Electrolyte composition containing metals and silicon in plasma electrolytic oxidation process and method for manufacturing dental implants coated with hydroxyapatite and containing metal ions and silicon ions by using same composition

Abstract

The present invention relates to formation of a porous oxide film, by means of plasma electrolytic oxidation, on the surface of a titanium-based alloy which is a metallic material that is generally used by being inserted into bones in a human body. More specifically, the present invention relates to a method for manufacturing implants for improving bioactivity by forming, by means of plasma electrolytic oxidation, a surface of a porous oxide film containing metal ions, silicon ions, calcium and phosphorus on the surface of dental implants, by using an electrolyte solution containing, from among plenty of ions constituting a human body, metals (magnesium, zinc, strontium, manganese) and silicon that play an important role in the cell adhesion and bone formation. In addition, the present invention relates to an electrolyte composition containing metals and silicon in a plasma electrolytic oxidation process and a method for manufacturing dental implants coated with hydroxyapatite and containing metal ions and silicon ions by using the composition, wherein the plasma electrolytic oxidation process comprises: a titanium alloy preparation step of sequentially subjecting a dental titaniumalloy to grinding, micro-grinding, and ultrasonic cleaning; an insertion step of installing the titanium alloy prepared in the preparation step on an anode of an electrolysis tank, installing platinum on a cathode thereof, and inserting an electrolyte solution; a plasma forming step of forming an oxide film on the titanium alloy by generating plasma by applying constant voltage and current density; and a drying step of, after the oxide film is formed on the titanium alloy in the plasma forming step, cleaning the same with ethanol and distilled water, and then drying the same. The electrolytecomposition containing metals and silicon in the plasma electrolytic oxidation process and the method for manufacturing dental implants coated with hydroxyapatite and containing metal ions and siliconions by using the composition have the effect of simplifying steps of a manufacturing process and reducing time for manufacturing implants and a therapeutic period by treating the surface of the dental implants by employing the plasma electrolytic oxidation process in a titanium-based bio-alloy. Also, a porous oxide film having biocompatibility has been generated through complex substitution of metal ions and silicon ions using plasma electrolytic oxidation, an oxide film that is thicker and denser than conventional metal oxide films is manufactured, and the biocompatibility is rapidly increased by containing bioactive materials of metal ions and silicon ions, thereby enhancing the initial fixing force of the dental implants and reducing the therapeutic period.

Description

technical field [0001] The present invention generally forms a porous oxide film on the surface of a titanium-based alloy, a metal material used in a bone inserted into the human body, by plasma electrolytic oxidation (Plasma Electrolytic Oxidation). More specifically, it relates to the process of plasma electrolytic oxidation containing Electrolyte composition of metal and silicon and method for producing dental implant coated with hydroxyapatite containing metal ions and silicon ions using the composition, using An electrolyte solution of metals (magnesium, zinc, strontium, manganese) and silicon that play an important role in cell adhesion and bone formation, on the surface of dental implants, formed by plasma electrolytic oxidation containing metal ions and silicon ions and calcium and phosphorus The surface of the porous oxide film is used to improve the biological activity of the dental implant manufacturing method. The process includes: titanium alloy preparation step, ...

AI Technical Summary

Problems solved by technology

However, problems such as the inability to induce regeneration of adjacent bone tissue and shortened treatment time due to problems such as the rapid disappearance of the oxide film in the conventional technology have been partially improved, and the problems of the past are still contained.

[0010] Looking at the above-mentioned prior art, an oxide film is formed on the surface of the titanium alloy, and the electrolyte solution used in the plasma electrolytic oxidation process contains β-tricalcium phosphate and potassium dihydrogen phosphate (KH 2 PO 4 ) and calcium chloride (CaCl 2 ), etc., are composed of a structure that changes voltage and current density, etc., and form a porous surface of an oxide film on the surface of a dental implant formed only of conventional titanium-based alloys, improve bioactivity, and induce bone cell adhesion and osseointegrated growth faster , but as a metabolic process and an element formed by bone, the factors contained in the above electrolyte solution have insufficient biocompatibility

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