Electrooptical sensor static bias point process correction method and electro-optical sensor
An electro-optic sensor and static bias technology, applied in the field of sensors, can solve the problems of reducing the anti-electromagnetic interference performance of electro-optic sensors, failing to realize the π/2 static bias point, increasing the interference of electro-optic sensors, etc., and achieving good size reduction characteristics and structure Simple, effective method
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Embodiment 1
[0080] like figure 1 As shown, the substrate 1 of the electro-optic sensor is a bulk lithium niobate substrate, so the electro-optic sensor does not include the bonding buffer layer 4 and the support material 5 . Lithium niobate optical waveguide 2 adopts MZ interference optical path made by titanium diffusion or proton exchange process. The lower electrode 3-1 is made of indium tin oxide (ITO); the transition metal oxide resistive material layer 3-2 is made of tungsten trioxide (WO 3 ); the upper electrode 3-3 is made of indium tin oxide. Wherein, both Y branches in the MZ interference optical path can be replaced by a multimode interferometer (MMI).
[0081] In this technical solution, the tangential direction of the bulk lithium niobate substrate is x-cut, and the propagation direction of light is along the y-direction. The crystal coordinate system is as figure 1 The middle axis is shown.
Embodiment 2
[0083] like figure 2 As shown, the substrate 1 of the electro-optic sensor is a bulk lithium niobate substrate, so the electro-optic sensor does not include the bonding buffer layer 4 and the support material 5 . The lithium niobate optical waveguide 2 is a common path interference optical path made by titanium diffusion or proton exchange technology. The lower electrode 3-1 is made of fluorine-doped tin oxide (FTO); the transition metal oxide resistive material layer 3-2 is made of titanium dioxide (TiO 2 ); the upper electrode 3-3 uses platinum (Pt).
[0084] In this technical solution, the tangent direction of the bulk lithium niobate substrate is x-cut, and the propagation direction of light is along the z-direction. The crystal coordinate system is as figure 2 The middle axis is shown.
Embodiment 3
[0086] like image 3 As shown, the substrate 1 of the electro-optical sensor uses thin-film lithium niobate, which needs to be placed on the surface of the support material 5 through the bonding buffer layer 4 . Lithium niobate optical waveguide 2 is an MZ interference optical path made by etching or laser processing technology. The lower electrode 3-1 is made of indium tin oxide (ITO); the transition metal oxide resistive material layer 3-2 is made of niobium pentoxide (Nb 2 o 5 ); the upper electrode 3-3 is made of fluorine-doped tin oxide. The bonding buffer layer 4 is made of silicon dioxide. The support material 5 is block lithium niobate.
[0087] In this technical solution, the tangent direction of the lithium niobate film is x-cut, and the propagation direction of light is along the y direction. The crystal coordinate system is as image 3 The middle axis is shown.
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