A kind of multi-layer nano-composite tool coating and preparation method thereof
A nano-composite and cutting tool technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problems of poor oxidation resistance, low temperature resistance, high friction coefficient, etc., to reduce internal stress and improve toughness And the effect of cohesion, life improvement
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Embodiment 1
[0037] After cleaning and drying the cemented carbide integral cylindrical milling cutter, put it into the vacuum chamber, when the background vacuum degree of the vacuum chamber is 5´10 -3 Pa, pass Ar gas and control the air pressure at 6´10 -2 Pa, the substrate temperature was 400°C, the negative bias was -900 V, the ion source voltage of the anode layer was turned on at 800 V, the current intensity was 5 A, and the bombardment time was 20 min. After glow cleaning, adjust the vacuum to 0.9Pa, turn on the arc ion plating metal Ti target, keep the bias voltage at -600V, and bombard the substrate for 10 minutes to obtain a Ti metal bonding layer with a thickness of 110nm; turn on the Ti metal target, Zr metal target and TiSi alloy target, control arc voltage 25V, arc current 60A; at the same time open medium frequency magnetron sputtering Al target, control target current at 13A, voltage 350V, duty cycle 60%; adjust and control Ar gas, C 2 h 2 , N 2 Gas is introduced, the ga...
Embodiment 2
[0039] After cleaning and drying the cemented carbide integral cylindrical milling cutter, put it into the vacuum chamber, when the background vacuum degree of the vacuum chamber is 3´10 -3 When Pa, pass Ar gas and control the air pressure at 4´10 -2 Pa, the substrate temperature was 450°C, the negative bias was -900 V, the ion source voltage of the anode layer was turned on at 830 V, the current intensity was 3.2 A, and the bombardment time was 20 min. After glow cleaning, the vacuum was adjusted to 0.9 Pa, the arc ion plating metal Ti target was turned on, the bias voltage was kept at -700V, and the substrate was bombarded for 28 minutes to obtain a Ti metal bonding layer with a thickness of 150nm; after the bombardment was completed, the bias voltage dropped to -150V, duty cycle 40%, pass into N 2 , control the air pressure at 0.8Pa, keep the substrate temperature at 360°C, arc voltage at 20V, and arc current at 120A. At the same time, turn on the medium frequency magnetro...
Embodiment 3
[0042] After cleaning and drying the cemented carbide three-dimensional milling cutter, put it into the vacuum chamber. When the background vacuum degree of the vacuum chamber is 3´10 -3 When Pa, pass Ar gas and control the air pressure at 4´10 -2 Pa, the substrate temperature was 420°C, the negative bias was -900 V, the ion source voltage of the anode layer was turned on at 880 V, the current intensity was 3.4 A, and the bombardment time was 18 min. After glow cleaning, the vacuum was adjusted to 0.8 Pa, the arc ion plating metal Ti target was turned on, the bias voltage was kept at -680V, and the substrate was bombarded for 15 minutes to obtain a Ti metal bonding layer with a thickness of 120nm. After the bombardment is completed, the bias voltage drops to -150V, the duty cycle is 30%, and the N 2 , control the air pressure at 0.7Pa, keep the substrate temperature at 340°C, arc voltage at 28V, and arc current at 70A. At the same time, turn on the intermediate frequency ma...
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