Laminated metal and metal oxide etching liquid composition and use method thereof

A technology for laminating metals and etching solutions, which is applied in the direction of surface etching compositions, chemical instruments and methods, etc., can solve problems such as difficulties in the development of chemical solutions, large differences in chemical and electrochemical properties of metal wires, etc., and achieve improved etching Loss of shape and line width, low cost of waste liquid treatment, and environmental friendliness

Active Publication Date: 2021-06-29
四川和晟达电子科技有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the chemical and electrochemical properties of IGZO and metal wire (Cu) are quite different, which has caused great difficulties in the development of chemical solutions.

Method used

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  • Laminated metal and metal oxide etching liquid composition and use method thereof
  • Laminated metal and metal oxide etching liquid composition and use method thereof
  • Laminated metal and metal oxide etching liquid composition and use method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] A laminated metal and metal oxide etchant composition, raw materials include: by mass percentage, hydrogen peroxide 8%, inorganic acid 1.56%, fluoride ion source 0.05%, complexing agent 4.36%, alkali compound 3.64% , metal corrosion inhibitor 0.28%, and solvent supplement the balance.

[0062] The inorganic acid is nitric acid.

[0063] The fluoride ion source is HF.

[0064] The complexing agent is a polyhydric alcohol complexing agent. The polyhydric alcohol complexing agent includes ethylene glycol and triethylene glycol. The mass ratio of ethylene glycol and triethylene glycol is 0.49%:3.87%.

[0065] The base compound is an organic base. The organic base is triethanolamine.

[0066] The metal corrosion inhibitor is selected from amino nitrogen azole compounds. The aminoazole compound 5-aminotetrazole.

[0067] The solvent is deionized water.

Embodiment 2

[0069] A kind of laminated metal and metal oxide etchant composition, raw material comprises: by mass percentage, hydrogen peroxide 8%, inorganic acid 1.98%, fluoride ion source 0.03%, complexing agent 4.1%, alkali compound 3.63% , metal corrosion inhibitor 0.28%, and solvent supplement the balance.

[0070] The inorganic acid is nitric acid.

[0071] The fluoride ion source is HF.

[0072] The complexing agent is a polyhydric alcohol complexing agent. The polyhydric alcohol complexing agent is ethylene glycol and triethylene glycol. The mass ratio of ethylene glycol and triethylene glycol is 0.68%:3.42%.

[0073] The base compound is an organic base. The organic base is triethanolamine.

[0074] The metal corrosion inhibitor is selected from amino nitrogen azole compounds. The amino nitrogen azole compound is 5-amino tetrazole.

[0075] The solvent is deionized water.

Embodiment 3

[0077] A kind of laminated metal and metal oxide etchant composition, raw material comprises: by mass percentage, hydrogen peroxide 8%, inorganic acid 2.18%, fluoride ion source 0.14%, complexing agent 4.18%, alkali compound 3.97% , metal corrosion inhibitor 0.28%, and solvent supplement the balance.

[0078] The inorganic acid is sulfuric acid.

[0079] The fluoride ion source is a fluoride salt. The fluoride salt is ammonium bifluoride.

[0080] The complexing agent is a polyhydric alcohol complexing agent. The polyhydric alcohol complexing agent includes ethylene glycol and triethylene glycol. The mass ratio of ethylene glycol and triethylene glycol is 1.24%:2.94%.

[0081] The base compound is an organic base. The organic base is isopropanolamine.

[0082] The metal corrosion inhibitor is selected from amino nitrogen azole compounds. The amino nitrogen azole compound is 5-amino tetrazole.

[0083] The solvent is deionized water.

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PUM

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Abstract

The invention provides a laminated metal and metal oxide etching solution composition and a use method thereof. The laminated metal and metal oxide etching solution composition comprises the following raw materials by mass of: 5% to 20% of hydrogen peroxide, 1% to 10% of inorganic acid, 0.01% to 1% of a fluorine ion source, 1% to 10% of a complexing agent, 1% to 10% of an alkali compound, 0.01% to 1% of a metal corrosion inhibitor, and the balance of a solvent. According to the laminated metal and metal oxide etching liquid composition and the use method thereof provided by the invention, not only the laminated metal and metal oxide can be effectively etched, but also the etching morphology is good, the etching precision is high, and the requirements of customers can be effectively met.

Description

technical field [0001] The invention relates to the field of metal surface chemical treatment, in particular to a laminated metal and metal oxide etchant composition and an application method thereof. Background technique [0002] Copper is widely used in the field of electronic information products because of its good electrical conductivity, thermal conductivity and mechanical ductility, and copper metal etching technology has also developed rapidly. However, with the development of science and technology and the improvement of people's living standards, people have put forward higher requirements for electronic materials. Laminated metal is one of the important technologies to improve and enhance the application of copper metal in the field of electronic materials. However, due to different film layers The metal components are different, and cracks are likely to occur between different metal film layers due to electrochemical reactions, which will lead to chamfering of di...

Claims

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Application Information

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IPC IPC(8): C23F1/18C23F1/26C23F1/44C09K13/08
CPCC23F1/18C23F1/26C23F1/44C09K13/08
Inventor 徐帅张红伟李闯胡天齐钱铁民
Owner 四川和晟达电子科技有限公司
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