Polysilicon film low-temperature physical vapor deposition device and method thereof

A technology of physical vapor deposition and polysilicon thin film, which is applied in vacuum evaporation coating, coating, sputtering coating, etc., can solve the problems of low production efficiency, lower production cost, high cost, etc., so as to avoid high cost and improve competition Powerful, low-cost effect

Inactive Publication Date: 2011-04-06
DALIAN UNIV OF TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem with this method is that it uses the toxic gas silane (SiH ) needs to be equipped with complete gas recovery equipment and systems, resulting in higher costs. In addition, its growth rate is low, which is not conducive to reducing production costs
[0008] The above-mentioned direct generation preparation methods have the following problems in varying degrees: all h

Method used

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  • Polysilicon film low-temperature physical vapor deposition device and method thereof
  • Polysilicon film low-temperature physical vapor deposition device and method thereof
  • Polysilicon film low-temperature physical vapor deposition device and method thereof

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0041] Example one Preparation and Characteristic Test of Polycrystalline Silicon Thin Film No. H30P1

[0042] Step 1: Sample preparation

[0043] Prepare sample 10: the diameter is 100mm monocrystalline silicon wafer, 100mm quartz plate and 100mm ordinary glass sheet; load it on the sample tray 11 of the auxiliary vacuum chamber B, evacuate the auxiliary vacuum chamber B, open the plug valve 13 connecting the auxiliary vacuum chamber B and the main vacuum chamber A after reaching the specified pressure value, and use magnetic force The transfer rod 29 and the sample tray fork 14 transfer the sample 10 to the main vacuum chamber A;

[0044] Step 2: Pre-treatment of sample preparation

[0045] The background pressure of the main vacuum chamber A is pumped to high vacuum 2.0*10 pa, sample 10 is preheated to about 200°C, firstly, Ar is introduced into the main vacuum chamber A, the pressure value reaches 1Pa, the ICP plasma source is turned on 1500w, and sample 10 is given a bias v...

Example Embodiment

[0054] Example two Preparation and Characteristic Test of Polysilicon Film Sample Number B0H30P1

[0055] Step 1: Sample preparation (same as Step 1 in Example 1);

[0056] Step 2: Pre-treatment of sample preparation

[0057] The background pressure of the main vacuum chamber A is pumped to high vacuum 2.0*10 pa, sample 10 is preheated to about 200°C, here the Ar bombardment step is not implemented, and H is directly passed into the main vacuum chamber A The mixed gas with Ar, the flow ratio is 90sccm / 30sccm, the pressure value reaches 1Pa, the ICP makes the mixed gas continue to discharge for 40 seconds with a power of 1500w, thereby forming H The mixed gas plasma with Ar, and give the sample a bias voltage of 10-100V, the bias current measured here is 0.03A, and the sample 10 is subjected to pre-etching treatment;

[0058] Step 3: Sample preparation and deposition

[0059] Pass H with a flow ratio of 60sccm / 90sccm into the main vacuum chamber A Mix the gas with Ar, adjust the se...

Example Embodiment

[0064] Example three No. H30P1ICP8 Polycrystalline Silicon Film Sample Preparation and Characteristic Test

[0065] Step 1: Sample preparation;

[0066] Step 2: Pre-treatment of sample preparation (Step 1 and Step 2 are the same as Step 1 and Step 2 in Example 2);

[0067] Step 3: Sample preparation and deposition

[0068] Pass H with a flow ratio of 60sccm / 90sccm into the main vacuum chamber A Mix the gas with Ar, adjust the second plug valve 26, and set the pressure to 1Pa. Turn on the ICP inductively coupled plasma source, the ICP power is 800w, here does not add a bias to the sample 10, turn on the DC pulse magnetron sputtering twin target, the power is 200w, the deposition time is 50 minutes;

[0069] Step 4: Post-processing of sample preparation;

[0070] Step 5: Take out the sample (Step 4 and Step 5 are the same as Step 4 and Step 5 in Example 1).

[0071] Using X-ray diffractometer (Cu K α Radiation, λ = 0.15406 nm) structure analysis of the prepared film. Sharp and sharp di...

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Abstract

The invention relates to a polysilicon film low-temperature physical vapor deposition device and a method thereof, belonging to the technical field of semiconductor materials. By the deposition device and the method thereof, the low-temperature polysilicon film of which the host crystal orientation is (111), the grain diameter is tens of nanometers, and the proportion of the polysilicon part exceeds 80% can be generated by the steps of sample preparation, pretreatment for sample preparation, deposition, post-treatment, sample taking and the like. The physical vapor deposition method is substituted for the current plasma enhanced chemical vapor deposition technology, and the polysilicon film is directly deposited under the precondition of not using SiH gas. Because the substrate (simple glass) with low cost has a lower melting point, the polysilicon film can be directly deposited on the simple glass substrate under the condition of relatively low temperature (less than 300 DEG C), thus avoiding the defect of high cost of the formerly used substrate, and greatly improving the competitiveness.

Description

technical field [0001] The invention relates to a low-temperature physical vapor deposition device and method for polysilicon thin films, more specifically, a reactive magnetron sputtering device and method with plasma source assistance, and belongs to the technical field of semiconductor thin film materials. Background technique [0002] As a new material, polysilicon thin film has been widely used in thin film transistor (TFT) display, semiconductor storage, solar energy and other fields. Polysilicon thin films have attracted more and more attention due to their high electron mobility and stable optical properties. Polysilicon thin film has photosensitivity in the long-wave band, can effectively absorb visible light and has light stability, unlike a-Si:H has photodegradation (SW) effect, so polysilicon thin film can be used as a more efficient and stable photovoltaic thin film material. At the same time, the mobility of polysilicon film can reach 300cm ·V ·s The ab...

Claims

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Application Information

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IPC IPC(8): C23C14/14C23C14/35
Inventor 苏元军孙琦高桥英治董闯徐军范鹏辉
Owner DALIAN UNIV OF TECH
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