Ultralow power consumption ferroelectric transistor type memory based on two-dimensional organic functional material and preparation method thereof
A technology of organic functional materials and ferroelectric transistors, applied in the field of ultra-low power consumption organic non-volatile memory and its preparation, can solve the problem that the power consumption of Fe-OFET memory is at the nJ level, which is not conducive to high energy efficiency operation of devices, and unreliable devices Long-term stability and other issues, to achieve reliable and considerable ferroelectric properties, to achieve rapid storage of devices, and to ensure the effect of insulating properties
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[0021] The present invention will be further explained below in conjunction with the accompanying drawings.
[0022] In this embodiment, the preparation method of the ultra-low power consumption ferroelectric transistor memory based on two-dimensional organic functional materials includes the following steps:
[0023] Step 1: Using heavily doped n-type silicon as the gate and as the substrate, a layer of aluminum oxide insulating layer with a thickness of 5 nm and a high dielectric constant is grown on the substrate by means of atomic beam deposition.
[0024] Step 2: followed by ultrasonically cleaning the substrate with acetone, isopropanol and deionized water in sequence, and then preparing an ultra-thin ferroelectric polymer crystalline film at room temperature by using an anti-solvent assisted crystallization method. The ultra-thin ferroelectric polymer crystalline film is vinylidene fluoride-trifluoroethylene (P(VDF-TrFE)) with a thickness of 1-5nm, the main solvent in t...
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