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A FTRPSA separation and purification method for deep defluorination and drying of HCl gas containing high concentration of HF

A high-concentration, gas-based technology, applied in separation methods, specific gas purification/separation, chemical instruments and methods, etc., can solve the problems of high investment and high energy consumption

Active Publication Date: 2022-05-03
SICHUAN TECHAIRS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is currently the most commonly used and most effective method for defluorination and drying of HCl gas containing high concentration of HF. However, due to the limitation of phase balance, the depth of defluorination must reach the level of electronic grade products, the energy consumption is relatively high, and the theory required for rectification The higher the number of plates, the higher the investment

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  • A FTRPSA separation and purification method for deep defluorination and drying of HCl gas containing high concentration of HF
  • A FTRPSA separation and purification method for deep defluorination and drying of HCl gas containing high concentration of HF
  • A FTRPSA separation and purification method for deep defluorination and drying of HCl gas containing high concentration of HF

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Experimental program
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Embodiment 1

[0046] Such as figure 1 Shown, a kind of FTrPSA separation and purification method of deep defluorination and drying of HCl gas containing high concentration HF, the specific implementation steps include,

[0047] (1) Prepare the raw material gas: from the hydrogen chloride (HCl) industrial gas containing high concentration hydrogen fluoride (HF), the rest contain the main impurity components as 25% HF, 1% water (H 2 O), and trace or trace amounts of fluorosilanes (acids), chlorosilanes / other chlorides, carbon dioxide (CO 2), water-soluble metal (Me+) ions, and fine solid or colloidal (SS) particles, among which Me+ is mainly water-soluble sodium (Na), magnesium (Mg), calcium (Ca), and arsenic (As) ions. The concentration is at the ppm level of traces, the fine particles (SS) with a diameter greater than 1 micron (μm) are greater than 100 (pieces) units / milliliter (Ea / ml), normal temperature and pressure;

[0048] (2) Raw material gas pretreatment: The raw material gas is pr...

Embodiment 2

[0056] Such as figure 2 As shown, on the basis of Example 1, the medium-temperature pressure swing adsorption concentration process is composed of two-stage pressure swing adsorption. Enter, the non-adsorbed phase gas flowing out from the top of the adsorption tower of the first stage of pressure swing adsorption in the adsorption step is refined HCl gas. After precision filtration and condensation, the formed refined HCl liquid enters the membrane separation process, and the first non-adsorbed gas formed by condensation The condensate gas enters the tail gas absorption process for treatment. The desorbed gas flowing out from the bottom of the adsorption tower of the first stage of pressure swing adsorption in the desorption step of reverse discharge and vacuum pumping is pressurized and then discharged from the adsorption tower of the second stage of pressure swing adsorption. The bottom enters, and the non-adsorbed phase gas flowing out from the top of the adsorption tower ...

Embodiment 3

[0058] Such as image 3 As shown, on the basis of Example 1, the medium-temperature pressure swing adsorption concentration process is composed of two-stage pressure swing adsorption. The crude HCl gas from the cooling and condensation process is converted from the first stage to The non-adsorbed phase gas flowing out from the top of the adsorption tower of the first stage of pressure swing adsorption in the adsorption step is the intermediate gas, which directly enters from the bottom of the adsorption tower of the second stage of pressure swing adsorption. In the second stage of pressure swing adsorption, the non-adsorbed phase gas flowing out of the top of the adsorption tower is refined HCl gas. After precision filtration and condensation, the formed refined HCl liquid enters the membrane separation process, and the first non-condensable gas formed by condensation enters the tail gas absorption. The process is processed, and the desorption gas from the adsorption phase flo...

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Abstract

The invention relates to the technical field of purification and purification of electronic-grade HCl prepared from industrial-grade hydrogen chloride gas containing high-concentration hydrogen fluoride as a raw material, and specifically relates to a FTrPSA separation and purification method for deep defluorination and drying of HCl gas containing high-concentration HF. The effective component HCl in hydrogen chloride gas and a large amount of hydrogen fluoride, a small amount of water, and trace or trace amounts of impurity components such as fluorosilane, chlorosilane, carbon dioxide, water-soluble metal ions, and fine solid or colloidal particles are separated under different pressures and The adsorption / condensation / rectification / membrane separation coefficients and the differences in physical and chemical properties at different temperatures are based on the purpose of achieving a dynamic equilibrium between the adsorption and desorption cycle operations of the medium-temperature pressure swing adsorption process and combined with condensation and HCl rectification. Membrane separation coupling makes it easy to match the adsorption and desorption in the medium temperature pressure swing adsorption process, so as to achieve a balanced cycle operation to carry out the separation and purification of deep defluorination and drying of HCl gas, so as to realize the production of electronic grade HCl products.

Description

technical field [0001] The invention relates to the technical field of purification and purification of electronic-grade HCl prepared from industrial-grade hydrogen chloride (HCl) gas containing high-concentration hydrogen fluoride (HF) as a raw material, and more specifically relates to a deep defluorination and drying of HCl gas containing high-concentration HF The FTrPSA (full temperature range pressure swing adsorption) separation and purification method. Background technique [0002] Hydrogen chloride (HCl) gas is an important inorganic chemical raw material, widely used in dyestuffs, medicine, food, printing and dyeing, leather, metallurgy and petrochemical industries, among which hydrogen chloride is widely used as a basic raw material in the field of organic synthesis, for example, in the petrochemical industry Synthesis of plastic polyvinyl chloride (PVC), preparation of glucose by hydrolyzing starch in the pharmaceutical industry, quinine and chlorinated derivative...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/047C01B7/07C01B7/19
CPCC01B7/0706C01B7/0718C01B7/0712C01B7/196C01B7/197B01D53/047B01D53/1493B01D2252/10B01D2252/50B01D2256/26B01D2257/2047C01B2210/001C01B2210/0014C01B2210/0001C01B2210/0009C01B2210/0056
Inventor 钟雨明钟娅玲汪兰海陈运唐金财蔡跃明蒋强
Owner SICHUAN TECHAIRS