Branching macromolecule with cyclotriphosphazene as structural framework and photoresist composition prepared through branching macromolecule

A technology of structural skeleton and cyclotriphosphazene, which is applied in the field of branched macromolecules synthesized based on cyclotriphosphazene to achieve the effects of good product performance, mild reaction conditions and high resolution

Inactive Publication Date: 2017-04-19
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] Hexachlorocyclotriphosphazene derivatives are a class of compounds whose basic skeleton is alternately arranged with phosphorus and nitrogen, so they have a high phosphorus-to-nitrogen ratio and can form a phosphorus-nitrogen synergistic effect. They are widely used in high-efficiency flame-retardant materials and chemical intermediates body, but it has not been reported in the field of photoresist, but using hexachlorocyclotriphosphazene as the starting material, through molecular structure design, introducing a photosensitive group, and synthesizing hexachlorocyclotriphosphazene with photosensitive properties Phosphazene branched macromolecules and research on their application in photoresists will broaden the application fields of such derivatives

Method used

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  • Branching macromolecule with cyclotriphosphazene as structural framework and photoresist composition prepared through branching macromolecule
  • Branching macromolecule with cyclotriphosphazene as structural framework and photoresist composition prepared through branching macromolecule
  • Branching macromolecule with cyclotriphosphazene as structural framework and photoresist composition prepared through branching macromolecule

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Effect test

Embodiment 1

[0030] refer to figure 1 , a kind of branched macromolecule taking cyclotriphosphazene as structural skeleton, the preparation method of described branched macromolecule is:

[0031] (1) Take p-hydroxybenzaldehyde (14.76g, 0.12mmol) in a 250mL single-mouth bottle, add 50mL tetrahydrofuran and 20mL triethylamine, put the single-mouth bottle in an oil bath, heat up to 65°C, and take hexachlorocyclotri Phosphazene (6.95g, 0.02mmol) was dissolved in 40mL of tetrahydrofuran, added dropwise within 40min, stirred and refluxed for 24h, and the resulting white suspension was suction filtered to obtain a yellow filtrate, which was removed by rotary evaporation, washed twice with ethanol, and pumped White powder was obtained after filtration, recrystallized twice from ethyl acetate, and suction filtered to obtain white powder, which was hexa-formylphenoxycyclotriphosphazene;

[0032] (2) In a 250mL three-necked flask equipped with a magnetic stirrer, a thermometer, and a water separator...

Embodiment 2

[0046] refer to figure 1 , a kind of branched macromolecule taking cyclotriphosphazene as structural skeleton, the preparation method of described branched macromolecule is:

[0047] (1) Take p-hydroxybenzaldehyde (7.38g, 0.06mmol) in a 250mL one-mouth bottle, add 50mL tetrahydrofuran and 20mL triethylamine, put the one-mouth bottle in an oil bath, heat up to 65°C, and take hexachlorocyclotri Phosphazene (6.95g, 0.02mmol) was dissolved in 40mL of tetrahydrofuran, added dropwise within 40min, stirred and refluxed for 24h, and the resulting white suspension was suction filtered to obtain a yellow filtrate, which was removed by rotary evaporation, washed twice with ethanol, and pumped White powder was obtained after filtration, recrystallized twice from ethyl acetate, and suction filtered to obtain white powder, which was hexa-formylphenoxycyclotriphosphazene;

[0048] (2) In a 250mL three-necked flask equipped with a magnetic stirrer, a thermometer, and a water separator, add h...

Embodiment 3

[0053] refer to figure 1 , a kind of branched macromolecule taking cyclotriphosphazene as structural skeleton, the preparation method of described branched macromolecule is:

[0054] (1) Take p-hydroxybenzaldehyde (14.76g, 0.12mmol) in a 250mL single-mouth bottle, add 50mL tetrahydrofuran and 20mL triethylamine, put the single-mouth bottle in an oil bath, heat up to 65°C, and take hexachlorocyclotri Phosphazene (6.95g, 0.02mmol) was dissolved in 40mL of tetrahydrofuran, added dropwise within 40min, stirred and refluxed for 24h, and the resulting white suspension was suction filtered to obtain a yellow filtrate, which was removed by rotary evaporation, washed twice with ethanol, and pumped White powder was obtained after filtration, recrystallized twice from ethyl acetate, and suction filtered to obtain white powder, which was hexa-formylphenoxycyclotriphosphazene;

[0055] (2) In a 250mL three-necked flask equipped with a magnetic stirrer, a thermometer, and a water separator...

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Abstract

The invention discloses a branching macromolecule with cyclotriphosphazene as a structural framework and a photoresist composition prepared through the branching macromolecule. The composition includes, by weight, 8%-11% of the branching macromolecule, 79%-87% of solvents and a photoacid generator, wherein the photoacid generator accounts for 5%-10% of the weight of the branching macromolecule. Phosphonitrilic chloride trimer and 4-Formylbenzoic acid serve as reaction main monomers of the branching macromolecule, and the branching macromolecule is prepared through a series of formylation, hydroxylation and the photosensitive monomer reaction. A branching macromolecule synthesis method is simple, reaction conditions are moderate, and high heat resistance and good film forming performance are achieved. The prepared photoresist composition has good developing performance, low line edge roughness is achieved, and therefore the application field of cyclotriphosphazene derivative materials is also expanded.

Description

technical field [0001] The invention relates to the field of phosphazene materials and photoresist, in particular to a branched macromolecule synthesized based on cyclotriphosphazene, which is applied in the field of photoresist. Background technique [0002] Photoresist, also known as photoresist, plays an important role in the microelectronics industry. It can be used to transfer circuit patterns to substrates to prepare microelectronic circuits by means of changes in its dissolution properties before and after exposure. [0003] Photoresist mainly includes film-forming resin, photoinitiator, diluent, solvent and so on. As the skeleton of photoresist, film-forming resin plays a key role in the performance of photoresist. After the film-forming resin is exposed to light, the photochemical reaction can quickly occur in the exposed area, which makes the physical properties of the material, especially the solubility, change significantly. After appropriate development treatm...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07F9/6593G03F7/004
CPCC07F9/65815G03F7/004
Inventor 刘敬成徐文佳郑祥飞纪昌炜刘仁刘晓亚
Owner JIANGNAN UNIV
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