Method for preparing trichlorosilane and dichlorosilane by hydrogenating silicon tetrachloride through microwave plasma
A hydrogenated silicon tetrachloride production, microwave plasma technology, applied in the direction of silicon halides, halosilanes, etc., can solve the problems of high equipment requirements, high energy consumption, low plasma ionization degree, etc., to achieve a high conversion rate, The effect of high ion density and simple system
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[0045] Example 1
[0046] SiCl 4 As raw material, reference figure 1 The system and process flow of this invention are introduced in detail to produce SiHCl 3 Methods.
[0047] This example produces SiHCl 3 The system includes the following parts: the first gas control system for starting the arc gas hydrogen and argon gas 1, adjusting the raw material gas hydrogen and SiCl 4 Inlet second gas control system 2, plasma reactor 3, condensation separation system for separating chlorosilane from other gases 4, tail gas treatment system for separating hydrogen, argon and hydrogen chloride gas 5, various chlorosilanes Separate fractionation and separation system 6, microwave generator 7 that provides microwaves for the plasma generator, microwave transmission waveguide 8 and microwave resonator 9. The above-mentioned equipment is conventional equipment used in this profession; figure 1 The system shown uses SiCl 4 Production of SiHCl as raw material 3 The method specifically includes the...
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