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Preparation method of high-quality film lithium niobate micro-nano grating

A lithium niobate, high-quality technology, applied in the directions of light guides, optics, optical components, etc., can solve the problems of reducing the coupling efficiency of gratings and fibers, reducing the etching rate of lithium niobate, and tilting the sidewalls of the grating waveguides. degree and verticality, reduce the difficulty of the process, and reduce the effect of the splicing error

Active Publication Date: 2021-04-02
南京中电芯谷高频器件产业技术研究院有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The deposition of the product not only reduces the etching rate of lithium niobate, but also causes the side wall of the grating waveguide to be inclined and rough, thereby reducing the coupling efficiency of the grating and the optical fiber

Method used

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  • Preparation method of high-quality film lithium niobate micro-nano grating

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preparation example Construction

[0020] The invention provides a method for preparing a high-quality thin-film lithium niobate micro-nano grating. The preparation process of the method is shown in figure 1 , including the following steps:

[0021] Step 1, cleaning the surface of the LNOI material;

[0022] Step 2, preparing high-precision electron beam marking;

[0023] Step 3, coating electron beam positive resist ZEP 520A, performing LNOI grating pattern and electron beam marking protection area exposure;

[0024] Step 4, evaporating and stripping Ni metal as a grating waveguide etching mask;

[0025] Step 5, using F-based RIE dry etching and NH 4 OH:H 2 o 2 :H 2 Wet treatment of O, cycled several times to reach the specified etching depth;

[0026] Step 6, using 30% HNO 3 Remove the remaining Ni mask;

[0027] Step 7, growing a silicon oxide upper cladding layer.

[0028] Further, in the step 1, the LNOI material is silicon, silicon dioxide and lithium niobate film.

[0029] Further, in step 1, ...

Embodiment 1

[0040] This embodiment provides a method for preparing a high-quality thin-film lithium niobate grating, which specifically includes the following steps:

[0041] Step 1: Surface cleaning and heat treatment of LNOI material. Specifically, 10 minutes of sonication with acetone, 10 minutes of sonication with ethanol, rinsing with deionized water, drying with nitrogen, and oven drying at 90°C for 15 minutes.

[0042] Step 2: E-beam marking preparation. Spin-coat electron beam positive colloid UV 135 at a speed of 3000rpm / min. After spin-coating, put it on a hot plate at 130℃ and bake for 90s. Electron beam evaporates Ti / Pt alloy with a thickness of 20 / 80nm. After evaporation, soak in acetone for 1 For more than an hour, remove the metal on the film, then replace it with acetone and sonicate for 10 minutes, ethanol for 10 minutes, and finally wash with deionized water and dry in an oven at 90°C for 20 minutes.

[0043] Step 3: E-beam mark protection and raster pattern exposure. ...

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Abstract

The invention discloses a preparation method of a high-quality film lithium niobate micro-nano grating. The preparation method comprises the following steps of cleaning the surface of an LNOI material, preparing a high-precision electron beam mark, coating electron beam positive photoresist ZEP 520A, and exposing an LNOI grating pattern and an electron beam mark protection area, evaporating and stripping Ni metal to serve as a grating waveguide etching mask, adopting F-based RIE dry etching and NH4OH: H2O2: H2O wet processing, and achieving the specified etching depth through multiple times ofcirculation, removing the residual Ni mask by adopting 30% HNO3, and growing a silicon oxide upper cladding. The method provided by the invention is used for preparing the LNOI grating, effectively solves the problem of adhesion of products after lithium niobate etching, and improves the smoothness and verticality of the side wall of the LNOI grating.

Description

technical field [0001] The invention belongs to the technical field of optical waveguide preparation, and in particular relates to a method for preparing a thin-film lithium niobate grating. Background technique [0002] Lithium niobate material has excellent piezoelectric, electro-optic, acousto-optic and nonlinear optical properties, and is widely used in the fields of high-speed optical modulation and optical sensing. Especially for the newly emerging thin-film lithium niobate (LNOI) material, due to the large refractive index difference between the waveguide core layer and the cladding layer (~0.7), it has a strong ability to confine the optical field mode, and the thin-film lithium niobate optical waveguide can achieve micro Nano level, greatly reducing the overall size of lithium niobate optical devices. The reduction in the size of the thin-film lithium niobate optical waveguide leads to a further increase in the mode field mismatch and a decrease in the optical coup...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/138G02B6/136G02B6/132
CPCG02B6/138G02B6/136G02B6/132
Inventor 周奉杰钱广顾晓文唐杰
Owner 南京中电芯谷高频器件产业技术研究院有限公司
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