Preparation method and application of tungsten oxide hydrate single-particle Raman substrate

A tungsten oxide hydrate, Raman substrate technology, applied in tungsten oxide/tungsten hydroxide, Raman scattering, material excitation analysis, etc., can solve the problems of high cost, unfavorable industrial promotion, restrict development, etc., and achieve accurate detection results , Eliminate interference factors, the effect of uniform and smooth surface

Active Publication Date: 2020-05-29
CHINA JILIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although noble metal nanoparticles have a very strong SERS effect, noble metal nanoparticles are used as a Raman substrate with a collective effect, and the shape, size, and arrangement of noble metal nanoparticles cannot maintain absolute consistency each time. The shape, size and spacing of the particles have a great influence on the EF of the SERS effect, so the stability and repeatability of the SERS detection signal have been criticized, which largely restricts its development.
However, semiconductor substrates usually require special and complex structural designs such as holes, vacancies, and heterojunctions to achieve the SERS effect; the overall manufacturing complexity is high, and it is also not conducive to industrial promotion.

Method used

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  • Preparation method and application of tungsten oxide hydrate single-particle Raman substrate
  • Preparation method and application of tungsten oxide hydrate single-particle Raman substrate
  • Preparation method and application of tungsten oxide hydrate single-particle Raman substrate

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preparation example Construction

[0031] A method for preparing a tungsten oxide hydrate single particle Raman substrate, the specific steps are as follows:

[0032] (1) Cut the nickel foam into a square of 0.5cm*1cm*1cm, wash the nickel foam square with 1mol / L hydrochloric acid solution for 10-20 minutes, and remove the oil stain on the surface; then wash it repeatedly with ultrapure water and ethanol , Take out the nickel foam and place it on a watch glass, and fully dry it in a vacuum oven at 80°C.

[0033] (2) Add 2mmol of ammonium tungstate pentahydrate, 2mmol of hexamethylenetetramine powder, and 30ml of ultrapure water into the polytetrafluoroethylene liner of a hydrothermal kettle with a volume of 50ml, and stir fully to make the above powder as much as possible Dispersed in ultrapure water without obvious precipitation;

[0034] (3) Throw in a plurality of pieces (4 pieces) of foamed nickel processed through step (1); insert the high-pressure hydrothermal kettle after sealing; place the high-pressure...

Embodiment 2

[0047] A method for preparing tungsten oxide hydrate single particles, the specific steps are as follows:

[0048](1) Cut the nickel foam into a square of 0.5cm*1cm*1cm, wash the nickel foam square with 1mol / L hydrochloric acid solution for 10-20 minutes, and remove the oil stain on the surface; then wash it repeatedly with ultrapure water and ethanol , Take out the nickel foam and place it on a watch glass, and fully dry it in a vacuum oven at 80°C.

[0049] (2) Add 2mmol ammonium tungstate pentahydrate, 2mmol hexamethylenetetramine powder, 1mmol urea powder, and 30ml ultrapure water into the polytetrafluoroethylene liner of a hydrothermal kettle with a volume of 50ml, fully stir, Make the above powder dispersed in ultrapure water without obvious precipitation;

[0050] (3) Throw in a plurality of pieces (4 pieces) of foamed nickel processed through step (1); insert the high-pressure hydrothermal kettle after sealing; place the high-pressure hydrothermal kettle as a whole in...

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Abstract

The invention discloses a preparation method of a tungsten oxide hydrate single-particle Raman substrate. The preparation method specifically comprises the following steps: (1) cleaning foamed nickeland then drying for later use; (2) mixing ammonium tungstate pentahydrate, hexamethylenetetramine powder and ultrapure water according to a part ratio of 1:1:830 to obtain a mixed solution for later use; (3) pouring the mixed solution in the step (2) into a polytetrafluoroethylene liner; (4) putting the foamed nickel treated in the step (1) into the polytetrafluoroethylene liner; inserting a sealing cover into a high-pressure hydrothermal kettle; putting the high-pressure hydrothermal kettle into a blast drying oven, heating to 105 DEG C at a speed of 5 DEG C/min, and keeping the temperature for at least 12 hours at the temperature of 105 DEG C to enable submillimeter tungsten oxide hydrate to grow on the surface of the foamed nickel; and cleaning foamed nickel to remove impurities; and (5) separating the tungsten oxide hydrate single particles in the step (4) from the foamed nickel by using ultrasonic waves; and drying to obtain tungsten oxide hydrate single particles. The particles are mainly used for ratio detection of molecules such as cytochrome C.

Description

technical field [0001] The invention relates to the field of Raman detection, in particular to a method for preparing a tungsten oxide hydrate single particle Raman substrate and an application thereof. Background technique [0002] With the development of micro-nano structure manufacturing technology, Raman signals are used for the detection of chemical substances in various fields. The Raman substrate can amplify the Raman signal of the molecule to be detected through the surface-enhanced Raman (SERS) effect to achieve high-sensitivity detection. [0003] Among them, the enhancement factor (EF) of noble metal nanoparticles such as gold and silver can reach 10. 14 -10 15 For the detection of chemical substances, it can reach the single-molecule level. Although noble metal nanoparticles have a very strong SERS effect, noble metal nanoparticles are used as a Raman substrate with a collective effect, and the shape, size, and arrangement of noble metal nanoparticles cannot m...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G41/02G01N21/65
CPCC01G41/02G01N21/658C01P2002/72C01P2002/82C01P2002/85
Inventor 谢杭清徐时清白功勋杨晓磊
Owner CHINA JILIANG UNIV
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