Low-temperature chemical Ni-Cu-P plating solution and chemical Ni-Cu-P plating method applying the solution
A low-temperature chemical, ni-cu-p technology, applied in the direction of liquid chemical plating, metal material coating process, coating, etc., can solve the problem of not applying low-carbon steel substrate surface, etc., to improve the working environment conditions, Excellent hardness and wear resistance, the effect of reducing equipment investment
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Embodiment 1
[0065] A kind of low temperature chemical plating Ni-Cu-P solution, the prescription of this solution is: nickel sulfate 35g / L, copper sulfate 0.2g / L, sodium hypophosphite 25g / L, sodium acetate 8g / L, trisodium citrate 25g / L L, lactic acid 22ml / L, succinic acid 8g / L, glycine 0.01g / L, ammonium bifluoride 0.2g / L, potassium iodide 8mg / L, thiourea 1.5mg / L.
[0066] The specific configuration steps are:
[0067] (1) Accurately weigh each solid drug according to the above solution formula and dissolve it with a small amount of distilled water;
[0068] (2) the solution of nickel sulfate and copper sulfate is poured in the solution containing complex trisodium citrate, lactic acid, succinic acid and glycine under constant stirring;
[0069] (3) Add reducing agent sodium hypophosphite solution and stir and pour into (2) solution;
[0070] (4) Pour the stabilizing agent potassium iodide, thiourea and buffering agent sodium acetate solution into (3) solution under sufficient stirring r...
Embodiment 2
[0081] A kind of low temperature chemical plating Ni-Cu-P solution, the prescription of this solution is: nickel sulfate 35g / L, copper sulfate 0.2g / L, sodium hypophosphite 25g / L, sodium acetate 10g / L, trisodium citrate 30g / L L, lactic acid 28ml / L, succinic acid 10g / L, glycine 0.01g / L, ammonium bifluoride 0.2g / L, potassium iodide 8mg / L, thiourea 1.5mg / L.
[0082] The specific configuration steps are:
[0083] (1) Accurately weigh each solid drug according to the above solution formula and dissolve it with a small amount of distilled water;
[0084] (2) the solution of nickel sulfate and copper sulfate is poured in the solution containing complex trisodium citrate, lactic acid and succinic acid under constant stirring;
[0085] (3) Add reducing agent sodium hypophosphite solution and stir and pour into (2) solution;
[0086] (4) Pour the stabilizing agent potassium iodide, thiourea and buffering agent sodium acetate solution into (3) solution under sufficient stirring respecti...
Embodiment 3
[0097] A kind of low temperature chemical plating Ni-Cu-P solution, the formula of this solution is: nickel sulfate 35g / L, copper sulfate 0.4g / L, sodium hypophosphite 30g / L, sodium acetate 8g / L, trisodium citrate 25g / L L, lactic acid 28ml / L, succinic acid 10g / L, glycine 0.01g / L, ammonium bifluoride 0.2g / L, potassium iodide 8mg / L, thiourea 1.5mg / L.
[0098] The specific configuration steps are:
[0099] (1) Accurately weigh each solid drug according to the above solution formula and dissolve it with a small amount of distilled water;
[0100] (2) the solution of nickel sulfate and copper sulfate is poured in the solution containing complex trisodium citrate, lactic acid and succinic acid under constant stirring;
[0101] (3) Add reducing agent sodium hypophosphite solution and stir and pour into (2) solution;
[0102] (4) Pour the stabilizing agent potassium iodide, thiourea and buffering agent sodium acetate solution into (3) solution under sufficient stirring respectively; ...
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