Antibacterial wear-resistant amorphous carbon coating and preparation method thereof, antibacterial wear-resistant device
A coating and device technology, applied in the field of surface modification of ion beam materials, can solve problems such as affecting the service life and effect of related devices, poor wear resistance of antibacterial coatings, and restricting large-scale applications, and achieve good biocompatibility. Durable, dense coating, long lasting effect
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[0035] The present invention also provides a preparation method of an antibacterial and wear-resistant amorphous carbon coating, comprising the following steps:
[0036] (1) Carry out plasma cleaning to substrate, obtain substrate A 1 ;
[0037] (2) Coating deposition: Introduce carbon source gas and inert gas into the deposition chamber, turn on the bias power supply, use the silver-silicon composite target T as the target material, and 1 Silver-silicon co-doped graphite-like amorphous carbon coating deposited by sputtering on C 1 , to obtain antibacterial and wear-resistant amorphous carbon coating.
[0038] The present invention deposits an antibacterial and wear-resistant coating on the surface of the substrate through a magnetron sputtering method. The magnetron sputtering method has the advantages of high deposition rate, strong bonding force between the film layer and the substrate, and is not limited by the geometric size of the equipment itself.
[0039]The present...
Embodiment 1
[0096] The medical stainless steel (316L) sheet was ultrasonically cleaned with absolute ethanol and acetone for 15 minutes, and then dried with nitrogen gas. The treated stainless steel sheet was placed in a vacuum coating chamber and vacuumed to a pressure of 2×10 -3 Pa, then feed argon gas to a pressure of 2Pa, turn on the bias power supply, and use argon (Ar) plasma to sputter and clean the metal substrate for 15 minutes to obtain a metal substrate A 1 , the sputtering cleaning condition is that the power supply is 10kW, the negative bias voltage applied to the metal substrate is -700V, and the bias duty cycle is 50%;
[0097] Metal base A 1 Place in the magnetron sputtering coating deposition chamber, and vacuum the coating deposition chamber to a pressure of 1×10 - 3 Pa, then pass argon gas into the deposition chamber at a flow rate of 160sccm until the pressure is 4.5Pa, turn on the bias power supply, and use the silver-silicon composite target T 1 as the target (A ...
Embodiment 2
[0107] The medical titanium alloy (Ti-6Al-4V alloy) sheet was ultrasonically cleaned with absolute ethanol and acetone for 20 min, and then dried with nitrogen, and the treated stainless steel sheet was placed in a vacuum coating chamber, and the vacuum was evacuated to a pressure of 1×10 - 3 Pa, then pass through argon gas to a pressure of 2Pa, turn on the bias power supply, and use argon (Ar) plasma to sputter and clean the metal substrate for 10 minutes to obtain a metal substrate A 1 , the sputtering cleaning condition is that the power supply is 5kW, the negative bias voltage applied to the metal substrate is -800V, and the bias duty cycle is 40%;
[0108] Metal base A 1 Place in the magnetron sputtering coating deposition chamber, and vacuum the coating deposition chamber to a pressure of 5×10 - 3 Pa, then pass argon gas into the deposition chamber at a flow rate of 200sccm, until the pressure is 4Pa, turn on the bias power supply, and use the silver-silicon composit...
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