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Method for preparing large-size sapphire crystal and kyropoulos sapphire single crystal furnace used by same

A sapphire single crystal furnace and sapphire crystal technology, which is applied in the direction of seed crystal remaining in the molten liquid, crystal growth, single crystal growth, etc. during the growth period of use, can solve the problems of low quality, small size and poor performance of sapphire, and achieve purity High, small temperature gradient, uniform temperature effect

Inactive Publication Date: 2021-12-10
济南易航新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a kind of method for preparing large-scale sapphire crystal and the sapphire single-crystal furnace of using thereof in order to overcome the deficiencies in the prior art, in order to solve the low quality of sapphire in the prior art, performance is poor, size minor issues

Method used

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  • Method for preparing large-size sapphire crystal and kyropoulos sapphire single crystal furnace used by same
  • Method for preparing large-size sapphire crystal and kyropoulos sapphire single crystal furnace used by same

Examples

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Effect test

Embodiment 1

[0064] Using 5N high-purity aluminum as the anode material of aluminum-air battery, through high-pressure twisting and cold rolling, it is made into nano-scale high-purity aluminum anode plate, which is used for load through electrochemical discharge of aluminum-air battery, and the discharge current density is 300mA / cm 2 . KNaAl 4 The mass fraction is 99.998% aluminum-air battery electrolyte (SiO 2 (OH) 2 2- , Ca 2+ , Zn 2+ , Mg 2+ The mass fraction of the sum is 0.002%). Raise the temperature of the electrolyte to 70°C, add excess calcium oxide, zirconium oxide and KNaAl to the electrolyte 4 The solution eventually forms calcium aluminate hydrate, SiO 2 (OH) 2 2- React on the surface of calcium aluminate hydrate to form hydrated garnet precipitates, and remove silicon impurities in the solution; then add an appropriate amount of sodium sulfide to the electrolyte to form zinc sulfide precipitates and remove zinc ions; finally add sodium oxalate to the electrolyte a...

Embodiment 2

[0067] Put 470kg of cake-shaped 5N nano-alumina with a particle size of 50nm into the iridium crucible of the single crystal furnace, fix the sapphire as the seed crystal on the seed rod of the pulling and rotating system of the single crystal furnace, and start the vacuum system to Vacuumize the single crystal furnace, when the vacuum in the single crystal furnace reaches 5×10 -7 Pa, and the change value of vacuum within half an hour is 10 -7 Pa, complete vacuuming.

[0068] Heating the iridium crucible to 2320°C through the tungsten heating body by increasing the voltage, the rate of increasing the voltage is 450mV / h, after heating at 2320°C for 6.5h, the temperature in the single crystal furnace is reduced to 2050 at the rate of falling voltage of 140mV / h ℃. The seed crystal is lowered by the seed rod at a rate of 20mm / h to 12mm below the melt level, and the descending time is 125min, and then the seed crystal is rotated by the seed rod at a rate of 5rad / min, when the len...

Embodiment 3

[0072] Put 520kg of cake-shaped 5N nano-alumina with a particle size of 50nm into the iridium crucible of the single crystal furnace, fix the sapphire as the seed crystal on the seed rod of the pulling and rotating system of the single crystal furnace, and start the vacuum system to Vacuumize the single crystal furnace, when the vacuum degree in the single crystal furnace reaches 7×10 -7 Pa, and the change value of vacuum within half an hour is 10 -8 Pa, complete vacuuming.

[0073] Heating the iridium crucible to 2380°C through the tungsten heating body by means of voltage increase, the rate of voltage increase is 550mV / h, after heating at 2380°C for 5 hours, the temperature in the single crystal furnace is reduced to 2080°C at a rate of drop voltage of 210mV / h . The seed crystal is lowered by the seed rod at a rate of 40mm / h to 21mm below the melt level, and the descending time is 145min, and then the seed crystal is rotated by the seed rod at a rate of 7rad / min, when the ...

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Abstract

The invention belongs to the technical field of sapphire crystals, and provides a method for preparing a large-size sapphire crystal. The method comprises the following steps: heating 5N nano aluminum oxide and seed crystals under a vacuum condition to obtain a melt; rotating seed crystals in the melt and on the liquid level of the melt in sequence, and performing seeding treatment to obtain crystal junctions; after the crystal crystal junctions make contact with the liquid level of the melt, sequentially carrying out shouldering treatment on the crystal, and carrying out equal-diameter growth to obtain a large-size crystal; and making the large-size crystal sequentially subjected to annealing treatment and argon filling cooling treatment to obtain the sapphire crystal. The invention also provides a kyropoulos sapphire single crystal furnace used by the method. The sapphire crystal disclosed by the invention is higher in quality and better in performance; and the crystal grows uniformly, bubbles in the crystal are few, crystal boundaries are few, the quality is high, and the size is large.

Description

technical field [0001] The invention relates to the technical field of sapphire crystals, in particular to a method for preparing large-sized sapphire crystals and a Kyropoulos sapphire single crystal furnace used therein. Background technique [0002] Sapphire is a small amount of Fe 2+ and Ti 4+ Compared with other minerals, alumina single crystal has good optical and mechanical properties, and its chemical properties are stable, high strength, corrosion resistance, high temperature resistance, hardness is second only to diamond, and it is used in many technical fields. Has a very wide range of applications. Sapphire crystal has become the most ideal substrate material in the field of microelectronics due to its advantages in lattice structure, mechanical properties, and thermal properties. The melting point of sapphire crystal is 2050°C, the boiling point is 3500°C, and it can still work at 1900°C. Its solubility in water is almost 0, and its chemical properties are e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B17/00C30B29/20C30B33/02
CPCC30B17/00C30B29/20C30B33/02
Inventor 卢惠民卢小溪
Owner 济南易航新材料科技有限公司