can be freely switched and a bidirectional switch function and has the advantages of low static power consumption, low reverse leakage current, relatively high grid control capability and low sub-threshold amplitude. Compared with a conventional MOSFETs device, the transistor has the advantages that more excellent sub-threshold characteristic and switch characteristic are achieved by a Schottky barrier tunneling effect, and the static power consumption of the transistor is reduced; and compared with a conventional tunneling field-effect transistor, the transistorhas the bidirectional switch characteristic which a source and a drain are symmetric and can be changed with each other and which are not possessed by the conventional tunneling field-effect transistor, the function that the P conductive type and the N conductive type can be freely switched and which cannot be achieved by various existing transistor technologies are achieved, thus, a wider and versatile logic function is provided for an integrated circuit design unit, and the transistor is suitable for promotion and application.
Owner:宿松新驱光电科技有限公司

H-shaped gate-controlled drain-source resistance-variable conductivity type adjustable transistor and manufacturing method thereof

ActiveCN107819028AFunction can be switched at willCan change the direction of tunneling currentSemiconductor/solid-state device manufacturingSemiconductor devicesControl functionN type conductivity
The invention relates to an H-shaped gate-controlled drain-source resistance-variable conductivity type adjustable transistor and a manufacturing method thereof. The transistor comprises an H-shaped gate electrode, a conductivity type regulation and control gate and a left-right symmetric structure characteristic. According to the invention, the free switching function between a P type conductivity type and an N type conductivity type, and the bidirectional switching function are realized. The advantages of low static power consumption, low reverse leakage current, strong gate control capability and low subthreshold swing are realized. Compared with a common MOSFET type device, the schottky barrier tunneling effect is utilized to achieve better subthreshold characteristics and switching characteristics. The static power consumption of the transistor is reduced. Compared with a common tunneling field effect transistor, the bidirectional switching characteristics, wherein a drain electrode and a source electrode are symmetrical and interchangeable, can be realized, wherein the bidirectional switching characteristics cannot be realized by the common tunneling field effect transistor.The free regulation and control function of the P type conductivity type and the N type conductivity type, which cannot be realized by various existing transistor technologies, can be realized. Therefore, the H-shaped gate-controlled drain-source resistance-variable conductivity type adjustable transistor is suitable for popularization and application.
Owner:深圳市麦思浦半导体有限公司
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