Preparation of high tenacity nanocrystalline silicide coating

A technology of silicide layer and nanocrystal, which is applied in coating, metal material coating process, ion implantation plating, etc.

Inactive Publication Date: 2009-07-15
JIANGSU HUAYANG PIPE & FITTINGS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, the research on silicides with high toug

Method used

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  • Preparation of high tenacity nanocrystalline silicide coating
  • Preparation of high tenacity nanocrystalline silicide coating
  • Preparation of high tenacity nanocrystalline silicide coating

Examples

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example 1

[0026] figure 1 The composition ratio prepared by hot isostatic pressing is Cr:Si=1:1 powder metallurgy sintered plate as the target material, and the nanocrystalline Cr formed on the surface of TC4 titanium alloy 3 SEM (scanning electron microscope) photograph of Si coating. figure 2 For the nanocrystalline Cr 3 Transmission electron micrographs of the Si coating. Observation by transmission electron microscope can prove that the coating is nanocrystalline, and its grain size is less than 5nm. Nanocrystalline Cr 3 The hardness of the Si coating is 28GPa, the elastic modulus is 357GPa, and the bonding force between the coating and the substrate is 80N. The evaluation of the toughness of the coating by the indentation method showed that no cracks were observed around the microhardness indentation when the indentation load was 200g and 300g, while the coarse-grained Cr 3 Cracks appear around the microhardness indentation of Si material when the indentation load is 300g, pr...

example 2

[0028] image 3 The composition ratio of Ni: Si = 1: 1 powder metallurgy sintered plate prepared by the hot isostatic pressing process is used as the target material, and the nanocrystalline NiSi formed on the surface of the TC4 titanium alloy 2 SEM photograph of the coating. figure 2 For the nanocrystalline NiSi 2 TEM photograph of the coating. The results of wear experiments at room temperature and high temperature show that: nanocrystalline NiSi 2 The specific wear rate of the coating has little change with the increase of load and temperature, which indicates that the wear of the coating is not sensitive to load and temperature. Compared with TC4 alloy, nanocrystalline NiSi 2 / Ti 5 Si 3 The specific wear rate of the composite coating is reduced by more than 2 orders of magnitude. Nanocrystalline NiSi 2 The coating has a higher pitting potential (1.5V), which is obviously higher than that of TC4 alloy (1.2V). For another corrosion evaluation standard dimension pas...

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Abstract

The invention discloses a preparation method of high-tenacity nanocrystalline silicide coating, which uses the technology of twin cathode plasma sputtering sedimentation to control the sputtering amount of a target material and the temperature of a work surface by adjusting the target material and workpiece voltage as well as argon pressure led into a vacuum chamber; the dense nanocrystalline silicide coating is formed at the surface of titanium alloy; the technological parameters of twin cathode sputtering are as follows: the voltage of the target material is 500 to 1000 V; the workpiece voltage is 300 to 450 V; the distance between the target material and the workpiece is 10 to 30 mm; the argon pressure is 20 to 45 Pa; the type of the sputtered target material is Cr-Si alloy, and the like; and the type of the workpiece material is titanium alloy. Compared with an ordinary macrocrystal silicide material, the nanocrystalline silicide coating prepared by the invention has higher tenacity, oxidation resistance, high temperature resistance and high wearing resistance. The preparation method is applied to the field of propulsion of aviation and aerospace, and the coating is an indispensable special coating material with high temperature resistance and high wearing resistance.

Description

technical field [0001] The invention relates to a method for preparing an anti-oxidation coating material, in particular to a method for preparing a high-toughness nanocrystalline silicide coating. Background technique [0002] Due to its low density, high specific strength, good plasticity and formability, and excellent corrosion resistance, titanium alloys are widely used in aviation, aerospace, ships, medical equipment, energy and chemical industries. However, the hardness of titanium alloy is low, and there is a tendency of serious adhesive wear and fretting wear, resulting in poor tribological properties. In addition, the surface of TC4 titanium alloy is easy to form rutile TiO at high temperature. 2 , it does not have a good protective effect on the subsurface layer, resulting in poor oxidation resistance. These shortcomings have become restrictions on its application in the industrial field and the exertion of its excellent mechanical properties. Therefore, how to i...

Claims

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Application Information

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IPC IPC(8): C23C14/36
Inventor 徐江徐重王平
Owner JIANGSU HUAYANG PIPE & FITTINGS
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