A method for making optical micro-nano pattern on the surface of lithium niobate thin film
A technology for surface fabrication and lithium niobate, which is applied in the photo-engraving process of optics and pattern surface, and the exposure device of photo-engraving process, etc., can solve the problems of affecting electron beam deflection, increasing device size, and large optical mode field size, etc. Accurate and controllable pattern size, reduced optical device size, and large refractive index contrast
A technology for surface fabrication and lithium niobate, which is applied in the photo-engraving process of optics and pattern surface, and the exposure device of photo-engraving process, etc., can solve the problems of affecting electron beam deflection, increasing device size, and large optical mode field size, etc. Accurate and controllable pattern size, reduced optical device size, and large refractive index contrast
CN110850688BActive Publication Date: 2021-02-26TSINGHUA UNIV +1
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[0045] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0046] The electron beam exposure machine used in this embodiment is produced by UK Nanobeam Co., Ltd., and the model is NB5.
[0047] A method for making optical micro-nano patterns on the surface of a lithium niobate thin film, such as figure 1 shown, including the following steps:
[0048]Step 1, making a layout required for electron beam exposure in drawing software (such as AutoCAD or Ledit, etc.), and the layout includes first-layer marks and second-layer graphics. The first layer is marked as a square with a side length greater than 4 μm, or a cross with a width greater than 4 μm, wherein ...
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Abstract
The invention relates to a method for manufacturing an optical micro-nano pattern on the surface of a lithium niobate film, which belongs to the technical field of micro-nano processing. The method comprises the following steps: manufacturing a layout required by electron beam exposure; cleaning and drying a lithium niobate substrate; sputtering a metal conductive layer on the lithium niobate substrate; spin-coating the lithium niobate substrate with electron beam glue; carrying out first electron beam exposure on the lithium niobate substrate to manufacture a mark; carrying out developing andfixing; carrying out magnetron sputtering of metal on the lithium niobate substrate to manufacture a metal mark; removing the photoresist and stripping a metal-masked pattern to prepare a lithium niobate sheet with a metal bulge mark; spin-coating the lithium niobate sheet with electron beam glue; carrying out second electron beam exposure on the lithium niobate sheet to manufacture a pattern; carrying out developing and fixing; and carrying out pattern transfer to form a micro-nano structure. By means of the method, a pattern with a steep side wall can be manufactured on a non-conductive lithium niobate material, a micro-nano pattern with the size smaller than 900nm can be manufactured, the manufactured optical waveguide is large in refractive index contrast ratio, the size of an opticaldevice can be reduced, and the performance of the optical device can be improved.
Description
technical field [0001] The invention relates to a method for making optical micro-nano patterns on the surface of a lithium niobate thin film, belonging to the technical field of micro-nano processing. Background technique [0002] Lithium niobate material (LiNbO 3 ) is a non-conductive uniaxial crystal. Due to its wide light transmission window (340-4600nm) and excellent electro-optic, acousto-optic, nonlinear optics, and piezoelectric properties, it is widely used in the fields of optical signal processing, quantum electrodynamics, and optomechanics. with broadly application foreground. Single crystal lithium niobate thin films can be prepared by ion implantation and bonding technology. Due to the emergence of lithium niobate thin films, lithium niobate materials have received more attention in the field of integrated optics. [0003] At present, the fabrication methods of lithium niobate optical waveguide mainly include titanium diffusion and proton exchange after photo...
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Patent Timeline
26 Feb 2021
Publication
CN110850688B
- IPC
- G03F7/20
- CPC
- G03F7/2022; G03F7/2059
- Inventors
- 曾嵘; 庄池杰