Organic electroluminescence device and preparation method thereof
An electroluminescent device and luminescent technology, which is applied in the fields of electric solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of poor refractive index, loss of total reflection, low light extraction performance, etc.
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[0038] The preparation method of the organic electroluminescence device 100 of an embodiment, it comprises the following steps:
[0039] Step S110 , preparing the scattering layer 20 on the surface of the glass substrate 10 by electron beam evaporation.
[0040] The scattering layer 20 is formed on one side surface of the glass substrate 10 . The scattering layer 20 is composed of a ternary doped layer 201 and an iron salt doped layer 202. The ternary doped layer 201 is prepared on the surface of the glass substrate 10 by electron beam evaporation, and the ternary doped layer 201 includes titanium dioxide ( TiO 2 ), a compound material of magnesium and a luminescent material, the compound material of magnesium is selected from magnesium fluoride (MgF 2 ), magnesium oxide (MgO) and magnesium sulfide (MgS), and the luminescent material is selected from 4-(dinitrile methyl)-2-butyl-6-(1,1,7,7-tetra Methyljuronesidine-9-vinyl)-4H-pyran (DCJTB), 9,10-di-β-naphthylene anthracene ...
Embodiment 1
[0061] The structure prepared in this example is glass substrate / TiO 2 :MgS:Alq 3 / FeCl 3 :UGH1 / ITO / MoO 3 / NPB / Alq 3 / TAZ / CsF / Ag organic electroluminescent device, in this embodiment and the following embodiments, " / " indicates a layer, and ":" indicates doping.
[0062] The glass substrate is N-LASF44. After rinsing the glass substrate with distilled water and ethanol, soak it in isopropanol for one night. The scattering layer is prepared on the glass substrate. The scattering layer is composed of a ternary doped layer and an iron salt doped layer. The ternary doped layer is prepared by electron beam evaporation on the surface of the glass substrate. The material is TiO 2 :MgS:Alq 3 ,TiO 2 , MgS and Alq 3 The mass ratio of the titanium dioxide is 0.2:5:1, the particle size of titanium dioxide is 50nm, and the thickness is 110nm. The iron salt doped layer is prepared by thermal resistance evaporation on the surface of the ternary doped layer, and the material is FeCl 3...
Embodiment 2
[0070] The structure prepared in this example is glass substrate / TiO 2 :MgF 2 :DCJTB / FeBr 3 :UGH2 / IZO / MoO 3 / TAPC / ADN / Bphen / Cs 2 CO 3 / Al organic electroluminescent devices.
[0071] The glass substrate is N-LAF36. After rinsing the glass substrate with distilled water and ethanol, soak it in isopropanol for one night to prepare a scattering layer on the glass substrate. The scattering layer is composed of a ternary doped layer and an iron salt doped layer. , on the surface of the glass substrate, the ternary doped layer was prepared by electron beam evaporation, and the material was TiO 2 :MgF 2 : DCJTB, TiO 2 , MgF 2 The mass ratio to DCJTB is 0.1:3:1, the particle size of titanium dioxide is 20nm, and the thickness is 300nm. The iron salt doped layer is prepared by thermal resistance evaporation on the surface of the ternary doped layer, and the material is FeBr 3 : UGH2, FeBr 3 The mass ratio to UGH2 is 2:0.1, and the thickness is 30nm. Then IZO is prepared on t...
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