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Method for producing conductive film and conductive film

A manufacturing method and technology of conductive film, which can be used in cable/conductor manufacturing, equipment for manufacturing conductive/semiconductive layer, conductive layer on insulating carrier, etc. and other problems, to achieve the effect of good optical properties and good scratch resistance

Active Publication Date: 2019-07-02
RESONAC CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As these transparent conductive films, transparent conductive films using ITO (indium tin oxide) have been used in the past, but there are problems in that the supply stability of indium is low, the manufacturing cost is high, the flexibility is lacking, and the cost of manufacturing is low. film needs high temperature
[0004] In such a transparent conductive film, it is necessary to have high adhesion between the conductive layer and the substrate. In addition, especially for the transparent conductive film containing metal nanowires, since the surface area per unit mass of metals such as silver is large, it is easy to contact with each other. reacts with a variety of compounds, therefore, there is a problem of lack of environmental tolerance
Therefore, due to the influence of various chemicals and cleaning solutions used in the process, the influence of oxygen and moisture in the air exposed to long-term storage, etc., the nanostructure is easily corroded and the conductivity is likely to decrease.
In addition, especially in applications such as electronic materials, in order to prevent particulate impurities, dust, dust, etc. from adhering to and mixing with the surface of the substrate, a physical cleaning process using a brush or the like is often performed, but this process can also damage the surface. this becomes a problem

Method used

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  • Method for producing conductive film and conductive film
  • Method for producing conductive film and conductive film
  • Method for producing conductive film and conductive film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0049] Hereinafter, examples of the present invention will be specifically described. It should be noted that the following examples are for easy understanding of the present invention, and the present invention is not limited by these examples.

[0050] In this example, the molecular weight and acid value of the resin, and the total light transmittance and surface resistance of the conductive pattern were measured as follows.

[0051]

[0052] The value in terms of polystyrene measured by gel permeation chromatography (hereinafter referred to as GPC).

[0053] The measurement conditions of GPC are as follows.

[0054] Device name: HPLC unit HSS-2000 manufactured by JASCO Corporation

[0055] Column: Shodex column LF-804

[0056] Mobile phase: tetrahydrofuran

[0057] Flow rate: 1.0mL / min

[0058] Detector: RI-2031Plus manufactured by JASCO Corporation

[0059] Temperature: 40.0°C

[0060] Sample volume: sample loop 100μL

[0061] Sample concentration: prepared to ab...

Synthetic example 1

[0074] In a 2L three-neck flask equipped with a stirring device, a thermometer, and a condenser, C-1015N (manufactured by Kuraray Co., Ltd., polycarbonate diol) as a polyol compound was charged, and the raw material diol molar ratio was 1,9-nonanediol Alcohol: 2-methyl-1,8-octanediol=15:85, molecular weight 964) 143.6 g, 2,2-dimethylolbutyric acid (manufactured by Nippon Chemicals Co., Ltd.) which is a dihydroxy compound having a carboxyl group 27.32 g and 259 g of propylene glycol monomethyl ether acetate (trade name: methoxypropyl acetate, manufactured by Daicel Corporation) as a solvent were dissolved at 90°C.

[0075]The temperature of the reaction liquid was lowered to 70° C., and using a dropping funnel, Desumoglu (registered trademark)-W (methylene bis(4-cyclohexyl isocyanate) as a polyisocyanate was added dropwise over 30 minutes. Co., Ltd.) 87.5 g. After completion of the dropwise addition, the temperature was raised to 120°C, and the reaction was performed at 120°C ...

Synthetic example 2

[0077] In addition to using 44.8 g of C-1015N (manufactured by Kuraray Co., Ltd.), 16.1 g of 2,2-dimethylolbutyric acid (manufactured by Nippon Chemicals Co., Ltd.), and propylene glycol monomethyl ether acetate (Daisel Co., Ltd.) as a solvent, Except for 100.3 g of Desmogul (registered trademark)-W (manufactured by Sumika Bayer Uletan Co., Ltd.) and 40.7 g of Synthesis Example 1, a carboxyl group-containing polyurethane was obtained. The weight average molecular weight of the obtained carboxyl group-containing polyurethane was 29200, and the acid value of the resin was 60 mgKOH / g.

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Abstract

An object of the present invention is to provide a method for producing a conductive film and a conductive film having high adhesiveness to a substrate, environmental resistance, and scratch resistance. comprising the steps of forming a first resin layer on a substrate using a first resin composition containing a first functional group (S1), drying the first resin layer to such an extent that the conductive material does not sink into the layer (S2), Then, a conductive pattern (S3, S4) having an opening in plan view is formed on the first resin layer, and a second resin composition containing a second functional group that can be co-cured with the first functional group of the first resin layer is used to coat the conductive pattern. A second resin layer is formed so as to form at least a part of the pattern, and the first resin layer and the second resin layer are co-cured (S5).

Description

technical field [0001] The present invention relates to a method for producing a conductive film and the conductive film. Background technique [0002] Various conductive films have been developed and produced in accordance with applications to various electronic components. For example, transparent conductive films have been used in transparent electrodes of liquid crystal displays (LCD), plasma display panels (PDP), organic electroluminescent displays, solar cells (PV) and touch panels (TP), antistatic (ESD) films and It is used in various fields such as electromagnetic wave shielding (EMI) film. As these transparent conductive films, transparent conductive films using ITO (indium tin oxide) have been used in the past, but there are problems in that the supply stability of indium is low, the manufacturing cost is high, the flexibility is lacking, and the cost of manufacturing is low. High temperature is required for the membrane. Therefore, the search for a transparent ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01B13/00H01B5/14B32B7/025B82Y30/00
CPCB82Y30/00H01B5/14H01B13/00H01B13/0026H01B3/30H01B7/00
Inventor 鸟羽正彦内田博
Owner RESONAC CORPORATION