Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Ultralow power consumption ferroelectric transistor type memory based on two-dimensional organic functional material and preparation method thereof

A technology of organic functional materials and ferroelectric transistors, applied in the field of ultra-low power consumption organic non-volatile memory and its preparation, can solve the problem that the power consumption of Fe-OFET memory is at the nJ level, which is not conducive to high energy efficiency operation of devices, and unreliable devices Long-term stability and other issues, to achieve reliable and considerable ferroelectric properties, to achieve rapid storage of devices, and to ensure the effect of insulating properties

Active Publication Date: 2019-07-23
NANJING UNIV
View PDF4 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, Fe-OFET memory power consumption is generally at the nJ level
The commonly used ferroelectric polymer P (VDF-TrFE) film is generally 200-1000nm, so a higher voltage is required to achieve the control of polarization reversal (30-100V), and the high operating voltage not only produces high energy consumption, but also leads to unreliable Long-term stability of the device and incompatibility with the requirements of portable products such as mobile data storage, consumer electronics terminals, and solid-state drives
On the other hand, the metal / semiconductor layer interface still has the problem of difficult carrier injection, resulting in extremely high contact resistance, and the related heat loss problem needs to be solved urgently
Furthermore, charge carrier accumulation and depletion in the channel determine the transition between on-off states in ferroelectric organic field-effect transistors, and the slower switching behavior is detrimental to the energy-efficient operation of the device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultralow power consumption ferroelectric transistor type memory based on two-dimensional organic functional material and preparation method thereof
  • Ultralow power consumption ferroelectric transistor type memory based on two-dimensional organic functional material and preparation method thereof
  • Ultralow power consumption ferroelectric transistor type memory based on two-dimensional organic functional material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] The present invention will be further explained below in conjunction with the accompanying drawings.

[0022] In this embodiment, the preparation method of the ultra-low power consumption ferroelectric transistor memory based on two-dimensional organic functional materials includes the following steps:

[0023] Step 1: Using heavily doped n-type silicon as the gate and as the substrate, a layer of aluminum oxide insulating layer with a thickness of 5 nm and a high dielectric constant is grown on the substrate by means of atomic beam deposition.

[0024] Step 2: followed by ultrasonically cleaning the substrate with acetone, isopropanol and deionized water in sequence, and then preparing an ultra-thin ferroelectric polymer crystalline film at room temperature by using an anti-solvent assisted crystallization method. The ultra-thin ferroelectric polymer crystalline film is vinylidene fluoride-trifluoroethylene (P(VDF-TrFE)) with a thickness of 1-5nm, the main solvent in t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses an ultralow power consumption ferroelectric transistor type memory based on a two-dimensional organic functional material and a preparation method thereof. The method is as below: growing an aluminum oxide insulating layer on a substrate by an atomic beam deposition method; preparing a layer of ultrathin ferroelectric polymer crystalline film at room temperature by utilizing an anti-solvent assisted crystallization method; then simultaneously growing a layer of ultrathin polymethyl methacrylate and a layer of ultrathin dioctyl benzothiophene benzothiophene by utilizinga floating coffee ring effect and a phase separation method; and finally transferring a gold film onto a dioctyl benzothiophene layer as a source electrode and a drain electrode by utilizing a non-invasive gold film transfer process. A quasi-two-dimensional ferroelectric polymer crystalline film and a two-dimensional organic molecular crystal C8-BTBT are used as a dielectric layer to prepare the fast transistor memory, so that the power consumption of the ferroelectric organic field effect transistor memory can be greatly reduced, and meanwhile, the low-voltage operation capability and the fast storage capability are realized.

Description

technical field [0001] The invention relates to the fields of two-dimensional organic functional materials, ferroelectric polymers, semiconductor technology, organic transistor memory and the like, in particular to an ultra-low power consumption organic non-volatile memory and its preparation. Background technique [0002] The development of modern electronic technology has put forward higher and higher requirements for information storage, such as high speed, low energy consumption and high integration density. With the continuous emergence of emerging functional information technologies such as smart terminals and cloud services, advanced sensing and Internet of Things technologies, and big data management, memory has become an important cornerstone to support changes in the field of information science in the current era. At present, silicon-based electrical memory based on traditional semiconductors has the advantages of fast storage and long-term storage of information,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L51/05H01L51/40
CPCH10K10/476H10K10/466
Inventor 李昀裴梦皎钱君王启晶施毅
Owner NANJING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products