Coating applied to thread forming tap
An extrusion tap and coating technology, which is applied in coating, metal extrusion die, metal material coating process and other directions, can solve the problems of tool cutting edge damage, large impact of tool wear, accelerated tool damage, etc., and achieve production costs. Low, good adhesion, wear-reducing effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0027] Clean the ordinary taps with ultrasonic degreasing and wax removal, dry them, place them in the chamber of the self-developed VAST-P800 coating equipment, heat and evacuate to 5×10 -3, the substrate temperature is 350 degrees, argon gas is passed through, the argon gas pressure is maintained at 0.1 Pa, the substrate bias voltage is between 800-900V, and glow discharge cleaning is performed for 45 minutes. After cleaning with argon gas, deposit a 200 nm-thick Cr layer transition layer on the substrate at a pressure of 0.1 Pa, a substrate temperature of 350°C, and a bias voltage of -250V. Then, turn off the argon gas, fill it with nitrogen gas, turn on the TiAl (alloy target) and Cr target under the conditions of 0.5 Pa, 300 degrees of nitrogen partial pressure, and -150V bias voltage, deposit TiAlCrN to reach a thickness of 300 nanometers, close the TiAl target, adjust Nitrogen partial pressure, make the nitrogen partial pressure at 0.5 Pa, deposit CrN to a thickness of ...
Embodiment 2
[0029] Clean the ordinary taps with ultrasonic degreasing and wax removal, dry them, place them in the chamber of the self-developed VAST-P800 coating equipment, heat and evacuate to 5×10 -3 , the substrate temperature is 350 degrees, argon gas is passed through, the argon gas pressure is maintained at 0.1 Pa, the substrate bias voltage is between 800 and 900V, and glow discharge cleaning is performed for 35 minutes. After the argon cleaning is completed, fill with nitrogen, the partial pressure of nitrogen is 0.4Pa, the partial pressure of argon is 0.2Pa, the temperature of the substrate is 350 degrees, and the bias voltage is -200V. Open the Ti target and deposit 250 nm on the substrate. Thick TiN layer transition layer. Then, turn off the argon gas, fill in nitrogen gas, open the Cr target under the condition of nitrogen partial pressure at 0.4 Pa, temperature 300 degrees, and -120V bias, deposit CrN to a thickness of 300 nanometers, adjust the nitrogen partial pressure so ...
Embodiment 3
[0031] Clean the ordinary taps with ultrasonic degreasing and wax removal, dry them, place them in the chamber of the self-developed VAST-P800 coating equipment, heat and evacuate to 5×10 -3 , the substrate temperature is 350 degrees, argon gas is passed through, the argon gas pressure is maintained at 0.1 Pa, the substrate bias voltage is between 800-900V, and glow discharge cleaning is performed for 45 minutes. After cleaning with argon gas, a 250 nm-thick TiN transition layer was deposited on the substrate under a pressure of 0.1 Pa, a substrate temperature of 350 degrees, and a bias voltage of -250 V. Then, turn off the argon gas, fill it with nitrogen gas, turn on the TiAl (alloy target) and Cr target under the conditions of 0.5 Pa, 300 degrees of nitrogen partial pressure, and -150V bias voltage, deposit TiAlCrN to reach a thickness of 200 nanometers, close the TiAl target, adjust Nitrogen partial pressure, make the nitrogen partial pressure at 0.5 Pa, deposit CrN to a t...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com