Preparation method of super-hydrophobic surface
A super-hydrophobic surface and hydrophobic substance technology, which is applied in the field of super-hydrophobic surface preparation, can solve the problems of poor bonding between primary structure photoresist and material body, super-hydrophobic surface structure damage, and super-hydrophobic surface failure. The effect of biocompatibility, good mechanical properties, and simple method
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[0029] The polymer substrate used in the embodiments of the present invention is a polyethylene terephthalate film. The specific method is: first wash and dry the polyethylene terephthalate film, and then spin-coat a layer of photoresist (model DNR-L300) on it at a speed of 3000-5000 rpm. Pre-bake at 90°C for half an hour, expose, post-bake at 110°C for half an hour, and then develop to obtain a dotted array of photoresist. Then perform ion beam etching on it, the voltage is 1kV-10kV, the current is 0.01-1.5mA, and argon gas is passed through, and the vacuum degree is 1×10 -3 -1×10 -2Pa. A polymer columnar array with photoresist on the top is obtained. Then the photoresist is washed away with a solution to prepare a polymer columnar array. Then magnetron sputtering is used to sputter a zinc oxide seed layer on the surface of the polymer columnar array. Put it into the substrate into Zn(NO 3 ) 2 react in a mixed culture solution with hexamethylenetetramine at 60-100 degr...
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