A kind of preparation method of nanometer multilayer structure carbon-based film

Abstract

The invention discloses a preparation method of a nano multi-layer structural carbon-based film. The method is characterized in that a DC reactive magneto-sputtering deposition technology is carried out; a monometallic target is used as a sputtering target; the mixed gas of methane-argon is used as a reaction gas source; and the self-forming effect is utilized to self-form the nano multi-layer carbo-based film in the carbon-based film, wherein carbon-enriched layers and metal-enriched layers are staggered in the nano multi-layer structural carbon-based film. According to the method, the reaction gas source is ionized under the inducing of a DC power supply, and thus methane and argon can produce plasma atmospheres containing various groups such as electronic groups, ion groups and free groups; the size and the direction of metal grains can be controlled through target poisoning effect; the growing surface is bombarded by low-energy ions, and thus the ions are promoted to spread and transfer, and thus the nano multi-layer carbon-based film in which the carbon-enriched layers and the metal-enriched layers are staggered can be self-formed on a substrate, and as a result, the mechanical performances of the carbon-based film can be improved. The method has the characteristics of being simple in deposition process, uniform to form the film, and high in repeatability; and the potential application prospect of the carbon-based film is extremely expanded.

Description

technical field [0001] The invention relates to a method for preparing a carbon-based nanometer multilayer film, in particular to a method for preparing a carbon-based nanometer multilayer structure film by adopting an unbalanced magnetron deposition technology, and belongs to the technical field of nanometer film preparation. Background technique [0002] Carbon-based films represented by diamond-like carbon films have a series of excellent properties such as high hardness, low friction, strong chemical stability, and corrosion resistance, and have become one of the research hotspots in the field of friction surface technology in various countries. Among them, the application and industrial production stages have been initially realized in some fields. Such as: protection and lubricating film of magnetic head, protective coating of mold, industrial cutting tool, window of infrared optical device, protective film of artificial organ, etc. [0003] At present, there are stil...

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Problems solved by technology

[0003] At present, there are still some problems in the carbon-based film itself that need to be solved: ①The prepared carbon-based film has a high internal stress, resulting in poor bonding between the film and the substrate material

②The toughness of the film is low, so brittle fracture is easy to occur

③The tribological properties of the film are affected by the test environment, and the tribological behavior exhibited in different environments is quite different

[0004] The traditional process of preparing nano-multilayer carbon-based thin films is relatively complicated, and generally requires periodic regulation of certain deposition conditions manually, for example: the deposition surface is periodically exposed to the target surface through the rotation of the sample stage; or periodic Deposition parameters such as turning on or off the target current, gas flow rate, etc., which make the film preparation process very complicated

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