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Method for preparing metal rhodium or rhodium alloy by electrodeposition or chemical deposition

A technology of chemical deposition method and electrodeposition method, applied in the field of alloy preparation, can solve the problems of poor plating solution stability and large plating porosity, and achieve the effects of stable plating solution, high plating solution stability and high current efficiency

Inactive Publication Date: 2018-12-28
HARBIN INST OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a method for preparing metal rhodium or rhodium alloys by electrodeposition or chemical deposition in order to solve the problems of large porosity and poor stability of the plating solution in the existing rhodium coating

Method used

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  • Method for preparing metal rhodium or rhodium alloy by electrodeposition or chemical deposition
  • Method for preparing metal rhodium or rhodium alloy by electrodeposition or chemical deposition
  • Method for preparing metal rhodium or rhodium alloy by electrodeposition or chemical deposition

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specific Embodiment approach 1

[0024] Specific embodiment one: what this embodiment records is a kind of method for preparing metal rhodium or rhodium alloy by electrodeposition method, and the specific steps of described method are as follows:

[0025] (1) According to the method described in the patent CN105906668B, the rhodium salt is dissolved in the acidic solution, and the complexing agent is dissolved in the alkaline solution. After the two are mixed, the pH value of the solution is gradually increased under the condition of heating and stirring. Adjust to 5~12, obtain the complex compound solution of rhodium ion, be recorded as A solution;

[0026] (2) Prepare a complex solution of dissimilar metal ions with a dissimilar metal ion content of 2 mol / L, denoted as B solution;

[0027] (3) Mix A solution and B solution at a volume ratio of 1:0~10 (when B solution is 0, it is a plating solution for electrodepositing single metal rhodium), and adjust the pH value to 5.5~12 with ammonia water and acid solu...

specific Embodiment approach 2

[0029] Embodiment 2: Embodiment 1 describes a method for preparing metal rhodium or rhodium alloy by electrodeposition, and the electrodeposition method includes direct current electrodeposition and pulse electrodeposition.

specific Embodiment approach 3

[0030] Specific embodiment three: a method for preparing metal rhodium or rhodium alloy by electrodeposition described in specific embodiment one, in step (1), the concentration of rhodium ions in the complex solution of rhodium ions is 0.1~ 10 g / L; The rhodium ion is provided by one or more of rhodium sulfate, rhodium phosphate, rhodium chloride, rhodium iodide, rhodium nitrate, rhodium chloride, preferably rhodium sulfate, rhodium chloride or Chlororhodium acid.

[0031] Embodiment 4: A method for preparing metal rhodium or rhodium alloys by electrodeposition described in Embodiment 1. In step (2), the dissimilar metal ions are copper, nickel, zinc, cobalt, iron, One or more of chromium, iridium, ruthenium, palladium, gold, silver, and use the complexing agent described in CN105906668B to prepare the corresponding complex.

[0032] Embodiment 5: A method for preparing metal rhodium or rhodium alloy by electrodeposition described in Embodiment 1. In step (3), the acid soluti...

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Abstract

The invention provides a method for preparing metal rhodium or rhodium alloy by electrodeposition or chemical deposition. The method comprises an electrodeposition method and a chemical deposition method, adopts a weakly acidic plating solution or a basic plating solution and comprises the following steps for preparing metal rhodium or rhodium alloy: (1) preparing a complex solution of rhodium according to composition and method described in the patent CN105906668B; (2) preparing a complex solution of dissimilar metal ions; (3) preparing a mixed solution containing a reducing agent and an additive; (4) proportionally mixing the solutions obtained in steps (1), (2) and (3) and regulating pH with ammonium hydroxide and an acid solution; (5) preparing a rhodium or rhodium alloy clad layer with the electrodeposition method or the chemical deposition method. A weakly acidic or basic solution system is adopted in the method, a replacement reaction in a strongly acid plating solution is avoided, binding force of the clad layer is good, the problems of low current efficiency and high porosity caused by massive hydrogen evolution of the strongly acid system are solved, and by means of adoption of an improved complexing agent and introduction of the additive, stability of the basic plating solution is improved.

Description

technical field [0001] The invention belongs to the technical field of alloy preparation, and in particular relates to a method for preparing metal rhodium or rhodium alloy by electrodeposition or chemical deposition. Background technique [0002] Metal rhodium has high chemical stability, insoluble in general acids and alkalis, only slightly soluble in aqua regia, strong corrosion resistance to gases such as sulfides and carbon dioxide in the atmosphere, and because of its own luster, rhodium coating can prevent silver discoloration It is widely used in coating and decorative electroplating. In addition, metal rhodium has high hardness, low contact resistance, and good conductivity. It can be used for surface coating of plug-in parts and high-frequency switches in electronic plating to improve contact reliability. In the field of catalysis, metal rhodium is also a catalyst with high catalytic activity and stability. However, due to the high price of rhodium, the use of all...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/50C25D3/56C25C1/20C25C1/24C23C18/44C23C18/48
CPCC23C18/44C23C18/48C25C1/20C25C1/24C25D3/50C25D3/56
Inventor 李宁孔德龙黎德育
Owner HARBIN INST OF TECH
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