A petal-shaped molybdenum disulfide two-dimensional crystal material and its preparation method and application
A two-dimensional crystal, molybdenum disulfide technology, applied in the growth of polycrystalline materials, chemical instruments and methods, crystal growth, etc., can solve the problems of expensive raw materials, insufficient stability, poor substrate uniformity, etc., to achieve good crystallinity, The effect of controllable shape characteristics and stable performance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0037] 1. Select silicon / silicon dioxide (285nm) as the product substrate, and use acetone, ethanol, and deionized water to perform ultrasonic cleaning for 5 minutes to remove surface impurities, and then dry the surface with dry nitrogen. Use a vacuum plasma cleaner for further surface cleaning, and the cleaning time is 600s.
[0038] 2. Select silicon / silicon dioxide (285nm) as the reactant molybdenum source carrier substrate, the size is 8mm×8mm, use ethanol to ultrasonically clean for 5min, and dry the surface with dry nitrogen.
[0039] 3. Dissolve oxymolybdenum acetylacetonate powder in methanol solution to form a stable sol-gel solution with a concentration of 20 mg / mL. Use a pipette gun to draw 10 μL of oxymolybdenum acetylacetonate solution, drop-coat it on the molybdenum source slide, place the slide on a heating plate at 60°C for 10 seconds, and form a light yellow continuous film on the surface of the slide after annealing. Continue annealing for 5 minutes. After ...
Embodiment 2
[0043] Compared with Example 1, the difference is that 20 μL of oxymolybdenum acetylacetonate solution with a concentration of 10 mg / ml was used for two drop coatings. The carrier gas flow rate was kept constant at 100 sccm during the reaction. When the temperature of the molybdenum source reaction zone reaches 610°C, let the sulfur source reaction furnace start heating, the temperature of the sulfur source reaction zone is set to 160°C, and the temperature of the molybdenum source reaction zone is 750°C.
[0044] Figure 5 The topography of the petal-shaped molybdenum disulfide two-dimensional crystal prepared in this example. from Figure 5 It can be seen from the figure that the length and width of the petals of the product are affected by adjusting the carrier gas flow rate. When the air flow is 100 sccm, the petals become longer and narrower.
Embodiment 3
[0046] 1. Select silicon / silicon dioxide (285nm) as the product substrate, and use acetone, ethanol, and deionized water to perform ultrasonic cleaning for 5 minutes to remove surface impurities, and then dry the surface with dry nitrogen. Use a vacuum plasma cleaner for further surface cleaning, and the cleaning time is 600s.
[0047] 2. Select silicon / silicon dioxide (285nm) as the reactant molybdenum source carrier substrate, the size is 5mm×5mm, use ethanol to ultrasonically clean for 5min, and dry the surface with dry nitrogen.
[0048] 3. Dissolve oxymolybdenum acetylacetonate powder in methanol solution to form a stable sol-gel solution with a concentration of 15 mg / mL. Use a pipette gun to draw 15 μL of oxymolybdenum acetylacetonate solution, drop-coat it on the molybdenum source slide, and form a light yellow continuous film on the surface of the slide after natural air drying. After annealing for 5 minutes, the continuous film on the surface of the slide breaks into...
PUM
Property | Measurement | Unit |
---|---|---|
concentration | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com