Antireflection film used in all-angle and wide wavelength range and preparation method thereof

Abstract

The invention discloses an antireflection film used in the all-angle and wide wavelength range and a preparation method thereof. The film comprises a substrate, a first sol-gel layer, a silica nanoparticle layer and a second sol-gel layer. A first sol-gel film layer is prepared on the substrate by a pulling method, then a silica particle layer is prepared on the surface of the film by a molecularself-assembly technique, and finally a second sol-gel film layer is prepared on the surface of the film layer by the pulling method, wherein, the film on each layer is subjected to heat treatment. Byoptimizing the technological parameters, the film can have the following characteristics: the refractive index in the direction from the substrate to the air decreases progressively, the thickness matches and the surface micro-structure is two-dimensional ordered; therefore, the film realizes the antireflection effect in the all-angle and wide wavelength range and simultaneously has the ability of film forming in large area, the mechanical property and firmness of the whole antireflection film can be effectively improved, and the energy use ratios of the solar cells and the solar collector tubes are increased.

Description

technical field [0001] The invention relates to a film and a preparation method thereof, in particular to an anti-reflection film used in a full angle and wide wavelength range and a preparation method thereof. Background technique [0002] With the rapid development of the global economy, the demand for energy is becoming more and more urgent. However, the amount of fossil energy such as oil, coal, and natural gas on the earth is limited and will be exhausted within a certain period of time, which will inevitably lead to an energy crisis. The research and development of solar energy has gradually been paid attention to, and the industrial scale is huge. Among them, solar cells, solar collectors and other devices use monocrystalline silicon, polycrystalline silicon and glass as substrate materials. Since materials such as silicon and glass have a certain refractive index (the refractive index of silicon in the visible light to near-infrared region is between 3.4-5, and that ...

AI Technical Summary

Problems solved by technology

At present, there are mainly three types of anti-reflection films for solar cells. The first type is a traditional low-refractive index single-layer film or a multi-layer film stack with a thickness of 1 / 4 wavelength. Low reflectivity, such as the surface of silicon solar cells is often coated with silicon nitride (SiN x ) film, the disadvantage of this type of anti-reflection film is that it can only achieve good anti-reflection effect in a limited wavelength range and normal incidence

The second type is the graded index antireflection film. The refractive index of this type of film decreases gradually from the substrate to the air. If the refractive index of the designed film is close to the substrate on the substrate side and the air side is as small as possible, then theoretically The anti-reflection film with full angle and wide wavelength range can be obtained on the surface, such as SiO obtained by oblique evaporation method 2 / TiO 2 Gradient refractive index film, the refractive index can be adjusted between 1.08-2.0 through the process, the disadvantage of this type of film is that the process is complicated, the cost is high, and it is not suitable for mass production

The disadvantage of this type of anti-reflection film is that it cannot be used in polycrystalline silicon and amorphous silicon solar cells, and the reliability of anisotropic etching technology is not high, and the cost is high

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