Preparation method of friction layer surface microstructure of triboelectric nanogenerator
A nano-generator and micro-structure technology, applied in the direction of triboelectric generator, nano-technology, etc., can solve the problems of inability to effectively control the morphology and size of the micro-structure of the film surface, high cost, increase the specific surface area of the film, etc., and meet the equipment requirements Low cost, low cost, and simple preparation process
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no. 1 example ～ no. 3 example
[0029] First embodiment provides a kind of preparation method of polydimethylsiloxane (PDMS) film surface microstructure, comprises the steps:
[0030] Step 1: Mix the PDMS prepolymer and the curing agent (SYLGARD 184) at a mass ratio of 10:1, stir well and use a simple vacuum device to exhaust the air bubbles in the mixture;
[0031] Step 2: uniformly coat the mixture on a PET film substrate with a thickness of 125 microns by spin coating, control the rotation speed at 500 rpm, and spin coat for one minute;
[0032] Step 3: Then anneal at a constant temperature of 85°C for 1 hour to completely cure the mixture and obtain a PDMS film with a flat and uniform surface;
[0033] Step 4: After standing at room temperature at 20-25°C for 24 hours, grow a ZnO film on the surface of the PDMS film by using magnetron sputtering technology. The sputtering power is controlled at 70W, and the sputtering time is 1 minute. The thickness of the ZnO film is About 10nm, the magnetron sputterin...
no. 4 example
[0043] This embodiment provides another preparation method of polydimethylsiloxane (PDMS) surface microstructure, and its steps 1 to 3 are the same as those of the first embodiment, except that:
[0044] Step 4: after standing at room temperature of 20-25° C. for 24 hours, a Si film is sputtered on the PDMS surface by magnetron sputtering technology. The sputtering power was controlled at 60W, the sputtering time was 10 minutes, and the Si film thickness was about 200nm.
[0045] Step 5: After the sputtering is completed, the temperature is returned to room temperature, and the Si film on the surface of the PDMS is removed with a mixed solution of tetramethylammonium hydroxide and potassium hydroxide to obtain a PDMS with a microstructure on the surface.
[0046] Similarly, in this embodiment, the magnetron sputtering process itself will generate a certain amount of heat, so that the temperature of the PDMS and Si film will increase, and then produce microstructures on the sur...
no. 5 example
[0050] This embodiment provides another preparation method of polydimethylsiloxane (PDMS) surface microstructure, and its steps one to three are the same as those of the first embodiment, except that:
[0051] Step 4: after standing at room temperature of 20-25° C. for 24 hours, a Cu thin film is sputtered on the PDMS surface by magnetron sputtering technology. The sputtering power was controlled at 50W, the sputtering time was 10 minutes, and the thickness of the Cu film was about 150nm.
[0052] Step 5: After the sputtering is completed, the temperature is returned to room temperature, and the Cu film on the surface of the PDMS is removed with a ferric chloride solution to obtain a PDMS with a microstructure on the surface.
[0053] Similarly, in this embodiment, the magnetron sputtering process itself will generate a certain amount of heat, so that the temperature of the PDMS and Cu film will increase, and then produce microstructures on the surface of the PDMS film during ...
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Abstract
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