Photocurable resin composition, dry film and cured product of the photocurable resin composition, and printed wiring board using the photocurable resin composition, the dry film, and the cured product
A technology of photocurable resin and photosensitive resin, applied in printed circuit, printed circuit manufacturing, printed circuit secondary treatment, etc., can solve the problems of reduced sensitivity, reduced developability, unable to obtain acid value, etc.
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[0176] The present invention will be specifically described below by showing examples and comparative examples, but the present invention is not limited by the following examples. In addition, the following "parts" and "%" are all mass standards unless otherwise stated.
Synthetic example 1
[0178] 106 parts of novolak type phenolic resin (manufactured by Showa High Molecular Co., Ltd., hydroxyl equivalent 106), 2.6 parts of 50% sodium hydroxide are charged in an autoclave with a thermometer, a nitrogen gas introduction device and an alkylene oxide introduction device and a stirring device Aqueous solution, 100 parts of toluene / methyl isobutyl ketone (mass ratio = 2 / 1), carry out nitrogen replacement in the system while stirring, then heat up, at 150°C, 8kg / cm 2 Slowly introduce 60 parts of propylene oxide to react. Until the gauge pressure is 0.0kg / cm 2 , the reaction was continued for about 4 hours and then cooled to room temperature. To this reaction solution, 3.3 parts of 36% aqueous hydrochloric acid solution was added and mixed to neutralize sodium hydroxide. This neutralized reaction product was diluted with toluene, washed with water three times, and the solvent was removed by an evaporator to obtain an alkylene oxide adduct of a novolak-type phenolic re...
Synthetic example 2
[0181] 164 parts of alkylene oxide adducts of the novolac type phenolic resin obtained in Synthesis Example 1, 72 parts of acrylic acid, 3.0 parts of p-toluenesulfonic acid, 0.05 parts of hydroquinone monomethyl ether, and 100 parts of toluene are charged into a stirrer, The reaction was carried out at 90° C. for 12 hours with stirring while blowing air into a reactor with a thermometer and an air blowing tube. After the water produced by the reaction started to distill off as an azeotrope with toluene, the reaction was further carried out for 5 hours, followed by cooling to room temperature. Use 5% NaCl aqueous solution to carry out water washing to gained reaction solution, remove toluene with evaporator distillation, add carbitol acetate, thereby obtain the novolak type PO addition acrylate resin solution (double bond equivalent of 70% of non-volatile content) 236g / eq·acid value 0). Call it A-2 Varnish.
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