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Method for preparing diffraction micro-optical elements based on mask lithography technique and injection molding

A lithography technology and injection molding technology, applied in the field of manufacturing diffractive micro-optical elements based on mask lithography technology and injection molding, can solve the problems of inability to manufacture fine-structure micro-optical elements, low yield, long processing cycle, etc. Achieve the effect of low cost per piece, high yield and shortened production cycle

Inactive Publication Date: 2013-12-25
NANCHANG HANGKONG UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Such a long processing cycle and low yield rate are far from meeting the needs of making fine-structure micro-optical elements.

Method used

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  • Method for preparing diffraction micro-optical elements based on mask lithography technique and injection molding
  • Method for preparing diffraction micro-optical elements based on mask lithography technique and injection molding
  • Method for preparing diffraction micro-optical elements based on mask lithography technique and injection molding

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Example 1, The mold core of the diffractive micro-optical element is made into a transmission optical path experimental device

[0028] The invention uses image editing and design software such as L-EDIT and AUTOCAD to set the resolution of the graphics to be consistent with the minimum resolution of the digital micromirror device (DMD) or into an integer relationship, and the micro-optical element mask is first obtained on the digital lithography machine. Template (ie master). Such as figure 1 As shown, the light beam emitted by the violet light source 1 (high pressure mercury lamp) is expanded and collimated by the fiber point light source, and then directly irradiates the plug-in mask 2 (master), and the light beam transmitted by the prism beam splitter 4 , And then project the pattern on the mask plate on the photoresist-coated metal alloy substrate through the 10 times zoom objective lens 6, and the image of the pattern on the photoresist plate 7 in the substrate hold...

Embodiment 2

[0029] Embodiment 2, the process flow of making the metal alloy core of the diffractive micro-optical element

[0030] Grinding and polishing of metal alloy substrates—→substrate pretreatment (cleaning)—→photoresist homogenization—→pre-baking—→exposure—→post-baking—→development—→hard film—→electrochemical engraving of metal substrates Erosion—→Remove the glue—→Metal alloy core—→Injection mold assembly—→Injection molding machine—→Injection product (the micro-optical components remain on the optical plastic);

[0031] 1. Grinding and polishing of metal alloy substrate: The nickel-based metal alloy is wire-cut into the required wafer shape, the thickness of the substrate is about 3~5mm, if you want to make it into an injection mold core that can be used multiple times, the surface must be Only by grinding into a mirror can a high-quality finished product be produced;

[0032] Coarse grinding can be polished with metallographic sandpaper, and fine grinding is done by using existing equi...

Embodiment 3

[0049] Embodiment 3, injection molding manufacturing method of diffractive micro-optical element

[0050] The technology of replicating micro-optical elements containing surface diffractive microstructures is quite critical. It requires the existing replication technology to be able to replicate with high fidelity, and can make the diffraction efficiency and uniformity of the surface micro-optical element close to the value of the original microstructure (binary or multi-step structure). Injection molds are the main tool for the replication and molding of diffractive micro-optical elements. Generally speaking, these injection molded replicas are usually produced in batches. Therefore, plastic injection molds are required to have high efficiency, high quality and less processing or no processing after molding. Because of the characteristics of reprocessing (repair), the core material is high-temperature nickel-based metal alloy.

[0051] The design and production of the precision i...

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Abstract

The invention discloses a method for preparing diffraction micro-optical elements based on a mask lithography technique and injection molding, which enables the preparation to be developed toward miniaturization, mass production, low cost and rapid molding. The method for preparing the diffraction micro-optical elements comprises the following steps of firstly, preparing mask graphics of the micro-optical elements, such as binary raster and wave zone plates, by cartographic software; then preparing photoetching mask plates on chrome plated glass plates; then applying the chrome plated mask plates to a contact-type photoetching system; and preparing micro-optical element graphics on metal alloys coated with a positive photoresist by virtue of the photoetching technology, and etching the micro-optical element graphics by virtue of an electrochemical etching technology, so that the graphics on the chromium mask plates are transferred to a metal alloy base plate in one-to-one correspondence. The metal alloys etched with the graphics can act as movable mold cores on injection molding molds, and the micro-optical elements on the metal alloys can be transferred to optical plastics by virtue of the injection molding molds. The method is mainly characterized in that mold cores are convenient to replace, and the various diffraction micro-optical elements can be prepared by replacing mold cores with different graphics.

Description

Technical field [0001] The invention relates to a method for manufacturing diffractive micro-optical elements based on mask photoetching technology and injection molding. Background technique [0002] In the past, the production of diffractive micro-optical elements mostly used traditional photolithography. First, a layer of photoresist (photoresist) was coated on glass and other media, and the designed micro-optical element pattern was transferred by transfer. Copy one by one onto the photoresist plate on a dedicated contact exposure lithography machine. After the traditional photolithography process, micro-optical elements are formed on the photoresist of the glass plate or silicon wafer, and then after a piece of microscopic magnification inspection, the qualified devices are selected for ion beam etching, and the formed micro-optical elements are not only The area is small, and equipment such as a reactive ion etching machine is also very expensive. [0003] If micro-optical ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20B29C45/26G02B5/18
Inventor 龚勇清裴扬龚艺川李豪伟熊联明王庆张巍巍颜丽华
Owner NANCHANG HANGKONG UNIVERSITY
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