Nano silicon material with low cost and high yield and preparation method thereof
A nano-silicon, low-yield technology, applied in the direction of nanotechnology, nanotechnology, nanotechnology, etc. for materials and surface science, can solve the problem of low electronic conductivity and ion conductivity, reduced service life of silicon materials, and preparation of silicon materials Cost increase and other issues, to achieve the effect of improving conductivity, low cost, and improving surface oxidation resistance
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Embodiment 1
[0017] A low-cost and high-yield nano-silicon material, which is prepared directly from cheap and easy-to-obtain natural attapulgite to obtain rod-shaped nano-SiO 2 , and then the nano-SiO 2 A magnesium reduction method is used to obtain single crystal silicon nanoparticles with an average particle diameter of 20nm, and then carbon coating is performed on the single crystal silicon nanoparticles to obtain a carbon-coated composite nano-silicon material.
[0018] The concrete steps of the preparation method of this kind nano-silicon material are:
[0019] A: Pass attapulgite through a 200-mesh sieve, react with 2M HCL at 70 degrees Celsius for 30 hours, and calcinate at 700 degrees Celsius for 5 hours in a muffle furnace to obtain rod-shaped nano-SiO 2 ;
[0020] B: Rod SiO 2 After being broken into coarse silicon powder, it is added to a non-aqueous solvent, then stirred and sieved to obtain a coarse silicon slurry;
Embodiment 2
[0025] A low-cost and high-yield nano-silicon material, which is prepared directly from cheap and easy-to-obtain natural attapulgite to obtain rod-shaped nano-SiO 2 , and then the nano-SiO 2 A magnesium reduction method is used to obtain single crystal silicon nanoparticles with an average particle diameter of 20nm, and then carbon coating is performed on the single crystal silicon nanoparticles to obtain a carbon-coated composite nano-silicon material.
[0026] The concrete steps of the preparation method of this kind nano-silicon material are:
[0027] A: Pass attapulgite through a 200-mesh sieve, react with 2M HCL at 70 degrees Celsius for 30 hours, and calcinate at 700 degrees Celsius for 5 hours in a muffle furnace to obtain rod-shaped nano-SiO 2 ;
[0028] B: Rod SiO 2 After being broken into coarse silicon powder, it is added to a non-aqueous solvent, then stirred and sieved to obtain a coarse silicon slurry;
[0029] C: Grinding the coarse silicon slurry to obtain ...
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