Silicon dioxide hollow nano-structure and preparation method thereof

A hollow nano and silicon dioxide technology is applied in the field of nano materials to achieve the effect of low cost and simple process

Inactive Publication Date: 2011-04-13
无锡润鹏复合新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The object of the present invention is to provide a hollow silica nanostructure and a preparation method thereof, which can solve the problems of the shape and size distribution of the hollow silica nanostructure, and the prepared silica hollow nanostructure is in the size Silica hollow nanospheres with high isotropy and growth orientation

Method used

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  • Silicon dioxide hollow nano-structure and preparation method thereof
  • Silicon dioxide hollow nano-structure and preparation method thereof
  • Silicon dioxide hollow nano-structure and preparation method thereof

Examples

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Embodiment 1

[0017] (1) Styrene and chlorinated 2-methacryloyloxyethyltrimethylamine (MTC) with a mass ratio of 25:1 are used as raw materials, through dispersion polymerization (using absolute ethanol as a reaction solvent, poly Vinylpyrrolidone is a dispersant, azobisisobutyronitrile is an initiator), and a PS / MTC copolymerized microsphere template with uniform size distribution is prepared;

[0018] (2) Take 5 g of PS / MTC copolymerized microsphere templates and disperse them in 30 g of absolute ethanol, add 3 g of ammonia water (NH3·H 2 0), ultrasonic dispersion 30min gets dispersion liquid;

[0019] (3) Disperse 1.5ml TEOS in 30ml of absolute ethanol, and add it dropwise to the dispersion in step (2) at 25°C under magnetic stirring;

[0020] (4) At a temperature of 25°C, stir magnetically for 6-8 hours, and collect a milky white spherical product by filtration;

[0021] (5) Vacuum drying the spherical product at a temperature of 60° C. for 10 hours;

[0022] (6) Put the dried produc...

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Abstract

The invention discloses a silicon dioxide hollow nano-structure and a preparation method thereof. Tetraethyl orthosilicate (TEOS) is taken as a precursor, polystyrene/2-methacryloyloxyethyl trimethylamine chloride (PS/MTC) copolymer microspheres are taken as templates, and the shape of a product is controlled by the limiting function of spherical templates, so that the high-isotropy silicon dioxide hollow nano-structures of high-isotropy sizes can be synthesized in quantity at a relatively low temperature, and the problem of an overlarge dimension distributing range in the conventional process of synthesizing silicon dioxide is solved. The method is simple, has low cost and is suitable for large-scale industrial production, particularly for lubricating oil additives.

Description

technical field [0001] The invention relates to the field of nanomaterials, in particular to a silicon dioxide hollow nanostructure and a preparation method thereof. Background technique [0002] Ultrafine silica refers to silica particles with a particle size of less than 0.2 microns to nanoscale. In addition to the properties of ordinary silica, it also has some unique properties of its own, such as surface effect, volume effect, and small size. effect, quantum size effect, and macroscopic quantum tunneling effect, etc. These characteristics make it have broad application prospects in the fields of catalysis, optics, composite materials, medicine, aerospace industry, etc., especially under heavy load, low speed, and high temperature conditions. The nature of the work makes ultra-fine silica a high-performance, environmentally friendly lubricating oil additive with great development potential. At present, the research on ultrafine silica as a lubricating oil additive is mo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12
Inventor 李长生陈娟唐华范有志刘金银子
Owner 无锡润鹏复合新材料有限公司
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