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Frequency tripling laser device for 324-500nm continuous laser

A triple frequency and laser technology, applied in the field of 324-500nm continuous laser, can solve the problems of high-power green light acquisition difficulty, low efficiency, laser acquisition difficulty, etc., achieve good anti-interference performance, expand the practical range, and reduce costs Effect

Pending Publication Date: 2020-06-26
宁波频准激光科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] First, green light pumps titanium-doped sapphire to obtain a femtosecond laser, and then doubles its frequency to obtain ultraviolet laser output (high-power green light is difficult to obtain and the cost is high);
[0005] Second, the near-fundamental frequency laser output by the laser diode is directly frequency-multiplied (very low efficiency);
There is no report on the 355nm continuous laser with a compact structure above the watt level. The maximum output power of the continuous 355nm tripled frequency that can be found in the literature is 410 milliwatts [see Conference on Lasers and Electro-Optics 1996, ISBN: 1 -55752-443-2], this scheme belongs to the external cavity resonant sum frequency structure of dual wavelength resonance, which requires two sets of loops to be locked at the same time, the electronic structure is extremely complex, and the ability to resist environmental interference is poor, and the system needs to use 1064nm at the same time and 532nm lasers, the 532nm laser is difficult and unstable to obtain, and the overall cost is high
Another frequency-tripling technology scheme for generating continuous 355nm laser is to use a single-pass triple-pass of two cascaded PPSLT crystals [see Advanced Solid-State Photonics 2012, 29 January–1 February 2012, ISBN:978-1 -55752-933-6], this solution has the advantages of simple and compact structure and good output power stability, but limited by the damage threshold of the second-level sum frequency crystal, it can only obtain a stable output of 355nm laser of about 50mW at present

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  • Frequency tripling laser device for 324-500nm continuous laser
  • Frequency tripling laser device for 324-500nm continuous laser
  • Frequency tripling laser device for 324-500nm continuous laser

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Embodiment 1

[0031] figure 2 It is a schematic diagram of the triple frequency structure of the 100mW 355nm continuous ultraviolet laser in Embodiment 1 of the present invention. As can be seen from the figure, the frequency tripled laser of the 324-500nm continuous laser in this embodiment includes a high-power fundamental frequency laser 1 and a frequency tripled module in the wavelength range of 972-1500nm, and the frequency tripled module consists of a single-pass The frequency multiplier 4 and the resonant sum frequency cavity 8 specifically include a first half-wavelength phase retarder 201, a second half-wavelength phase retarder 202, a third half-wavelength phase retarder 203, a single-pass frequency-doubler crystal 401, a first harmonic Wave filter mirror 501, first high reflection mirror 502, second high reflection mirror 503, third high reflection mirror 504, first mode matching lens 701, second mode matching lens 702, third mode matching lens 703, resonance and Frequency cavi...

Embodiment 2

[0049] image 3 It is a structural schematic diagram of embodiment 2 of the present invention-a triple frequency laser of watt-level 355nm continuous ultraviolet laser.

[0050] As can be seen from the figure, the present embodiment includes a high-power 1064nm fiber laser amplifier 1, a first half-wavelength phase retarder 201, a second half-wavelength phase retarder 202, a third half-wavelength phase retarder 203, a polarization beam splitter 3, and a single-pass Frequency multiplication module 4, harmonic filter mirror 501, first high reflection mirror 502, second high reflection mirror 503, third high reflection mirror 504, fourth high reflection mirror 505, light collector 6, first mode matching lens Group 701 , second mode matching lens group 702 , third mode matching lens group 703 and resonance and frequency cavity 8 .

[0051] Along the direction of the fundamental frequency light 10 output by the high-power fundamental frequency laser 1, there are successively the f...

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Abstract

The invention discloses a frequency tripling laser device for 324-500nm continuous laser. The frequency tripling laser device comprises a high-power fundamental frequency laser and a frequency tripling module. The output wavelength of the fundamental frequency light ranges from 972nm to 1500nm. The frequency tripling module is composed of a single-pass frequency doubling module and a resonant sumfrequency module. The high-power fundamental frequency laser generates watt-level double-frequency laser (466-750nm) through the single-pass frequency doubling module, and the high-power fundamental frequency laser passes through a nonlinear crystal in the resonance sum frequency cavity once and is subjected to sum frequency with the double-frequency laser in the nonlinear sum frequency crystal toobtain high-power triple-frequency laser (324-500nm). A resonant sum frequency cavity only needs to be locked to the double-frequency laser to obtain the light intensity gain. The laser device can output stable, reliable and high-beam-quality continuous laser of 324-500nm, and has the advantages of being relatively simple in structure, low in cost and compact in light path.

Description

technical field [0001] The invention relates to a 324-500nm continuous laser, in particular to a triple frequency laser of the 324-500nm continuous laser. Background technique [0002] High-power continuous ultraviolet lasers have been widely used in high-resolution laser spectroscopy, single-photon Rydberg state excitation of neutral atoms, quantum physics, optical data storage, optical disc control, photochemical reactions, atmospheric detection, coherent laser detection, biomedicine, Advanced manufacturing and semiconductor industry and other fields. Ultraviolet lasers have the characteristics of short wavelength and high single-photon energy, and are often used in ultraviolet-induced photochemical reactions and cold treatments. In the field of micromachining, ultraviolet laser has the following advantages: first, the diffraction limit is small, and the beam diffraction limit is an important factor that limits the minimum size of processing. The shorter the corresponding...

Claims

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Application Information

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IPC IPC(8): H01S3/109H01S5/06
CPCH01S3/109H01S5/0604
Inventor 赵儒臣张磊付小虎
Owner 宁波频准激光科技有限公司
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